Chhowalla, M.; Teo, K. B. K.; Ducati, C.; Rupesinghe, N. L.; Amaratunga, G. a. J.; Ferrari, A. C.; Roy, D.; Robertson, J.; Milne, W. I. (2001-10-31). "Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition". Journal of Applied Physics. 90 (10): 5308–5317. Bibcode:2001JAP....90.5308C. doi:10.1063/1.1410322. ISSN0021-8979.
Chhowalla, M.; Teo, K. B. K.; Ducati, C.; Rupesinghe, N. L.; Amaratunga, G. a. J.; Ferrari, A. C.; Roy, D.; Robertson, J.; Milne, W. I. (2001-10-31). "Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition". Journal of Applied Physics. 90 (10): 5308–5317. Bibcode:2001JAP....90.5308C. doi:10.1063/1.1410322. ISSN0021-8979.
Chhowalla, M.; Teo, K. B. K.; Ducati, C.; Rupesinghe, N. L.; Amaratunga, G. a. J.; Ferrari, A. C.; Roy, D.; Robertson, J.; Milne, W. I. (2001-10-31). "Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition". Journal of Applied Physics. 90 (10): 5308–5317. Bibcode:2001JAP....90.5308C. doi:10.1063/1.1410322. ISSN0021-8979.