Analysis of information sources in references of the Wikipedia article "Флэш-памяць" in Belarusian language version.
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(даведка) «Samsung calls its latest NAND process 10nm-class or 1x-nm, which can refer to feature sizes anywhere from 10nm to 19nm but we’ve also heard it referred to as 19nm TLC.»{{cite news}}
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specified (даведка)This had already become a problem at the 25nm node requiring the deployment of airgap between the cells to reduce interference
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specified (даведка)Папярэджанні CS1: розныя назвы: authors list (спасылка)All the NAND manufacturers adopted an air-gap process to achieve high performance and reliability. Toshiba implemented an air-gap process on its 19nm NAND device, while Samsung adopted it on 21nm. IMFT has used a more mature air-gap process on both the wordline and bitline structure since its 25nm NAND technology.
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specified (даведка){{cite news}}
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specified (даведка){{cite news}}
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specified (даведка)but no one is even talking about QLC (quad-level cell) NAND — there's just no way to store voltage at that fine-grained level while retaining enough write cycles to deploy the tech effectively.
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specified (даведка)(англ.) , ExtremeTech (May 5, 2014). Праверана 9 студзеня 2015. «but no one is even talking about QLC (quad-level cell) NAND — there’s just no way to store voltage at that fine-grained level while retaining enough write cycles to deploy the tech effectively.».{{cite news}}
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specified (даведка){{cite book}}
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(даведка): «the 19nm manufacturing process used to produce the NAND. Samsung for some reason is calling this 10nm-class, or 1x NAND, but they assured us that it’s 19nm.»This had already become a problem at the 25nm node requiring the deployment of airgap between the cells to reduce interference
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specified (даведка)Папярэджанні CS1: розныя назвы: authors list (спасылка){{cite news}}
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