Riikka L. Puurunen: Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process. In: Journal of Applied Physics. Band97, Nr.12, 2005, S.121301-01, doi:10.1063/1.1940727.
Riikka L. Puurunen: A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy. In: Chemical Vapor Deposition. Band20, 2014, S.332–344, doi:10.1002/cvde.201402012.
Anatolii A. Malygin, Victor E. Drozd, Anatolii A. Malkov, Vladimir M. Smirnov: From V. B. Aleskovskii's „Framework“ Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition". In: Chemical Vapor Deposition. Band21, Nr.10-11-12, 2015, S.216–240, doi:10.1002/cvde.201502013.
Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali, Mikhael Bechelany, Maria Berdova, Stefan Boyadjiev, David C. Cameron, Rong Chen, Mikhail Chubarov: Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the „Virtual Project on the History of ALD“. In: Journal of Vacuum Science & Technology A. Band35, 2017, S.010801, doi:10.1116/1.4971389.
Riikka L. Puurunen: Learnings from an Open Science Effort: Virtual Project on the History of ALD. In: ECSarXiv. 2018, doi:10.1149/08606.0003ecst.
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Patent US4058430: Method for producing compound thin films. Angemeldet am 25. November 1975, veröffentlicht am 15. November 1977, Erfinder: T. Suntola, J. Antson.
