Immersion lithography (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Immersion lithography" in English language version.

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asml.com

businessweek.com

dailytech.com

doi.org

  • Flagello, Donis (2004-01-01). "Benefits and limitations of immersion lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 3 (1): 104. Bibcode:2004JMM&M...3..104M. doi:10.1117/1.1636768. ISSN 1932-5150.
  • Smith, Bruce W.; Kang, Hoyoung; Bourov, Anatoly; Cropanese, Frank; Fan, Yongfa (2003-06-26). "Water immersion optical lithography for 45-nm node". In Yen, Anthony (ed.). Optical Microlithography XVI. Vol. 5040. SPIE. pp. 679–689. Bibcode:2003SPIE.5040..679S. doi:10.1117/12.485489.

harvard.edu

ui.adsabs.harvard.edu

  • Flagello, Donis (2004-01-01). "Benefits and limitations of immersion lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 3 (1): 104. Bibcode:2004JMM&M...3..104M. doi:10.1117/1.1636768. ISSN 1932-5150.
  • Smith, Bruce W.; Kang, Hoyoung; Bourov, Anatoly; Cropanese, Frank; Fan, Yongfa (2003-06-26). "Water immersion optical lithography for 45-nm node". In Yen, Anthony (ed.). Optical Microlithography XVI. Vol. 5040. SPIE. pp. 679–689. Bibcode:2003SPIE.5040..679S. doi:10.1117/12.485489.

photonics.com

researchgate.net

spiedigitallibrary.org

nanolithography.spiedigitallibrary.org

  • Flagello, Donis (2004-01-01). "Benefits and limitations of immersion lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 3 (1): 104. Bibcode:2004JMM&M...3..104M. doi:10.1117/1.1636768. ISSN 1932-5150.

spiedigitallibrary.org

staticasml.com

web.archive.org

worldcat.org

search.worldcat.org

  • Flagello, Donis (2004-01-01). "Benefits and limitations of immersion lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 3 (1): 104. Bibcode:2004JMM&M...3..104M. doi:10.1117/1.1636768. ISSN 1932-5150.