BRAZZLE, J.D.; DOKMECI, J.R.; MASTRANGELO, C.H. Modeling and characterization of sacrificial polysilicon etching using vapor-phase xenon difluoride. 17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS). Roč. 2004, s. 737–740. DOI10.1109/MEMS.2004.1290690.