(en) Oussama M. El-Kadri, Imre M. Szilágyi, Joseph M. Campbell, Kai Arstila, Lauri Niinistö et Charles H. Winter, « Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from W2(NMe2)6 and Water: Precursor-Based Control of Oxidation State in the Thin Film Material », Journal of the American Chemical Society, vol. 128, no 30, , p. 9638-9639 (PMID16866511, DOI10.1021/ja063272w, lire en ligne)
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(en) Oussama M. El-Kadri, Imre M. Szilágyi, Joseph M. Campbell, Kai Arstila, Lauri Niinistö et Charles H. Winter, « Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from W2(NMe2)6 and Water: Precursor-Based Control of Oxidation State in the Thin Film Material », Journal of the American Chemical Society, vol. 128, no 30, , p. 9638-9639 (PMID16866511, DOI10.1021/ja063272w, lire en ligne)
(en) Oussama M. El-Kadri, Imre M. Szilágyi, Joseph M. Campbell, Kai Arstila, Lauri Niinistö et Charles H. Winter, « Atomic Layer Deposition of Tungsten(III) Oxide Thin Films from W2(NMe2)6 and Water: Precursor-Based Control of Oxidation State in the Thin Film Material », Journal of the American Chemical Society, vol. 128, no 30, , p. 9638-9639 (PMID16866511, DOI10.1021/ja063272w, lire en ligne)