Burnham, R.; Djeu, N. (1976). "Ultraviolet‐preionized discharge‐pumped lasers in XeF, KrF, and ArF". Appl. Phys. Lett. 29: 707. doi:10.1063/1.88934
dx.doi.org
Steigerwald, J. M.. «Chemical mechanical polish: The enabling technology». A: 2008 IEEE International Electron Devices Meeting, 2008, p. 1. DOI10.1109/IEDM.2008.4796607. ISBN 978-1-4244-2377-4. "Table1: 1990 enabling multilevel metallization; 1995 enabling STI compact isolation, polysilicon patterning and yield / defect reduction
4458994 A US patent US 4458994 A, Kantilal Jain, Carlton G. Willson, "High resolution optical lithography method and apparatus having excimer laser light source and stimulated Raman shifting", issued 1984-07-10
forbes.com
Fulford, Benjamin «Unsung hero» (en anglès). Forbes.
Lamola, Angelo A., et al. "Chemically amplified resists". Solid State Technology, Aug. 1991, p. 53+."Chemically amplified resists". Retrieved 2017-11-01.