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45 nm process (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "45 nm process" in English language version.

refsWebsite
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4web.archive.org
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2anandtech.com
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1ieee.org
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1tsmc.com
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1samsung.com
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1intel.com
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1engadget.com
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1arstechnica.com
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1doi.org
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1semanticscholar.org
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1archive.today
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1chipworks.com
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1panasonic.co.jp
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anandtech.com

archive.today

arstechnica.com

chipworks.com

doi.org

  • Mistry, K.; Allen, C.; Auth, C.; Beattie, B.; Bergstrom, D.; Bost, M.; Brazier, M.; Buehler, M.; Cappellani, A.; Chau, R.; Choi, C.-H.; Ding, G.; Fischer, K.; Ghani, T.; Grover, R.; Han, W.; Hanken, D.; Hattendorf, M.; He, J.; Hicks, J.; Huessner, R.; Ingerly, D.; Jain, P.; James, R.; Jong, L.; Joshi, S.; Kenyon, C.; Kuhn, K.; Lee, K.; Liu, H.; Maiz, J.; Mclntyre, B.; Moon, P.; Neirynck, J.; Pae, S.; Parker, C.; Parsons, D.; Prasad, C.; Pipes, L.; Prince, M.; Ranade, P.; Reynolds, T.; Sandford, J.; Shifren, L.; Sebastian, J.; Seiple, J.; Simon, D.; Sivakumar, S.; Smith, P.; Thomas, C.; Troeger, T.; Vandervoorn, P.; Williams, S. & Zawadzki, K. (December 2007). "A 45nm Logic Technology with High-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging". 2007 IEEE International Electron Devices Meeting. pp. 247–250. doi:10.1109/IEDM.2007.4418914. ISBN 978-1-4244-1507-6. S2CID 12392861.

engadget.com

ieee.org

spectrum.ieee.org

  • "IEEE Spectrum: The High-k Solution". Archived from the original on 26 October 2007. Retrieved 25 October 2007.

intel.com

panasonic.co.jp

samsung.com

semanticscholar.org

api.semanticscholar.org

  • Mistry, K.; Allen, C.; Auth, C.; Beattie, B.; Bergstrom, D.; Bost, M.; Brazier, M.; Buehler, M.; Cappellani, A.; Chau, R.; Choi, C.-H.; Ding, G.; Fischer, K.; Ghani, T.; Grover, R.; Han, W.; Hanken, D.; Hattendorf, M.; He, J.; Hicks, J.; Huessner, R.; Ingerly, D.; Jain, P.; James, R.; Jong, L.; Joshi, S.; Kenyon, C.; Kuhn, K.; Lee, K.; Liu, H.; Maiz, J.; Mclntyre, B.; Moon, P.; Neirynck, J.; Pae, S.; Parker, C.; Parsons, D.; Prasad, C.; Pipes, L.; Prince, M.; Ranade, P.; Reynolds, T.; Sandford, J.; Shifren, L.; Sebastian, J.; Seiple, J.; Simon, D.; Sivakumar, S.; Smith, P.; Thomas, C.; Troeger, T.; Vandervoorn, P.; Williams, S. & Zawadzki, K. (December 2007). "A 45nm Logic Technology with High-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging". 2007 IEEE International Electron Devices Meeting. pp. 247–250. doi:10.1109/IEDM.2007.4418914. ISBN 978-1-4244-1507-6. S2CID 12392861.

tsmc.com

web.archive.org

  • "IEEE Spectrum: The High-k Solution". Archived from the original on 26 October 2007. Retrieved 25 October 2007.
  • "New Xbox 360 gets official at $299, shipping today, looks angular and ominous (video hands-on!)". AOL Engadget. 14 June 2010. Archived from the original on 17 June 2010. Retrieved 11 July 2010..
  • "Intel 45 nm process at IEDM". Archived from the original on 2 December 2008. Retrieved 2 September 2008.
  • "analysis". Archived from the original on 2 December 2008. Retrieved 15 March 2008.