Immersion lithography (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Immersion lithography" in English language version.

refsWebsite

Global rank English rank

3web.archive.org

1^st place

1^st place

18^th place

17^th place

2^nd place

2^nd place

2spiedigitallibrary.org

low place

low place

5^th place

5^th place

low place

8,724^th place

1businessweek.com

712^th place

526^th place

1researchgate.net

120^th place

125^th place

1staticasml.com

low place

low place

low place

low place

low place

low place

asml.com

"The ASML NXT:1980Di lithography system". www.asml.com. nd. Retrieved 2022-11-09.

businessweek.com

"A Whole New World of Chips". Business Week. Archived from the original on 2011-02-21.

dailytech.com

"DailyTech - IDF09 Intel Demonstrates First 22nm Chips Discusses Die Shrink Roadmap". Archived from the original on 2010-08-28. Retrieved 2009-12-07.

doi.org

Flagello, Donis (2004-01-01). "Benefits and limitations of immersion lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 3 (1): 104. Bibcode:2004JMM&M...3..104M. doi:10.1117/1.1636768. ISSN 1932-5150.
Smith, Bruce W.; Kang, Hoyoung; Bourov, Anatoly; Cropanese, Frank; Fan, Yongfa (2003-06-26). "Water immersion optical lithography for 45-nm node". In Yen, Anthony (ed.). Optical Microlithography XVI. Vol. 5040. SPIE. pp. 679–689. Bibcode:2003SPIE.5040..679S. doi:10.1117/12.485489.

harvard.edu

ui.adsabs.harvard.edu

Flagello, Donis (2004-01-01). "Benefits and limitations of immersion lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 3 (1): 104. Bibcode:2004JMM&M...3..104M. doi:10.1117/1.1636768. ISSN 1932-5150.
Smith, Bruce W.; Kang, Hoyoung; Bourov, Anatoly; Cropanese, Frank; Fan, Yongfa (2003-06-26). "Water immersion optical lithography for 45-nm node". In Yen, Anthony (ed.). Optical Microlithography XVI. Vol. 5040. SPIE. pp. 679–689. Bibcode:2003SPIE.5040..679S. doi:10.1117/12.485489.

photonics.com

Rokitski R, Rafac R, Dubi R, Thornes J, melchior J, Cacouris T, Haviland M, Brown D, Cymer (2013). "120-W ArFi Laser Makes Higher-Dose Lithography Possible". www.photonics.com. Retrieved 2022-11-09.

researchgate.net

B. Rathsack et al., Proc. SPIE 6924, 69244W (2008).

spiedigitallibrary.org

nanolithography.spiedigitallibrary.org

Flagello, Donis (2004-01-01). "Benefits and limitations of immersion lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 3 (1): 104. Bibcode:2004JMM&M...3..104M. doi:10.1117/1.1636768. ISSN 1932-5150.

spiedigitallibrary.org

Smith, Bruce W.; Kang, Hoyoung; Bourov, Anatoly; Cropanese, Frank; Fan, Yongfa (2003-06-26). "Water immersion optical lithography for 45-nm node". In Yen, Anthony (ed.). Optical Microlithography XVI. Vol. 5040. SPIE. pp. 679–689. Bibcode:2003SPIE.5040..679S. doi:10.1117/12.485489.

staticasml.com

"M. A. van den Brink et al., Proc. SPIE 2726, 734 (1996)" (PDF). Archived from the original (PDF) on 2017-08-09. Retrieved 2018-07-16.

web.archive.org

"DailyTech - IDF09 Intel Demonstrates First 22nm Chips Discusses Die Shrink Roadmap". Archived from the original on 2010-08-28. Retrieved 2009-12-07.
"A Whole New World of Chips". Business Week. Archived from the original on 2011-02-21.
"M. A. van den Brink et al., Proc. SPIE 2726, 734 (1996)" (PDF). Archived from the original (PDF) on 2017-08-09. Retrieved 2018-07-16.

worldcat.org

search.worldcat.org

Flagello, Donis (2004-01-01). "Benefits and limitations of immersion lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 3 (1): 104. Bibcode:2004JMM&M...3..104M. doi:10.1117/1.1636768. ISSN 1932-5150.