Stickstofftrifluorid (German Wikipedia)

Analysis of information sources in references of the Wikipedia article "Stickstofftrifluorid" in German language version.

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dguv.de

gestis.dguv.de

doi.org

  • A. Totterdill, T. Kovács, W. Feng, S. Dhomse, C. J. Smith: Atmospheric lifetimes, infrared absorption spectra, radiative forcings and global warming potentials of NF3 and CF3CF2Cl (CFC-115). In: Atmos. Chem. Phys. Band 16, Nr. 17, 14. September 2016, S. 11451–11463, doi:10.5194/acp-16-11451-2016.
  • Oskar Glemser, Johann Schröder, Joachim Knaak: Notiz zur Darstellung von Stickstofftrifluorid durch Elektrolyse von geschmolzenem Ammoniumhydrogenfluorid. In: Chemische Berichte. Band 99, Nr. 1, S. 371–374, Januar 1966. doi:10.1002/cber.19660990157.
  • M. Rigby, R. G. Prinn, S. O’Doherty, B. R. Miller, D. Ivy: Recent and future trends in synthetic greenhouse gas radiative forcing. In: Geophysical Research Letters. Band 41, Nr. 7, 16. April 2014, S. 2013GL059099, doi:10.1002/2013GL059099.
  • Tim Arnold, Christina M. Harth, Jens Mühle, Alistair J. Manning, Peter K. Salameh: Nitrogen trifluoride global emissions estimated from updated atmospheric measurements. In: Proceedings of the National Academy of Sciences. Band 110, Nr. 6, 5. Februar 2013, S. 2029–2034, doi:10.1073/pnas.1212346110, PMID 23341630, PMC 3568375 (freier Volltext).
  • Ray F. Weiss, Jens Mühle, Peter K. Salameh, Christina M. Harth: Nitrogen trifluoride in the global atmosphere. In: Geophysical Research Letters. Band 35, Nr. 20, 1. Oktober 2008, S. L20821, doi:10.1029/2008GL035913.

espacenet.com

worldwide.espacenet.com

  • Patent EP1703001B1: Verwendung einer Anode für die elektrolytische Herstellung einer fluorhaltigen Substanz. Angemeldet am 14. März 2006, veröffentlicht am 4. September 2013, Anmelder: Permelec Electrode Ltd, Toyo Tanso Co, Erfinder: Tsuneto Furuta et al (Seite 3 Zeile 12).

nih.gov

ncbi.nlm.nih.gov

  • Tim Arnold, Christina M. Harth, Jens Mühle, Alistair J. Manning, Peter K. Salameh: Nitrogen trifluoride global emissions estimated from updated atmospheric measurements. In: Proceedings of the National Academy of Sciences. Band 110, Nr. 6, 5. Februar 2013, S. 2029–2034, doi:10.1073/pnas.1212346110, PMID 23341630, PMC 3568375 (freier Volltext).

researchgate.net

  • J. Oshinowo, A. Riva, M Pittroff, T. Schwarze and R. Wieland: Etch performance of Ar/N2/F2 for CVD/ALD chamber clean. In: Solid State Technology. 52. Jahrgang, Nr. 2, 2009, S. 20–24 (researchgate.net [PDF]).

suva.ch

unfccc.int

winklerverlag.com

wissenschaft.de