Shu Qin, Allen McTeer: Wafer dependence of Johnsen–Rahbek type electrostatic chuck for semiconductor processes. In: Journal of Applied Physics. Band102, Nr.6, 2007, S.064901, doi:10.1063/1.2778633.
Gyu Il Shim, Hideo Sugai: Dechuck Operation of Coulomb Type and Johnsen-Rahbek Type of Electrostatic Chuck Used in Plasma Processing. In: Plasma and Fusion Research. Band3, Nr.0, 2008, S.051, doi:10.1585/pfr.3.051 (jstage.jst.go.jp [PDF; 401kB]).
Albino Antinori: Über den Ursprung des Johnsen-Rahbek-Effekts. In: Zeitschrift für Physik A. Band34, Nr.1, 1925, S.705–714, doi:10.1007/BF01328517.
R. Atkinson: A simple theory of the Johnsen-Rahbek effect. In: Journal of Physics D: Applied Physics. Band2, Nr.3, 1969, S.325–332, doi:10.1088/0022-3727/2/3/303.
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Patent US1533757: Apparatus for changing electrical variations to mechanical. Angemeldet am 10. März 1919, veröffentlicht am 14. April 1925, Erfinder: K. Rahbek, F. A. Johnsen (Namensnachweis der Erfinder).
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Gyu Il Shim, Hideo Sugai: Dechuck Operation of Coulomb Type and Johnsen-Rahbek Type of Electrostatic Chuck Used in Plasma Processing. In: Plasma and Fusion Research. Band3, Nr.0, 2008, S.051, doi:10.1585/pfr.3.051 (jstage.jst.go.jp [PDF; 401kB]).