CMOS (English Wikipedia)

Moorhead, Patrick (January 15, 2009). "Breaking Records with Dragons and Helium in the Las Vegas Desert". blogs.amd.com/patmoorhead. Archived from the original on September 15, 2010. Retrieved 2009-09-18.

archive.org (Global: 6^th place; English: 6^th place)

Gilder, George (1990). Microcosm: The Quantum Revolution In Economics And Technology. Simon and Schuster. pp. 144–5. ISBN 978-0-671-70592-3.
Higgins, Richard J. (1983). Electronics with digital and analog integrated circuits. Prentice-Hall. p. 101. ISBN 978-0-13-250704-2. The dominant difference is power: CMOS gates can consume about 100,000 times less power than their TTL equivalents!

arxiv.org (Global: 69^th place; English: 59^th place)

Prati, E.; De Michielis, M.; Belli, M.; Cocco, S.; Fanciulli, M.; Kotekar-Patil, D.; Ruoff, M.; Kern, D. P.; Wharam, D. A.; Verduijn, J.; Tettamanzi, G. C.; Rogge, S.; Roche, B.; Wacquez, R.; Jehl, X.; Vinet, M.; Sanquer, M. (2012). "Few electron limit of n-type metal oxide semiconductor single electron transistors". Nanotechnology. 23 (21) 215204. arXiv:1203.4811. Bibcode:2012Nanot..23u5204P. doi:10.1088/0957-4484/23/21/215204. PMID 22552118. S2CID 206063658.

bitsavers.org (Global: 4,153^rd place; English: 2,291^st place)

"CDP 1800 μP Commercially available" (PDF). Microcomputer Digest. 2 (4): 1–3. October 1975. Archived from the original (PDF) on 2019-09-23. Retrieved 2019-07-22.

books.google.com (Global: 3^rd place; English: 3^rd place)

Voinigescu, Sorin (2013). High-Frequency Integrated Circuits. Cambridge University Press. p. 164. ISBN 978-0-521-87302-4.
Deal, Bruce E. (1998). "Highlights Of Silicon Thermal Oxidation Technology". Silicon materials science and technology. The Electrochemical Society. p. 183. ISBN 978-1-56677-193-1.
Bassett, Ross Knox (2007). To the Digital Age: Research Labs, Start-up Companies, and the Rise of MOS Technology. Johns Hopkins University Press. pp. 22–23. ISBN 978-0-8018-8639-3.
Lojek, Bo (2007). History of Semiconductor Engineering. Springer. p. 330. ISBN 978-3-540-34258-8.
Kuhn, Kelin (2018). "CMOS and Beyond CMOS: Scaling Challenges". High Mobility Materials for CMOS Applications. Woodhead Publishing. p. 1. ISBN 978-0-08-102062-3.
Chen, Wai-Kai (2018). The VLSI Handbook. CRC Press. pp. 60–2. ISBN 978-1-4200-0596-7.
Morgado, Alonso; Río, Rocío del; Rosa, José M. de la (2011). Nanometer CMOS Sigma-Delta Modulators for Software Defined Radio. Springer. p. 1. ISBN 978-1-4614-0037-0.
Veendrick, Harry J. M. (2017). Nanometer CMOS ICs: From Basics to ASICs. Springer. p. 243. ISBN 978-3-319-47597-4.
Oliveira, Joao; Goes, João (2012). Parametric Analog Signal Amplification Applied to Nanoscale CMOS Technologies. Springer. p. 7. ISBN 978-1-4614-1670-8.

computerhistory.org (Global: 2,213^th place; English: 1,495^th place)

computerhistory.org

"1960 – Metal Oxide Semiconductor (MOS) Transistor Demonstrated". The Silicon Engine. Computer History Museum. Retrieved 2023-01-16.
"1960 - Metal Oxide Semiconductor (MOS) Transistor Demonstrated". The Silicon Engine. Computer History Museum.
"1963: Complementary MOS Circuit Configuration is Invented". Computer History Museum. Retrieved 6 July 2019.
"Tortoise of Transistors Wins the Race - CHM Revolution". Computer History Museum. Retrieved 22 July 2019.

archive.computerhistory.org

"Oral History of Thomas (Tom) Stanley" (PDF).

core.ac.uk (Global: 1,734^th place; English: 1,312^th place)

Gealow, Jeffrey Carl (10 August 1990). "Impact of Processing Technology on DRAM Sense Amplifier Design" (PDF). Massachusetts Institute of Technology. pp. 149–166. hdl:1721.1/61805/23264695-MIT. Retrieved 25 June 2019 – via CORE.

doi.org (Global: 2^nd place; English: 2^nd place)

Frosch, C. J.; Derick, L (1957). "Surface Protection and Selective Masking during Diffusion in Silicon". Journal of the Electrochemical Society. 104 (9): 547. doi:10.1149/1.2428650.
George Clifford, Sziklai (1953). "Symmetrical Properties of Transistors and Their Applications". Proceedings of the IRE. 41 (6): 717–724. doi:10.1109/JRPROC.1953.274250. S2CID 51639018.
Ahrons, Richard (2012). "Industrial Research in Microcircuitry at RCA: The Early Years, 1953–1963". IEEE Annals of the History of Computing. 12 (1): 60–73. Bibcode:2012IAHC...34a..60A. doi:10.1109/MAHC.2011.62. S2CID 18912623.
"IRE News and Radio Notes". Proceedings of the IRE. 42 (6): 1027–1043. 1954. doi:10.1109/JRPROC.1954.274784.
Wallmark, J.T.; Marcus, S.M. (1959). "Integrated devices using Direct-Coupled Unipolar Transistor Logic". 1959 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. Vol. EC-8. pp. 58–59. doi:10.1109/ISSCC.1959.1157035.
Huff, Howard; Riordan, Michael (2007-09-01). "Frosch and Derick: Fifty Years Later (Foreword)". The Electrochemical Society Interface. 16 (3): 29. doi:10.1149/2.F02073IF. ISSN 1064-8208.
Frosch, C. J.; Derick, L (1957). "Surface Protection and Selective Masking during Diffusion in Silicon". Journal of the Electrochemical Society. 104 (9): 547. doi:10.1149/1.2428650.
Ligenza, J. R.; Spitzer, W. G. (1960-07-01). "The mechanisms for silicon oxidation in steam and oxygen". Journal of Physics and Chemistry of Solids. 14: 131–136. Bibcode:1960JPCS...14..131L. doi:10.1016/0022-3697(60)90219-5. ISSN 0022-3697.
KAHNG, D. (1961). "Silicon-Silicon Dioxide Surface Device". Technical Memorandum of Bell Laboratories: 583–596. doi:10.1142/9789814503464_0076. Reprinted in Sze, S. M. (1991). Semiconductor Devices: Pioneering Papers. Singapore: World Scientific. doi:10.1142/1087. ISBN 978-981-02-0209-5.
Howard R. Duff (2001). "John Bardeen and transistor physics". AIP Conference Proceedings. Vol. 550. pp. 3–32. doi:10.1063/1.1354371.
Sah, Chih-Tang; Wanlass, Frank (1963). Nanowatt logic using field-effect metal-oxide semiconductor triodes. 1963 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. Vol. VI. pp. 32–33. doi:10.1109/ISSCC.1963.1157450.
Masuhara, Toshiaki; Minato, Osamu; Sasaki, Toshio; Sakai, Yoshio; Kubo, Masaharu; Yasui, Tokumasa (February 1978). A high-speed, low-power Hi-CMOS 4K static RAM. 1978 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. Vol. XXI. pp. 110–111. doi:10.1109/ISSCC.1978.1155749. S2CID 30753823.
Davari, Bijan; et al. (1988). "A high performance 0.25 mu m CMOS technology". Technical Digest, International Electron Devices Meeting 1988. pp. 56–59. doi:10.1109/IEDM.1988.32749. ISSN 0163-1918. S2CID 114078857. IEEE Cat. No. 88CH2528-8.
Stephens, Carlene; Dennis, Maggie (2000). "Engineering Time: Inventing the Electronic Wristwatch" (PDF). The British Journal for the History of Science. 33 (4). Cambridge University Press: 477–497 (485). doi:10.1017/S0007087400004167. ISSN 0007-0874. Archived from the original (PDF) on 2017-12-01. Retrieved 2019-11-10.
Martínez, A.L.H.; Khursheed, S.; Rossi, D. (2020). "Leveraging CMOS Aging for Efficient Microelectronics Design". 2020 IEEE 26th International Symposium on On-Line Testing and Robust System Design (IOLTS). pp. 1–4. doi:10.1109/IOLTS50870.2020.9159742. ISBN 978-1-7281-8187-5. S2CID 225582202.
Moiseev, Konstantin; Kolodny, Avinoam; Wimer, Shmuel (September 2008). "Timing-aware power-optimal ordering of signals". ACM Trans. Des. Autom. Electron. Syst. 13 (4). Article 65. CiteSeerX 10.1.1.222.9211. doi:10.1145/1391962.1391973. S2CID 18895687.
O'Neill, A. (2008). "Asad Abidi Recognized for Work in RF-CMOS". IEEE Solid-State Circuits Society Newsletter. 13 (1): 57–58. doi:10.1109/N-SSC.2008.4785694. ISSN 1098-4232.
Daneshrad, Babal; Eltawil, Ahmed M. (2002). "Integrated Circuit Technologies for Wireless Communications". Wireless Multimedia Network Technologies. The International Series in Engineering and Computer Science. 524. Springer US: 227–244. doi:10.1007/0-306-47330-5_13. ISBN 0-7923-8633-7.
Olstein, Katherine (Spring 2008). "Abidi Receives IEEE Pederson Award at ISSCC 2008". IEEE Solid-State Circuits Society Newsletter. 13 (2): 12. doi:10.1109/N-SSC.2008.4785734. S2CID 30558989.
Clark, D.T.; Ramsay, E.P.; Murphy, A.E.; Smith, D.A.; Thompson, Robin.F.; Young, R.A.R.; Cormack, J.D.; Zhu, C.; Finney, S.; Fletcher, J. (2011). "High Temperature Silicon Carbide CMOS Integrated Circuits". Materials Science Forum. 679–680: 726–729. doi:10.4028/www.scientific.net/msf.679-680.726. S2CID 110071501.
Prati, E.; De Michielis, M.; Belli, M.; Cocco, S.; Fanciulli, M.; Kotekar-Patil, D.; Ruoff, M.; Kern, D. P.; Wharam, D. A.; Verduijn, J.; Tettamanzi, G. C.; Rogge, S.; Roche, B.; Wacquez, R.; Jehl, X.; Vinet, M.; Sanquer, M. (2012). "Few electron limit of n-type metal oxide semiconductor single electron transistors". Nanotechnology. 23 (21) 215204. arXiv:1203.4811. Bibcode:2012Nanot..23u5204P. doi:10.1088/0957-4484/23/21/215204. PMID 22552118. S2CID 206063658.

drive.google.com (Global: 1,343^rd place; English: 1,354^th place)

"Silicon Gate MOS 2102A". Intel. Retrieved 27 June 2019.

eetasia.com (Global: low place; English: low place)

"Infineon Hits Bulk-CMOS RF Switch Milestone". EE Times. 20 November 2018. Retrieved 26 October 2019.

elsevier.com (Global: 610^th place; English: 704^th place)

linkinghub.elsevier.com

Ligenza, J. R.; Spitzer, W. G. (1960-07-01). "The mechanisms for silicon oxidation in steam and oxygen". Journal of Physics and Chemistry of Solids. 14: 131–136. Bibcode:1960JPCS...14..131L. doi:10.1016/0022-3697(60)90219-5. ISSN 0022-3697.

fairchildsemi.com (Global: low place; English: low place)

Fairchild. Application Note 77. "CMOS, the Ideal Logic Family"; Archived 2015-01-09 at the Wayback Machine. 1983.
"CMOS, the Ideal Logic Family" (PDF). Fairchild Semiconductor. January 1983. Archived from the original (PDF) on 2011-12-09. Retrieved 2011-11-25.

financialplanning24.com (Global: low place; English: low place)

"Global FinFET Technology Market 2024 Growth Analysis by Manufacturers, Regions, Type and Application, Forecast Analysis". Financial Planning. July 3, 2019. Archived from the original on 6 July 2019. Retrieved 6 July 2019.

freepatentsonline.com (Global: 5,449^th place; English: 3,875^th place)

"Low stand-by power complementary field effect circuitry" (PDF).

handle.net (Global: 102^nd place; English: 76^th place)

hdl.handle.net

Gealow, Jeffrey Carl (10 August 1990). "Impact of Processing Technology on DRAM Sense Amplifier Design" (PDF). Massachusetts Institute of Technology. pp. 149–166. hdl:1721.1/61805/23264695-MIT. Retrieved 25 June 2019 – via CORE.

harvard.edu (Global: 18^th place; English: 17^th place)

ui.adsabs.harvard.edu

Ahrons, Richard (2012). "Industrial Research in Microcircuitry at RCA: The Early Years, 1953–1963". IEEE Annals of the History of Computing. 12 (1): 60–73. Bibcode:2012IAHC...34a..60A. doi:10.1109/MAHC.2011.62. S2CID 18912623.
Ligenza, J. R.; Spitzer, W. G. (1960-07-01). "The mechanisms for silicon oxidation in steam and oxygen". Journal of Physics and Chemistry of Solids. 14: 131–136. Bibcode:1960JPCS...14..131L. doi:10.1016/0022-3697(60)90219-5. ISSN 0022-3697.
Prati, E.; De Michielis, M.; Belli, M.; Cocco, S.; Fanciulli, M.; Kotekar-Patil, D.; Ruoff, M.; Kern, D. P.; Wharam, D. A.; Verduijn, J.; Tettamanzi, G. C.; Rogge, S.; Roche, B.; Wacquez, R.; Jehl, X.; Vinet, M.; Sanquer, M. (2012). "Few electron limit of n-type metal oxide semiconductor single electron transistors". Nanotechnology. 23 (21) 215204. arXiv:1203.4811. Bibcode:2012Nanot..23u5204P. doi:10.1088/0957-4484/23/21/215204. PMID 22552118. S2CID 206063658.

ieee-uffc.org (Global: low place; English: low place)

Stephens, Carlene; Dennis, Maggie (2000). "Engineering Time: Inventing the Electronic Wristwatch" (PDF). The British Journal for the History of Science. 33 (4). Cambridge University Press: 477–497 (485). doi:10.1017/S0007087400004167. ISSN 0007-0874. Archived from the original (PDF) on 2017-12-01. Retrieved 2019-11-10.

ieee.org (Global: 652^nd place; English: 515^th place)

ieeexplore.ieee.org

Masuhara, Toshiaki; Minato, Osamu; Sakai, Yoshi; Sasaki, Toshio; Kubo, Masaharu; Yasui, Tokumasa (September 1978). "Short Channel Hi-CMOS Device and Circuits". ESSCIRC 78: 4th European Solid State Circuits Conference - Digest of Technical Papers: 131–2.

ieee.org

"IEEE Andrew S. Grove Award Recipients". IEEE Andrew S. Grove Award. Institute of Electrical and Electronics Engineers. Archived from the original on September 9, 2018. Retrieved 4 July 2019.

ewh.ieee.org

Nathawad, L.; Zargari, M.; Samavati, H.; Mehta, S.; Kheirkhaki, A.; Chen, P.; Gong, K.; Vakili-Amini, B.; Hwang, J.; Chen, M.; Terrovitis, M.; Kaczynski, B.; Limotyrakis, S.; Mack, M.; Gan, H.; Lee, M.; Abdollahi-Alibeik, B.; Baytekin, B.; Onodera, K.; Mendis, S.; Chang, A.; Jen, S.; Su, D.; Wooley, B. "20.2: A Dual-band CMOS MIMO Radio SoC for IEEE 802.11n Wireless LAN" (PDF). IEEE Entity Web Hosting. IEEE. Archived from the original (PDF) on 23 October 2016. Retrieved 22 October 2016.

spectrum.ieee.org

Mantooth, Alan; Zetterling, Carl-Mikael; Rusu, Ana (28 April 2021). "The Radio We Could Send to Hell: Silicon carbide radio circuits can take the volcanic heat of Venus". IEEE Spectrum.

intel.com (Global: 1,118^th place; English: 825^th place)

intel.com

"Intel Architecture Leads the Microarchitecture Innovation Field". Intel. Archived from the original on 29 June 2011. Retrieved 2 May 2018.

download.intel.com

"A chronological list of Intel products. The products are sorted by date" (PDF). Intel museum. Intel Corporation. July 2005. Archived from the original (PDF) on August 9, 2007. Retrieved July 31, 2007.

ionos.com (Global: low place; English: low place)

"What is CMOS?". IONOS Digitalguide. 8 December 2021. Retrieved 2022-01-21.

iop.org (Global: 1,725^th place; English: 1,828^th place)

iopscience.iop.org

Frosch, C. J.; Derick, L (1957). "Surface Protection and Selective Masking during Diffusion in Silicon". Journal of the Electrochemical Society. 104 (9): 547. doi:10.1149/1.2428650.
Huff, Howard; Riordan, Michael (2007-09-01). "Frosch and Derick: Fifty Years Later (Foreword)". The Electrochemical Society Interface. 16 (3): 29. doi:10.1149/2.F02073IF. ISSN 1064-8208.
Frosch, C. J.; Derick, L (1957). "Surface Protection and Selective Masking during Diffusion in Silicon". Journal of the Electrochemical Society. 104 (9): 547. doi:10.1149/1.2428650.

maltiel-consulting.com (Global: low place; English: low place)

"Memory". STOL (Semiconductor Technology Online). Archived from the original on 2 November 2023. Retrieved 25 June 2019.

nih.gov (Global: 4^th place; English: 4^th place)

pubmed.ncbi.nlm.nih.gov

Prati, E.; De Michielis, M.; Belli, M.; Cocco, S.; Fanciulli, M.; Kotekar-Patil, D.; Ruoff, M.; Kern, D. P.; Wharam, D. A.; Verduijn, J.; Tettamanzi, G. C.; Rogge, S.; Roche, B.; Wacquez, R.; Jehl, X.; Vinet, M.; Sanquer, M. (2012). "Few electron limit of n-type metal oxide semiconductor single electron transistors". Nanotechnology. 23 (21) 215204. arXiv:1203.4811. Bibcode:2012Nanot..23u5204P. doi:10.1088/0957-4484/23/21/215204. PMID 22552118. S2CID 206063658.

patents.google.com (Global: 1,182^nd place; English: 725^th place)

Sandhu, Gurtej; Doan, Trung T. (22 August 2001). "Atomic layer doping apparatus and method". Google Patents. Retrieved 5 July 2019.

psu.edu (Global: 207^th place; English: 136^th place)

citeseerx.ist.psu.edu

Moiseev, Konstantin; Kolodny, Avinoam; Wimer, Shmuel (September 2008). "Timing-aware power-optimal ordering of signals". ACM Trans. Des. Autom. Electron. Syst. 13 (4). Article 65. CiteSeerX 10.1.1.222.9211. doi:10.1145/1391962.1391973. S2CID 18895687.

semanticscholar.org (Global: 11^th place; English: 8^th place)

api.semanticscholar.org

George Clifford, Sziklai (1953). "Symmetrical Properties of Transistors and Their Applications". Proceedings of the IRE. 41 (6): 717–724. doi:10.1109/JRPROC.1953.274250. S2CID 51639018.
Ahrons, Richard (2012). "Industrial Research in Microcircuitry at RCA: The Early Years, 1953–1963". IEEE Annals of the History of Computing. 12 (1): 60–73. Bibcode:2012IAHC...34a..60A. doi:10.1109/MAHC.2011.62. S2CID 18912623.
Masuhara, Toshiaki; Minato, Osamu; Sasaki, Toshio; Sakai, Yoshio; Kubo, Masaharu; Yasui, Tokumasa (February 1978). A high-speed, low-power Hi-CMOS 4K static RAM. 1978 IEEE International Solid-State Circuits Conference. Digest of Technical Papers. Vol. XXI. pp. 110–111. doi:10.1109/ISSCC.1978.1155749. S2CID 30753823.
Davari, Bijan; et al. (1988). "A high performance 0.25 mu m CMOS technology". Technical Digest, International Electron Devices Meeting 1988. pp. 56–59. doi:10.1109/IEDM.1988.32749. ISSN 0163-1918. S2CID 114078857. IEEE Cat. No. 88CH2528-8.
Martínez, A.L.H.; Khursheed, S.; Rossi, D. (2020). "Leveraging CMOS Aging for Efficient Microelectronics Design". 2020 IEEE 26th International Symposium on On-Line Testing and Robust System Design (IOLTS). pp. 1–4. doi:10.1109/IOLTS50870.2020.9159742. ISBN 978-1-7281-8187-5. S2CID 225582202.
Moiseev, Konstantin; Kolodny, Avinoam; Wimer, Shmuel (September 2008). "Timing-aware power-optimal ordering of signals". ACM Trans. Des. Autom. Electron. Syst. 13 (4). Article 65. CiteSeerX 10.1.1.222.9211. doi:10.1145/1391962.1391973. S2CID 18895687.
Olstein, Katherine (Spring 2008). "Abidi Receives IEEE Pederson Award at ISSCC 2008". IEEE Solid-State Circuits Society Newsletter. 13 (2): 12. doi:10.1109/N-SSC.2008.4785734. S2CID 30558989.
Clark, D.T.; Ramsay, E.P.; Murphy, A.E.; Smith, D.A.; Thompson, Robin.F.; Young, R.A.R.; Cormack, J.D.; Zhu, C.; Finney, S.; Fletcher, J. (2011). "High Temperature Silicon Carbide CMOS Integrated Circuits". Materials Science Forum. 679–680: 726–729. doi:10.4028/www.scientific.net/msf.679-680.726. S2CID 110071501.
Prati, E.; De Michielis, M.; Belli, M.; Cocco, S.; Fanciulli, M.; Kotekar-Patil, D.; Ruoff, M.; Kern, D. P.; Wharam, D. A.; Verduijn, J.; Tettamanzi, G. C.; Rogge, S.; Roche, B.; Wacquez, R.; Jehl, X.; Vinet, M.; Sanquer, M. (2012). "Few electron limit of n-type metal oxide semiconductor single electron transistors". Nanotechnology. 23 (21) 215204. arXiv:1203.4811. Bibcode:2012Nanot..23u5204P. doi:10.1088/0957-4484/23/21/215204. PMID 22552118. S2CID 206063658.

shmj.or.jp (Global: low place; English: low place)

"1972 to 1973: CMOS LSI circuits for calculators (Sharp and Toshiba)" (PDF). Semiconductor History Museum of Japan. Archived from the original (PDF) on 2019-07-06. Retrieved 5 July 2019.
"Early 1970s: Evolution of CMOS LSI circuits for watches" (PDF). Semiconductor History Museum of Japan. Archived from the original (PDF) on 6 July 2019. Retrieved 6 July 2019.
"1978: Double-well fast CMOS SRAM (Hitachi)" (PDF). Semiconductor History Museum of Japan. Archived from the original (PDF) on 5 July 2019. Retrieved 5 July 2019.

springer.com (Global: 274^th place; English: 309^th place)

A good overview of leakage and reduction methods are explained in the book Leakage in Nanometer CMOS Technologies Archived 2011-12-02 at the Wayback Machine ISBN 0-387-25737-3.

toshiba.co.jp (Global: 9,918^th place; English: low place)

"Toshiba and Sony Make Major Advances in Semiconductor Process Technologies". Toshiba. 3 December 2002. Retrieved 26 June 2019.

tsmc.com (Global: low place; English: low place)

"A Banner Year: TSMC Annual Report 2004" (PDF). TSMC. Retrieved 5 July 2019.

web.archive.org (Global: 1^st place; English: 1^st place)

"What is CMOS Memory?". Wicked Sago. Archived from the original on 26 September 2014. Retrieved 3 March 2013.
Fairchild. Application Note 77. "CMOS, the Ideal Logic Family"; Archived 2015-01-09 at the Wayback Machine. 1983.
"Intel Architecture Leads the Microarchitecture Innovation Field". Intel. Archived from the original on 29 June 2011. Retrieved 2 May 2018.
"1972 to 1973: CMOS LSI circuits for calculators (Sharp and Toshiba)" (PDF). Semiconductor History Museum of Japan. Archived from the original (PDF) on 2019-07-06. Retrieved 5 July 2019.
"Early 1970s: Evolution of CMOS LSI circuits for watches" (PDF). Semiconductor History Museum of Japan. Archived from the original (PDF) on 6 July 2019. Retrieved 6 July 2019.
"1978: Double-well fast CMOS SRAM (Hitachi)" (PDF). Semiconductor History Museum of Japan. Archived from the original (PDF) on 5 July 2019. Retrieved 5 July 2019.
"CDP 1800 μP Commercially available" (PDF). Microcomputer Digest. 2 (4): 1–3. October 1975. Archived from the original (PDF) on 2019-09-23. Retrieved 2019-07-22.
"A chronological list of Intel products. The products are sorted by date" (PDF). Intel museum. Intel Corporation. July 2005. Archived from the original (PDF) on August 9, 2007. Retrieved July 31, 2007.
"IEEE Andrew S. Grove Award Recipients". IEEE Andrew S. Grove Award. Institute of Electrical and Electronics Engineers. Archived from the original on September 9, 2018. Retrieved 4 July 2019.
"Memory". STOL (Semiconductor Technology Online). Archived from the original on 2 November 2023. Retrieved 25 June 2019.
"Global FinFET Technology Market 2024 Growth Analysis by Manufacturers, Regions, Type and Application, Forecast Analysis". Financial Planning. July 3, 2019. Archived from the original on 6 July 2019. Retrieved 6 July 2019.
Stephens, Carlene; Dennis, Maggie (2000). "Engineering Time: Inventing the Electronic Wristwatch" (PDF). The British Journal for the History of Science. 33 (4). Cambridge University Press: 477–497 (485). doi:10.1017/S0007087400004167. ISSN 0007-0874. Archived from the original (PDF) on 2017-12-01. Retrieved 2019-11-10.
"CMOS, the Ideal Logic Family" (PDF). Fairchild Semiconductor. January 1983. Archived from the original (PDF) on 2011-12-09. Retrieved 2011-11-25.
A good overview of leakage and reduction methods are explained in the book Leakage in Nanometer CMOS Technologies Archived 2011-12-02 at the Wayback Machine ISBN 0-387-25737-3.
Nathawad, L.; Zargari, M.; Samavati, H.; Mehta, S.; Kheirkhaki, A.; Chen, P.; Gong, K.; Vakili-Amini, B.; Hwang, J.; Chen, M.; Terrovitis, M.; Kaczynski, B.; Limotyrakis, S.; Mack, M.; Gan, H.; Lee, M.; Abdollahi-Alibeik, B.; Baytekin, B.; Onodera, K.; Mendis, S.; Chang, A.; Jen, S.; Su, D.; Wooley, B. "20.2: A Dual-band CMOS MIMO Radio SoC for IEEE 802.11n Wireless LAN" (PDF). IEEE Entity Web Hosting. IEEE. Archived from the original (PDF) on 23 October 2016. Retrieved 22 October 2016.
Moorhead, Patrick (January 15, 2009). "Breaking Records with Dragons and Helium in the Las Vegas Desert". blogs.amd.com/patmoorhead. Archived from the original on September 15, 2010. Retrieved 2009-09-18.

wickedsago.blogspot.com (Global: low place; English: low place)

"What is CMOS Memory?". Wicked Sago. Archived from the original on 26 September 2014. Retrieved 3 March 2013.

worldcat.org (Global: 5^th place; English: 5^th place)

search.worldcat.org

Huff, Howard; Riordan, Michael (2007-09-01). "Frosch and Derick: Fifty Years Later (Foreword)". The Electrochemical Society Interface. 16 (3): 29. doi:10.1149/2.F02073IF. ISSN 1064-8208.
Ligenza, J. R.; Spitzer, W. G. (1960-07-01). "The mechanisms for silicon oxidation in steam and oxygen". Journal of Physics and Chemistry of Solids. 14: 131–136. Bibcode:1960JPCS...14..131L. doi:10.1016/0022-3697(60)90219-5. ISSN 0022-3697.
Davari, Bijan; et al. (1988). "A high performance 0.25 mu m CMOS technology". Technical Digest, International Electron Devices Meeting 1988. pp. 56–59. doi:10.1109/IEDM.1988.32749. ISSN 0163-1918. S2CID 114078857. IEEE Cat. No. 88CH2528-8.
Stephens, Carlene; Dennis, Maggie (2000). "Engineering Time: Inventing the Electronic Wristwatch" (PDF). The British Journal for the History of Science. 33 (4). Cambridge University Press: 477–497 (485). doi:10.1017/S0007087400004167. ISSN 0007-0874. Archived from the original (PDF) on 2017-12-01. Retrieved 2019-11-10.
O'Neill, A. (2008). "Asad Abidi Recognized for Work in RF-CMOS". IEEE Solid-State Circuits Society Newsletter. 13 (1): 57–58. doi:10.1109/N-SSC.2008.4785694. ISSN 1098-4232.

CMOS (English Wikipedia)

amd.com (Global: 2,816th place; English: 2,038th place)

blogs.amd.com

archive.org (Global: 6th place; English: 6th place)

arxiv.org (Global: 69th place; English: 59th place)

bitsavers.org (Global: 4,153rd place; English: 2,291st place)

books.google.com (Global: 3rd place; English: 3rd place)

computerhistory.org (Global: 2,213th place; English: 1,495th place)

computerhistory.org

archive.computerhistory.org

core.ac.uk (Global: 1,734th place; English: 1,312th place)

doi.org (Global: 2nd place; English: 2nd place)

drive.google.com (Global: 1,343rd place; English: 1,354th place)

eetasia.com (Global: low place; English: low place)

elsevier.com (Global: 610th place; English: 704th place)

linkinghub.elsevier.com

fairchildsemi.com (Global: low place; English: low place)

financialplanning24.com (Global: low place; English: low place)

freepatentsonline.com (Global: 5,449th place; English: 3,875th place)

handle.net (Global: 102nd place; English: 76th place)

hdl.handle.net

harvard.edu (Global: 18th place; English: 17th place)

ui.adsabs.harvard.edu

ieee-uffc.org (Global: low place; English: low place)

ieee.org (Global: 652nd place; English: 515th place)

ieeexplore.ieee.org

ieee.org

ewh.ieee.org

spectrum.ieee.org

intel.com (Global: 1,118th place; English: 825th place)

intel.com

download.intel.com

ionos.com (Global: low place; English: low place)

iop.org (Global: 1,725th place; English: 1,828th place)

iopscience.iop.org

maltiel-consulting.com (Global: low place; English: low place)

nih.gov (Global: 4th place; English: 4th place)

pubmed.ncbi.nlm.nih.gov

patents.google.com (Global: 1,182nd place; English: 725th place)

psu.edu (Global: 207th place; English: 136th place)

citeseerx.ist.psu.edu

semanticscholar.org (Global: 11th place; English: 8th place)

api.semanticscholar.org

shmj.or.jp (Global: low place; English: low place)

springer.com (Global: 274th place; English: 309th place)

toshiba.co.jp (Global: 9,918th place; English: low place)

tsmc.com (Global: low place; English: low place)

web.archive.org (Global: 1st place; English: 1st place)

wickedsago.blogspot.com (Global: low place; English: low place)

worldcat.org (Global: 5th place; English: 5th place)

search.worldcat.org

amd.com (Global: 2,816^th place; English: 2,038^th place)

archive.org (Global: 6^th place; English: 6^th place)

arxiv.org (Global: 69^th place; English: 59^th place)

bitsavers.org (Global: 4,153^rd place; English: 2,291^st place)

books.google.com (Global: 3^rd place; English: 3^rd place)

computerhistory.org (Global: 2,213^th place; English: 1,495^th place)

core.ac.uk (Global: 1,734^th place; English: 1,312^th place)

doi.org (Global: 2^nd place; English: 2^nd place)

drive.google.com (Global: 1,343^rd place; English: 1,354^th place)

elsevier.com (Global: 610^th place; English: 704^th place)

freepatentsonline.com (Global: 5,449^th place; English: 3,875^th place)

handle.net (Global: 102^nd place; English: 76^th place)

harvard.edu (Global: 18^th place; English: 17^th place)

ieee.org (Global: 652^nd place; English: 515^th place)

intel.com (Global: 1,118^th place; English: 825^th place)

iop.org (Global: 1,725^th place; English: 1,828^th place)

nih.gov (Global: 4^th place; English: 4^th place)

patents.google.com (Global: 1,182^nd place; English: 725^th place)

psu.edu (Global: 207^th place; English: 136^th place)

semanticscholar.org (Global: 11^th place; English: 8^th place)

springer.com (Global: 274^th place; English: 309^th place)

toshiba.co.jp (Global: 9,918^th place; English: low place)

web.archive.org (Global: 1^st place; English: 1^st place)

worldcat.org (Global: 5^th place; English: 5^th place)