Atomic layer deposition (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Atomic layer deposition" in English language version.

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Heikkinen, Ismo T.S.; Marin, Giovanni; Bihari, Nupur; Ekstrum, Craig; Mayville, Pierce J.; Fei, Yuhuan; Hu, Yun Hang; Karppinen, Maarit; Savin, Hele; Pearce, Joshua M. (March 2020). "Atomic layer deposited aluminum oxide mitigates outgassing from fused filament fabrication–based 3-D printed components". Surface and Coatings Technology. 386: 125459. doi:10.1016/j.surfcoat.2020.125459. S2CID 212841294.

atomiclimits.com

Kessels, W.M.M. (2019). "ALD Database". Eindhoven University of Technology. doi:10.6100/alddatabase.

doi.org

Cremers, Véronique; Puurunen, Riikka L.; Dendooven, Jolien (4 April 2019). "Conformality in atomic layer deposition: Current status overview of analysis and modelling". Applied Physics Reviews. 6 (2). AIP Publishing (published June 2019). doi:10.1063/1.5060967. eISSN 1931-9401. hdl:1854/LU-8614054.
Oviroh, Peter Ozaveshe; Akbarzadeh, Rokhsareh; Pan, Dongqing; Coetzee, Rigardt Alfred Maarten; Jen, Tien-Chien (2019). "New Development of Atomic Layer Deposition: Processes, Methods, and Applications". Science and Technology of Advanced Materials. 20 (1): 465–496. Bibcode:2019STAdM..20..465O. doi:10.1080/14686996.2019.1599694. PMC 6534251. PMID 31164953.
Puurunen, Riikka L. (15 June 2005). "Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process". Journal of Applied Physics. 97 (12): 121301–121301–52. Bibcode:2005JAP....97l1301P. doi:10.1063/1.1940727.
Kessels, W.M.M. (2019). "ALD Database". Eindhoven University of Technology. doi:10.6100/alddatabase.
Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko; Puurunen, Riikka L. (14 January 2013). "Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends". Journal of Applied Physics. 113 (2): 021301–021301–101. Bibcode:2013JAP...113b1301M. doi:10.1063/1.4757907.
Puurunen, Riikka L. (15 June 2005). "Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process". Journal of Applied Physics. 97 (12): 121301–121301–52. Bibcode:2005JAP....97l1301P. doi:10.1063/1.1940727.
Knoops, Harm C. M.; Faraz, Tahsin; Arts, Karsten; Kessels, Wilhelmus M. M. (Erwin) (May 2019). "Status and prospects of plasma-assisted atomic layer deposition". Journal of Vacuum Science & Technology A. 37 (3): 030902. Bibcode:2019JVSTA..37c0902K. doi:10.1116/1.5088582. S2CID 108003079.
Mackus, Adriaan J. M.; Schneider, Joel R.; MacIsaac, Callisto; Baker, Jon G.; Bent, Stacey F. (10 December 2018). "Synthesis of Doped, Ternary, and Quaternary Materials by Atomic Layer Deposition: A Review". Chemistry of Materials. 31 (4): 1142–1183. doi:10.1021/acs.chemmater.8b02878. S2CID 104385650.
Malygin, Anatolii A.; Drozd, Victor E.; Malkov, Anatolii A.; Smirnov, Vladimir M. (2015). "From V. B. Aleskovskii's "Framework" Hypothesis to the Method of Molecular Layering/Atomic Layer Deposition". Chemical Vapor Deposition. 21 (10–11–12): 216–240. doi:10.1002/cvde.201502013.
Puurunen, Riikka L. (2014). "A Short History of Atomic Layer Deposition: Tuomo Suntola's Atomic Layer Epitaxy". Chemical Vapor Deposition. 20 (10–11–12): 332–344. doi:10.1002/cvde.201402012. S2CID 137543630.
Ahvenniemi, Esko; Akbashev, Andrew R.; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Boyadjiev, Stefan; Cameron, David C.; Chen, Rong; Chubarov, Mikhail (2016). "Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the "Virtual Project on the History of ALD"". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 35 (1): 010801. Bibcode:2017JVSTA..35a0801A. doi:10.1116/1.4971389. S2CID 209855960.
Puurunen, Riikka. "Learnings from an Open Science Effort: Virtual Project on the History of ALD". ecsarxiv.org. doi:10.1149/osf.io/exyv3. S2CID 240379307. Retrieved 26 December 2018.
Parsons, Gregory N.; Elam, Jeffrey W.; George, Steven M.; Haukka, Suvi; Jeon, Hyeongtag; Kessels, W. M. M. (Erwin); Leskelä, Markku; Poodt, Paul; Ritala, Mikko (2013). "History of atomic layer deposition and its relationship with the American VacuumSociety". Journal of Vacuum Science & Technology A. 31 (5): 050818. Bibcode:2013JVSTA..31e0818P. doi:10.1116/1.4816548. S2CID 97676893.
Mistry, K.; Allen, C.; Auth, C.; Beattie, B.; Bergstrom, D.; Bost, M.; Brazier, M.; Buehler, M.; Cappellani, A.; Chau, R.; Choi, C.-H.; Ding, G.; Fischer, K.; Ghani, T.; Grover, R.; Han, W.; Hanken, D.; Hattendorf, M.; He, J.; Hicks, J.; Huessner, R.; Ingerly, D.; Jain, P.; James, R.; Jong, L.; Joshi, S.; Kenyon, C.; Kuhn, K.; Lee, K.; et al. (2007). "A 45nm Logic Technology with High-k+Metal Gate Transistors, Strained Silicon, 9 Cu Interconnect Layers, 193nm Dry Patterning, and 100% Pb-free Packaging" (PDF). 2007 IEEE International Electron Devices Meeting. pp. 247–250. doi:10.1109/IEDM.2007.4418914. ISBN 978-1-4244-1507-6. S2CID 12392861. Archived from the original (PDF) on 18 February 2008.
George, S.M. (2010). "Atomic Layer Deposition: An Overview". Chem. Rev. 110 (1): 111–131. doi:10.1021/cr900056b. PMID 19947596.
Knisley, Thomas J.; Kalutarage, Lakmal C.; Winter, Charles H. (December 2013). "Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films". Coordination Chemistry Reviews. 257 (23–24): 3222–3231. doi:10.1016/j.ccr.2013.03.019.
Gordon, Peter G.; Kurek, Agnieszka; Barry, Seán T. (2015). "Trends in Copper Precursor Development for CVD and ALD Applications". ECS Journal of Solid State Science and Technology. 4 (1): N3188–N3197. doi:10.1149/2.0261501jss. ISSN 2162-8769. S2CID 97668427.
Knisley, Thomas J.; Ariyasena, Thiloka C.; Sajavaara, Timo; Saly, Mark J.; Winter, Charles H. (25 October 2011). "Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition". Chemistry of Materials. 23 (20): 4417–4419. doi:10.1021/cm202475e. ISSN 0897-4756.
Guo, Zheng; Li, Hao; Chen, Qiang; Sang, Lijun; Yang, Lizhen; Liu, Zhongwei; Wang, Xinwei (8 September 2015). "Low-Temperature Atomic Layer Deposition of High Purity, Smooth, Low Resistivity Copper Films by Using Amidinate Precursor and Hydrogen Plasma". Chemistry of Materials. 27 (17): 5988–5996. doi:10.1021/acs.chemmater.5b02137. ISSN 0897-4756.
Klaus, J.W; Ferro, S.J; George, S.M (February 2000). "Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction". Thin Solid Films. 360 (1–2): 145–153. Bibcode:2000TSF...360..145K. doi:10.1016/S0040-6090(99)01076-7.
Seghete, D.; Rayner, G.B.; Cavanagh, A.S.; Anderson, V.R.; George, S.M. (12 April 2011). "Molybdenum Atomic Layer Deposition Using MoF 6 and Si 2 H 6 as the Reactants". Chemistry of Materials. 23 (7): 1668–1678. doi:10.1021/cm101673u. ISSN 0897-4756.
Grubbs, R. K.; Steinmetz, N. J.; George, S. M. (2004). "Gas phase reaction products during tungsten atomic layer deposition using WF[sub 6] and Si[sub 2]H[sub 6]". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22 (4): 1811. Bibcode:2004JVSTB..22.1811G. doi:10.1116/1.1767105.
Fabreguette, F.H.; Sechrist, Z.A.; Elam, J.W.; George, S.M. (September 2005). "Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6". Thin Solid Films. 488 (1–2): 103–110. Bibcode:2005TSF...488..103F. doi:10.1016/j.tsf.2005.04.114.
Elam, J.W; Nelson, C.E; Grubbs, R.K; George, S.M (May 2001). "Kinetics of the WF6 and Si2H6 surface reactions during tungsten atomic layer deposition". Surface Science. 479 (1–3): 121–135. Bibcode:2001SurSc.479..121E. doi:10.1016/S0039-6028(01)00969-4.
Kalutarage, Lakmal C.; Martin, Philip D.; Heeg, Mary Jane; Winter, Charles H. (28 August 2013). "Volatile and Thermally Stable Mid to Late Transition Metal Complexes Containing α-Imino Alkoxide Ligands, a New Strongly Reducing Coreagent, and Thermal Atomic Layer Deposition of Ni, Co, Fe, and Cr Metal Films". Journal of the American Chemical Society. 135 (34): 12588–12591. doi:10.1021/ja407014w. ISSN 0002-7863. PMID 23947400.
Klesko, Joseph P.; Thrush, Christopher M.; Winter, Charles H. (28 July 2015). "Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2-Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine". Chemistry of Materials. 27 (14): 4918–4921. doi:10.1021/acs.chemmater.5b01707. ISSN 0897-4756.
Stevens, Eric C.; Mousa, Moataz Bellah M.; Parsons, Gregory N. (November 2018). "Thermal atomic layer deposition of Sn metal using SnCl 4 and a vapor phase silyl dihydropyrazine reducing agent". Journal of Vacuum Science & Technology A. 36 (6): 06A106. Bibcode:2018JVSTA..36fA106S. doi:10.1116/1.5055212. ISSN 0734-2101. S2CID 104844454.
Blakeney, Kyle J.; Winter, Charles H. (27 March 2018). "Atomic Layer Deposition of Aluminum Metal Films Using a Thermally Stable Aluminum Hydride Reducing Agent". Chemistry of Materials. 30 (6): 1844–1848. doi:10.1021/acs.chemmater.8b00445. ISSN 0897-4756.
Brown, S.; Howe, J.Y.; Ma, Z.; Et (2008). "Surface Modification of Au/TiO₂ Catalysts by SiO₂ via Atomic Layer Deposition". The Journal of Physical Chemistry C. 112 (25): 9448–9457. doi:10.1021/jp801484h.
Werner, Florian; Stals, Walter; Gortzen, Roger; Veith, Boris; Brendel, Rolf; Schmidt, Jan (2011). "High-rate atomic layer deposition of Al₂O₃ for the surface passivation of Si solar cells". Energy Procedia. 8: 1301–306. doi:10.1016/j.egypro.2011.06.140.
Kim, H. (2003). "Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing". Journal of Vacuum Science and Technology. 21 (6): 2231. Bibcode:2003JVSTB..21.2231K. doi:10.1116/1.1622676.
Mackus, Adriaan J. M.; Garcia-Alonso, Diana; Knoops, Harm C. M.; Bol, Ageeth A.; Kessels, Wilhelmus M. M. (2013). "Room-Temperature Atomic Layer Deposition of Platinum". Chemistry of Materials. 25 (9): 1769–1774. doi:10.1021/cm400274n.
Potts, S.E.; Kessels, W.M.M. (December 2013). "Energy-enhanced atomic layer deposition for more process and precursor versatility". Coordination Chemistry Reviews. 257 (23–24): 3254–3270. doi:10.1016/j.ccr.2013.06.015.
Knoops, Harm C. M.; Braeken, Eline M. J.; de Peuter, Koen; Potts, Stephen E.; Haukka, Suvi; Pore, Viljami; Kessels, Wilhelmus M. M. (9 September 2015). "Atomic Layer Deposition of Silicon Nitride from Bis(tert-butylamino)silane and N₂ Plasma" (PDF). ACS Applied Materials & Interfaces. 7 (35): 19857–19862. doi:10.1021/acsami.5b06833. PMID 26305370.
Langereis, E.; Knoops, H. C. M.; Mackus, A. J. M.; Roozeboom, F.; van de Sanden, M. C. M.; Kessels, W. M. M. (15 October 2007). "Synthesis and in situ characterization of low-resistivity TaN_x films by remote plasma atomic layer deposition". Journal of Applied Physics. 102 (8): 083517–083517–11. Bibcode:2007JAP...102h3517L. doi:10.1063/1.2798598.
Elers, K.-E.; Saanila, V.; Soininen, P.J.; Li, W.-M.; Kostamo, J.T.; Haukka, S.; Juhanoja, J.; Besling, W.F.A. (2002). "Diffusion Barrier Deposition on a Copper Surface by Atomic Layer Deposition". Chemical Vapor Deposition. 8 (4): 149. doi:10.1002/1521-3862(20020704)8:4<149::AID-CVDE149>3.0.CO;2-F.
Waechtler, T.; et al. (2011). "ALD-grown seed layers for electrochemical copper deposition integrated with different diffusion barrier systems" (PDF). Microelectronic Engineering. 88 (5): 684–689. doi:10.1016/j.mee.2010.07.004.
van Delft, J A; Garcia-Alonso, D; Kessels, W M M (11 July 2012). "Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing". Semiconductor Science and Technology. 27 (7): 074002. Bibcode:2012SeScT..27g4002V. doi:10.1088/0268-1242/27/7/074002. ISSN 0268-1242. S2CID 55670928.
Schmidt, J.; Merkle, A.; Brendel, R.; Hoex, B.; de Sanden, M. C. M. van; Kessels, W. M. M. (September 2008). "Surface passivation of high-efficiency silicon solar cells by atomic-layer-deposited Al 2 O 3". Progress in Photovoltaics: Research and Applications. 16 (6): 461–466. doi:10.1002/pip.823. S2CID 97771156.
Seo, Seongrok; Jeong, Seonghwa; Park, Hyoungmin; Shin, Hyunjung; Park, Nam-Gyu (2019). "Atomic layer deposition for efficient and stable perovskite solar cells". Chemical Communications. 55 (17): 2403–2416. doi:10.1039/C8CC09578G. ISSN 1359-7345. PMID 30719523. S2CID 73448015.
MacFarlane, D. L; M. P. Christensen; A. E. Nagdi; G. A. Evans; L. R. Hunt; N. Huntoon; J. Kim; T. W. Kim; J. Kirk; T. LaFave Jr; K. Liu; V. Ramakrishna; M. Dabkowski; N. Sultana (2012). "Experiment and Theory of an Active Optical Filter". IEEE Journal of Quantum Electronics. 48 (3): 307–317. Bibcode:2012IJQE...48..307M. doi:10.1109/JQE.2011.2174615. S2CID 46191619.
Chen, Hong; Yuan, Lin; Song, Wei; Wu, Shongkui; Li, Dan (2008). "Biocompatible Polymer Materials: Role of Protein-surface Interactions". Progress in Polymer Science. 33 (11): 1059–1087. doi:10.1016/j.progpolymsci.2008.07.006.
Purniawan, A.; French, P.J.; Pandraud, G.; Sarro, P.M. (2010). "TiO₂ ALD nanolayer as evanescent waveguide for biomedical sensor applications". Procedia Engineering. 5: 1131–1135. doi:10.1016/j.proeng.2010.09.310.
Pang, Changhyun; Lee, Chanseok; Suh, Kahp-Yang (2013). "Recent Advances in Flexible Sensors for Wearable and Implantable Devices". Journal of Applied Polymer Science. 130 (3): 1429–1441. doi:10.1002/app.39461.
Adiga, Shashishekar P.; Curtiss, Larry A.; Elam, Jeffrey W.; Pellin, Michael J.; Shih, Chun-Che; Shih, Chun-Ming; Lin, Shing-Jong; Su, Yea-Yang; Gittard, Shaun D.; Zhang, Junping; Narayan, Roger J. (2008). "Nanoporous Materials for Biomedical Devices". Biological Materials Science. 60 (3): 26–32. Bibcode:2008JOM....60c..26A. doi:10.1007/s11837-008-0028-9. S2CID 135635044.
Lei Wenwen; Li Xingcun; Chen Qiang; Wang Zhengduo (February 2012). "Plasma-Assisted ALD of an Al2O3 Permeation Barrier Layer on Plastic". Plasma Science and Technology. 14 (2): 129. Bibcode:2012PlST...14..129L. doi:10.1088/1009-0630/14/2/09. ISSN 1009-0630. S2CID 250740101.
Park, Sang-Hee Ko; Oh, Jiyoung; Hwang, Chi-Sun; Yang, Yong Suk; Lee, Jeong-Ik; Chu, Hye Yong (January 2004). "Ultra thin film encapsulation of OLED on plastic substrate". Journal of Information Display. 5 (3): 30–34. doi:10.1080/15980316.2004.9651953. ISSN 1598-0316. S2CID 135967211.
Park, Sang-Hee Ko; Oh, Jiyoung; Hwang, Chi-Sun; Lee, Jeong-Ik; Yang, Yong Suk; Chu, Hye Yong; Kang, Kwang-Yong (14 October 2005). "Ultra Thin Film Encapsulation of OLED on Plastic Substrate". ETRI Journal. 27 (5): 545–550. doi:10.4218/etrij.05.0905.0006. ISSN 1225-6463. S2CID 58156645.
Heikkinen, Ismo T.S.; Marin, Giovanni; Bihari, Nupur; Ekstrum, Craig; Mayville, Pierce J.; Fei, Yuhuan; Hu, Yun Hang; Karppinen, Maarit; Savin, Hele; Pearce, Joshua M. (March 2020). "Atomic layer deposited aluminum oxide mitigates outgassing from fused filament fabrication–based 3-D printed components". Surface and Coatings Technology. 386: 125459. doi:10.1016/j.surfcoat.2020.125459. S2CID 212841294.
Hirvikorpi, Terhi; Laine, Risto; Vähä-Nissi, Mika; Kilpi, Väinö; Salo, Erkki; Li, Wei-Min; Lindfors, Sven; Vartiainen, Jari; Kenttä, Eija; Nikkola, Juha; Harlin, Ali (January 2014). "Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition". Thin Solid Films. 550: 164–169. Bibcode:2014TSF...550..164H. doi:10.1016/j.tsf.2013.10.148.
Langereis, E.; Heil, S B S.; Knoops, H C M.; Keuning, W.; Van De Sanden, M C M.; Kessels, W M M. (2009). "In situ spectroscopic ellipsometry as a versatile tool for studying atomic layer deposition". Journal of Physics D: Applied Physics. 42 (7): 1–19. doi:10.1088/0022-3727/42/7/073001. S2CID 97244909.
Leskelä, M.; Ritala, M. (2003). "Atomic layer deposition chemistry: Recent developments and future challenges" (PDF). Angewandte Chemie. 42 (45): 5548–54. doi:10.1002/anie.200301652. PMID 14639717. Archived from the original (PDF) on 14 July 2014.

ecsarxiv.org

Puurunen, Riikka. "Learnings from an Open Science Effort: Virtual Project on the History of ALD". ecsarxiv.org. doi:10.1149/osf.io/exyv3. S2CID 240379307. Retrieved 26 December 2018.

future-fab.com

Gutsche, M. (2003). "Atomic Layer Deposition for Advanced DRAM Applications". Future Fab Intl. 14. Archived from the original on 8 September 2005.

handle.net

hdl.handle.net

Cremers, Véronique; Puurunen, Riikka L.; Dendooven, Jolien (4 April 2019). "Conformality in atomic layer deposition: Current status overview of analysis and modelling". Applied Physics Reviews. 6 (2). AIP Publishing (published June 2019). doi:10.1063/1.5060967. eISSN 1931-9401. hdl:1854/LU-8614054.

harvard.edu

ui.adsabs.harvard.edu

Oviroh, Peter Ozaveshe; Akbarzadeh, Rokhsareh; Pan, Dongqing; Coetzee, Rigardt Alfred Maarten; Jen, Tien-Chien (2019). "New Development of Atomic Layer Deposition: Processes, Methods, and Applications". Science and Technology of Advanced Materials. 20 (1): 465–496. Bibcode:2019STAdM..20..465O. doi:10.1080/14686996.2019.1599694. PMC 6534251. PMID 31164953.
Puurunen, Riikka L. (15 June 2005). "Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process". Journal of Applied Physics. 97 (12): 121301–121301–52. Bibcode:2005JAP....97l1301P. doi:10.1063/1.1940727.
Miikkulainen, Ville; Leskelä, Markku; Ritala, Mikko; Puurunen, Riikka L. (14 January 2013). "Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends". Journal of Applied Physics. 113 (2): 021301–021301–101. Bibcode:2013JAP...113b1301M. doi:10.1063/1.4757907.
Puurunen, Riikka L. (15 June 2005). "Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process". Journal of Applied Physics. 97 (12): 121301–121301–52. Bibcode:2005JAP....97l1301P. doi:10.1063/1.1940727.
Knoops, Harm C. M.; Faraz, Tahsin; Arts, Karsten; Kessels, Wilhelmus M. M. (Erwin) (May 2019). "Status and prospects of plasma-assisted atomic layer deposition". Journal of Vacuum Science & Technology A. 37 (3): 030902. Bibcode:2019JVSTA..37c0902K. doi:10.1116/1.5088582. S2CID 108003079.
Ahvenniemi, Esko; Akbashev, Andrew R.; Ali, Saima; Bechelany, Mikhael; Berdova, Maria; Boyadjiev, Stefan; Cameron, David C.; Chen, Rong; Chubarov, Mikhail (2016). "Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the "Virtual Project on the History of ALD"". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 35 (1): 010801. Bibcode:2017JVSTA..35a0801A. doi:10.1116/1.4971389. S2CID 209855960.
Parsons, Gregory N.; Elam, Jeffrey W.; George, Steven M.; Haukka, Suvi; Jeon, Hyeongtag; Kessels, W. M. M. (Erwin); Leskelä, Markku; Poodt, Paul; Ritala, Mikko (2013). "History of atomic layer deposition and its relationship with the American VacuumSociety". Journal of Vacuum Science & Technology A. 31 (5): 050818. Bibcode:2013JVSTA..31e0818P. doi:10.1116/1.4816548. S2CID 97676893.
Klaus, J.W; Ferro, S.J; George, S.M (February 2000). "Atomic layer deposition of tungsten using sequential surface chemistry with a sacrificial stripping reaction". Thin Solid Films. 360 (1–2): 145–153. Bibcode:2000TSF...360..145K. doi:10.1016/S0040-6090(99)01076-7.
Grubbs, R. K.; Steinmetz, N. J.; George, S. M. (2004). "Gas phase reaction products during tungsten atomic layer deposition using WF[sub 6] and Si[sub 2]H[sub 6]". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 22 (4): 1811. Bibcode:2004JVSTB..22.1811G. doi:10.1116/1.1767105.
Fabreguette, F.H.; Sechrist, Z.A.; Elam, J.W.; George, S.M. (September 2005). "Quartz crystal microbalance study of tungsten atomic layer deposition using WF6 and Si2H6". Thin Solid Films. 488 (1–2): 103–110. Bibcode:2005TSF...488..103F. doi:10.1016/j.tsf.2005.04.114.
Elam, J.W; Nelson, C.E; Grubbs, R.K; George, S.M (May 2001). "Kinetics of the WF6 and Si2H6 surface reactions during tungsten atomic layer deposition". Surface Science. 479 (1–3): 121–135. Bibcode:2001SurSc.479..121E. doi:10.1016/S0039-6028(01)00969-4.
Stevens, Eric C.; Mousa, Moataz Bellah M.; Parsons, Gregory N. (November 2018). "Thermal atomic layer deposition of Sn metal using SnCl 4 and a vapor phase silyl dihydropyrazine reducing agent". Journal of Vacuum Science & Technology A. 36 (6): 06A106. Bibcode:2018JVSTA..36fA106S. doi:10.1116/1.5055212. ISSN 0734-2101. S2CID 104844454.
Kim, H. (2003). "Atomic layer deposition of metal and nitride thin films: Current research efforts and applications for semiconductor device processing". Journal of Vacuum Science and Technology. 21 (6): 2231. Bibcode:2003JVSTB..21.2231K. doi:10.1116/1.1622676.
Langereis, E.; Knoops, H. C. M.; Mackus, A. J. M.; Roozeboom, F.; van de Sanden, M. C. M.; Kessels, W. M. M. (15 October 2007). "Synthesis and in situ characterization of low-resistivity TaN_x films by remote plasma atomic layer deposition". Journal of Applied Physics. 102 (8): 083517–083517–11. Bibcode:2007JAP...102h3517L. doi:10.1063/1.2798598.
van Delft, J A; Garcia-Alonso, D; Kessels, W M M (11 July 2012). "Atomic layer deposition for photovoltaics: applications and prospects for solar cell manufacturing". Semiconductor Science and Technology. 27 (7): 074002. Bibcode:2012SeScT..27g4002V. doi:10.1088/0268-1242/27/7/074002. ISSN 0268-1242. S2CID 55670928.
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