Djup reaktiv jonetsning (Swedish Wikipedia)

Analysis of information sources in references of the Wikipedia article "Djup reaktiv jonetsning" in Swedish language version.

refsWebsite

Global rank Swedish rank

4freepatentsonline.com

5,449^th place

7,133^rd place

1web.archive.org

1^st place

1^st place

1compoundsemiconductor.net

low place

low place

compoundsemiconductor.net

R. Gunn, D. Stephens och C. Welch. ”Comparison of etch processes for patterning high as pect ratio and nanoscale features in silicon”. Oxford Instruments. Arkiverad från originalet den 30 oktober 2012. https://web.archive.org/web/20121030092811/http://www.compoundsemiconductor.net/csc/whitepapers/OIPT%20-%20MEMS%20SPIEV2-White%20paper-2009.pdf. Läst 15 maj 2013.

freepatentsonline.com

web.archive.org

R. Gunn, D. Stephens och C. Welch. ”Comparison of etch processes for patterning high as pect ratio and nanoscale features in silicon”. Oxford Instruments. Arkiverad från originalet den 30 oktober 2012. https://web.archive.org/web/20121030092811/http://www.compoundsemiconductor.net/csc/whitepapers/OIPT%20-%20MEMS%20SPIEV2-White%20paper-2009.pdf. Läst 15 maj 2013.