C. A. Mack: Understanding focus effects in submicron optical lithography: A Review. In: Optical Engineering. Band32, Nr.10, 1993, S.2350–2362, doi:10.1117/12.968408.
Miyoko Noguchi: Subhalf-micron lithography system with phase-shifting effect. In: Proceedings of SPIE. San Jose, CA, USA 1992, S.92–104, doi:10.1117/12.130312.
