Buffered oxide etch (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Buffered oxide etch" in English language version.

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Williams, K.R.; Muller, R.S. (Dec 1996). "Etch rates for micromachining processing". Journal of Microelectromechanical Systems. 5 (4): 256–269. doi:10.1109/84.546406.
Iliescua, Ciprian; Jing, Ji; Tay, Francis; Miao, Jianmin; Sun, Tietun (Aug 2005). "Characterization of masking layers for deep wet etching of glass in an improved HF/HCl solution". J. Surf. Coat. 198 (1–3): 314. doi:10.1016/j.surfcoat.2004.10.094.
Dumbre, Jayshri; Tong, Zherui; Dong, Dashen; Qiu, Dong; Easton, Mark (10 June 2024). "Buffered Oxide Etch: A Safer, More Effective Etchant for Additively Manufactured Ti-Alloys". Metallography, Microstructure, and Analysis. doi:10.1007/s13632-024-01094-x. Retrieved 18 September 2024.
Qin, Z.; et al. (23 July 2013). "Chemical Equilibrium Controlled Etching of MFI-Type Zeolite and Its Influence on Zeolite Structure, Acidity, and Catalytic Activity". Chemistry of Materials. 25 (14): 2759–2766. doi:10.1021/cm400719z. Retrieved 18 September 2024.

Dumbre, Jayshri; Tong, Zherui; Dong, Dashen; Qiu, Dong; Easton, Mark (10 June 2024). "Buffered Oxide Etch: A Safer, More Effective Etchant for Additively Manufactured Ti-Alloys". Metallography, Microstructure, and Analysis. doi:10.1007/s13632-024-01094-x. Retrieved 18 September 2024.

"Buffered Oxide Etch" (PDF). Integrated Nanosystems Research Facility. UC Irvine. Retrieved 18 September 2024.