Bower, RW & Dill, RG (1966). "Insulated gate field effect transistors fabricated using the gate as source-drain mask". 1966 International Electron Devices Meeting. Vol. 12. IEEE. pp. 102–104. doi:10.1109/IEDM.1966.187724. {{cite book}}: |journal= ignored (help)
Richard B. Fair (Jan 1998). "History of Some Early Developments in Ion-Implantation Technology Leading to Silicon Transistor Manufacturing". Proc. IEEE. 86 (1): 111–137. doi:10.1109/5.658764.
espacenet.com
worldwide.espacenet.com
US 3475234, Kerwin, Robert E.; Klein, Donald L. & Sarace, John C., "Method for making MIS structures", published 28-10-1969, assigned to Bell Telephone Laboratories Inc.