Depozice indukovaná elektronovým paprskem (Czech Wikipedia)

Analysis of information sources in references of the Wikipedia article "Depozice indukovaná elektronovým paprskem" in Czech language version.

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8doi.org

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8harvard.edu

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4nih.gov

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1zenodo.org

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doi.org

dx.doi.org

Shuji Kiyohara; Hideaki Takamatsu; Katsumi Mori. Microfabrication of diamond films by localized electron beam chemical vapour deposition. Semiconductor Science and Technology. 2002, s. 1096. DOI 10.1088/0268-1242/17/10/311. Bibcode 2002SeScT..17.1096K.
A. Nayak; H. D. Banerjee. Electron beam activated plasma chemical vapour deposition of polycrystalline diamond films. Physica Status Solidi A. 1995, s. 107–112. DOI 10.1002/pssa.2211510112. Bibcode 1995PSSAR.151..107N.
S. Randolph; J. Fowlkes; P. Rack. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching. Critical Reviews of Solid State and Materials Sciences. 2006, s. 55. DOI 10.1080/10408430600930438. Bibcode 2006CRSSM..31...55R.
K. Furuya. Nanofabrication by advanced electron microscopy using intense and focused beam. Science and Technology of Advanced Materials. 2008, s. 014110. DOI 10.1088/1468-6996/9/1/014110. PMID 27877936. Bibcode 2008STAdM...9a4110F.
M. Song; K. Furuya. Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition. Science and Technology of Advanced Materials. 2008, s. 023002. DOI 10.1088/1468-6996/9/2/023002. PMID 27877950. Bibcode 2008STAdM...9b3002S.
Rolf Erni; M. D. Rossell; C. Kisielowski; U. Dahmen. Atomic-Resolution Imaging with a Sub-50-pm Electron Probe. Physical Review Letters. 2009, s. 096101. Dostupné online. DOI 10.1103/PhysRevLett.102.096101. PMID 19392535. Bibcode 2009PhRvL.102i6101E.
Willem F. Van Dorp. Approaching the Resolution Limit of Nanometer-Scale Electron Beam-Induced Deposition. Nano Letters. 2005, s. 1303–1307. DOI 10.1021/nl050522i. PMID 16178228. Bibcode 2005NanoL...5.1303V.
I. Luxmoore; I. Ross; A. Cullis; P. Fry; J. Orr; P. Buckle; J. Jefferson. Low temperature electrical characterisation of tungsten nano-wires fabricated by electron and ion beam induced chemical vapour deposition. Thin Solid Films. 2007, s. 6791. DOI 10.1016/j.tsf.2007.02.029. Bibcode 2007TSF...515.6791L.

harvard.edu

adsabs.harvard.edu

Shuji Kiyohara; Hideaki Takamatsu; Katsumi Mori. Microfabrication of diamond films by localized electron beam chemical vapour deposition. Semiconductor Science and Technology. 2002, s. 1096. DOI 10.1088/0268-1242/17/10/311. Bibcode 2002SeScT..17.1096K.
A. Nayak; H. D. Banerjee. Electron beam activated plasma chemical vapour deposition of polycrystalline diamond films. Physica Status Solidi A. 1995, s. 107–112. DOI 10.1002/pssa.2211510112. Bibcode 1995PSSAR.151..107N.
S. Randolph; J. Fowlkes; P. Rack. Focused, Nanoscale Electron-Beam-Induced Deposition and Etching. Critical Reviews of Solid State and Materials Sciences. 2006, s. 55. DOI 10.1080/10408430600930438. Bibcode 2006CRSSM..31...55R.
K. Furuya. Nanofabrication by advanced electron microscopy using intense and focused beam. Science and Technology of Advanced Materials. 2008, s. 014110. DOI 10.1088/1468-6996/9/1/014110. PMID 27877936. Bibcode 2008STAdM...9a4110F.
M. Song; K. Furuya. Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition. Science and Technology of Advanced Materials. 2008, s. 023002. DOI 10.1088/1468-6996/9/2/023002. PMID 27877950. Bibcode 2008STAdM...9b3002S.
Rolf Erni; M. D. Rossell; C. Kisielowski; U. Dahmen. Atomic-Resolution Imaging with a Sub-50-pm Electron Probe. Physical Review Letters. 2009, s. 096101. Dostupné online. DOI 10.1103/PhysRevLett.102.096101. PMID 19392535. Bibcode 2009PhRvL.102i6101E.
Willem F. Van Dorp. Approaching the Resolution Limit of Nanometer-Scale Electron Beam-Induced Deposition. Nano Letters. 2005, s. 1303–1307. DOI 10.1021/nl050522i. PMID 16178228. Bibcode 2005NanoL...5.1303V.
I. Luxmoore; I. Ross; A. Cullis; P. Fry; J. Orr; P. Buckle; J. Jefferson. Low temperature electrical characterisation of tungsten nano-wires fabricated by electron and ion beam induced chemical vapour deposition. Thin Solid Films. 2007, s. 6791. DOI 10.1016/j.tsf.2007.02.029. Bibcode 2007TSF...515.6791L.

nih.gov

ncbi.nlm.nih.gov

K. Furuya. Nanofabrication by advanced electron microscopy using intense and focused beam. Science and Technology of Advanced Materials. 2008, s. 014110. DOI 10.1088/1468-6996/9/1/014110. PMID 27877936. Bibcode 2008STAdM...9a4110F.
M. Song; K. Furuya. Fabrication and characterization of nanostructures on insulator substrates by electron-beam-induced deposition. Science and Technology of Advanced Materials. 2008, s. 023002. DOI 10.1088/1468-6996/9/2/023002. PMID 27877950. Bibcode 2008STAdM...9b3002S.
Rolf Erni; M. D. Rossell; C. Kisielowski; U. Dahmen. Atomic-Resolution Imaging with a Sub-50-pm Electron Probe. Physical Review Letters. 2009, s. 096101. Dostupné online. DOI 10.1103/PhysRevLett.102.096101. PMID 19392535. Bibcode 2009PhRvL.102i6101E.
Willem F. Van Dorp. Approaching the Resolution Limit of Nanometer-Scale Electron Beam-Induced Deposition. Nano Letters. 2005, s. 1303–1307. DOI 10.1021/nl050522i. PMID 16178228. Bibcode 2005NanoL...5.1303V.

zenodo.org

Rolf Erni; M. D. Rossell; C. Kisielowski; U. Dahmen. Atomic-Resolution Imaging with a Sub-50-pm Electron Probe. Physical Review Letters. 2009, s. 096101. Dostupné online. DOI 10.1103/PhysRevLett.102.096101. PMID 19392535. Bibcode 2009PhRvL.102i6101E.