Chemical vapor deposition (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Chemical vapor deposition" in English language version.

refsWebsite

Global rank English rank

29doi.org

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19harvard.edu

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10semanticscholar.org

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6worldcat.org

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6nih.gov

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4handle.net

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2sciencedirect.com

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2crystec.com

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2web.archive.org

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2arxiv.org

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1aip.org

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1ipme.ru

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1polymtl.ca

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1kuleuven.be

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1desy.de

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1mit.edu

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1lamresearch.com

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1zenodo.org

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1researchgate.net

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aip.org

pubs.aip.org

Shah, V.A.; Dobbie, A.; Myronov, M.; Leadley, D.R. (2010). "Reverse graded SiGe/Ge/Si buffers for high-composition virtual substrates" (PDF). Journal of Applied Physics. 107 (6): 064304–064304–11. Bibcode:2010JAP...107f4304S. doi:10.1063/1.3311556. ISSN 0021-8979.

arxiv.org

Park, Hye Jin; Meyer, Jannik; Roth, Siegmar; Skákalová, Viera (Spring 2010). "Growth and properties of few-layer graphene prepared by chemical vapor deposition". Carbon. 48 (4): 1088–1094. arXiv:0910.5841. Bibcode:2010Carbo..48.1088P. doi:10.1016/j.carbon.2009.11.030. ISSN 0008-6223. S2CID 15891662.
Tang, Shujie; Wang, Haomin; Wang, Huishan (2015). "Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride". Nature Communications. 6: 6499. arXiv:1503.02806. Bibcode:2015NatCo...6.6499T. doi:10.1038/ncomms7499. PMC 4382696. PMID 25757864.

crystec.com

"Low Pressure Chemical Vapor Deposition – Technology and Equipment". Crystec Technology Trading GmbH.
Crystec Technology Trading GmbH, Plasma Enhanced Chemical Vapor Deposition – Technology and Equipment

desy.de

bib-pubdb1.desy.de

Cruz, A.; Stassen, I.; Krishtab, M.; Marcoen, K.; Stassin, T.; Rodríguez-Hermida, S.; Teyssandier, J.; Pletincx, S.; Verbeke, R.; Rubio-Giménez, V.; Tatay, S.; Martí-Gastaldo, C.; Meersschaut, J.; Vereecken, P. M.; De Feyter, S.; Hauffman, T.; Ameloot, R. (2019). "Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films". Chemistry of Materials. 31 (22): 9462–9471. doi:10.1021/acs.chemmater.9b03435. hdl:10550/74201. S2CID 208737085.

doi.org

Sadri, Rad (15 January 2021). "Controlled physical properties and growth mechanism of manganese silicide nanorods". Journal of Alloys and Compounds. 851: 156693. doi:10.1016/j.jallcom.2020.156693. S2CID 224922987.
Shah, V.A.; Dobbie, A.; Myronov, M.; Leadley, D.R. (2010). "Reverse graded SiGe/Ge/Si buffers for high-composition virtual substrates" (PDF). Journal of Applied Physics. 107 (6): 064304–064304–11. Bibcode:2010JAP...107f4304S. doi:10.1063/1.3311556. ISSN 0021-8979.
Shareef, I. A.; Rubloff, G. W.; Anderle, M.; Gill, W. N.; Cotte, J.; Kim, D. H. (1995-07-01). "Subatmospheric chemical vapor deposition ozone/TEOS process for SiO₂ trench filling". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. 13 (4): 1888–1892. Bibcode:1995JVSTB..13.1888S. doi:10.1116/1.587830. ISSN 1071-1023.
Tavares, Jason; Swanson, E.J.; Coulombe, S. (2008). "Plasma Synthesis of Coated Metal Nanoparticles with Surface Properties Tailored for Dispersion". Plasma Processes and Polymers. 5 (8): 759. doi:10.1002/ppap.200800074.
Gleason, Karen K.; Kenneth K.S. Lau; Jeffrey A. Caulfield (2000). "Structure and Morphology of Fluorocarbon Films Grown by Hot Filament Chemical Vapor Deposition". Chemistry of Materials. 12 (10): 3032. doi:10.1021/cm000499w. S2CID 96618488.
Dorval Dion, C.A.; Tavares, J.R. (2013). "Photo-Initiated Chemical Vapour Deposition as a Scalable Particle Functionalization Technology (A Practical Review)" (PDF). Powder Technology. 239: 484–491. doi:10.1016/j.powtec.2013.02.024.
Wahl, Georg et al. (2000) "Thin Films" in Ullmann's Encyclopedia of Industrial Chemistry, Wiley-VCH, Weinheim. doi:10.1002/14356007.a26_681
Gleason, Karen; Ayse Asatekin; Miles C. Barr; Samaan H. Baxamusa; Kenneth K.S. Lau; Wyatt Tenhaeff; Jingjing Xu (May 2010). "Designing polymer surfaces via vapor deposition". Materials Today. 13 (5): 26–33. doi:10.1016/S1369-7021(10)70081-X. hdl:1721.1/88187.
Stassen, I; Styles, M; Grenci, G; Van Gorp, H; Vanderlinden, W; De Feyter, S; Falcaro, P; De Vos, D; Vereecken, P; Ameloot, R (2015). "Chemical vapour deposition of zeolitic imidazolate framework thin films". Nature Materials. 15 (3): 304–10. Bibcode:2016NatMa..15..304S. doi:10.1038/nmat4509. PMID 26657328.
Cruz, A.; Stassen, I.; Krishtab, M.; Marcoen, K.; Stassin, T.; Rodríguez-Hermida, S.; Teyssandier, J.; Pletincx, S.; Verbeke, R.; Rubio-Giménez, V.; Tatay, S.; Martí-Gastaldo, C.; Meersschaut, J.; Vereecken, P. M.; De Feyter, S.; Hauffman, T.; Ameloot, R. (2019). "Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films". Chemistry of Materials. 31 (22): 9462–9471. doi:10.1021/acs.chemmater.9b03435. hdl:10550/74201. S2CID 208737085.
Servi, Amelia T.; Guillen-Burrieza, Elena; Warsinger, David M.; Livernois, William; Notarangelo, Katie; Kharraz, Jehad; Lienhard V, John H.; Arafat, Hassan A.; Gleason, Karen K. (2017). "The effects of iCVD film thickness and conformality on the permeability and wetting of MD membranes" (PDF). Journal of Membrane Science. 523: 470–479. doi:10.1016/j.memsci.2016.10.008. hdl:1721.1/108260. ISSN 0376-7388. S2CID 4225384. Archived (PDF) from the original on 2018-07-23.
Simmler, W. "Silicon Compounds, Inorganic". Ullmann's Encyclopedia of Industrial Chemistry. Weinheim: Wiley-VCH. doi:10.1002/14356007.a24_001. ISBN 978-3-527-30673-2.
Cao, Guozhong; Wang, Ying (2011). Nanostructures and Nanomaterials -- Synthesis, Properties and Applications. World Scientific Publishing. p. 248. doi:10.1142/7885. ISBN 978-981-4322-50-8.
Maruyama, Toshiro (1994). "Electrochromic Properties of Niobium Oxide Thin Films Prepared by Chemical Vapor Deposition". Journal of the Electrochemical Society. 141 (10): 2868–2871. Bibcode:1994JElS..141.2868M. doi:10.1149/1.2059247.
Liu, Zhuchen; Tu, Zhiqiang; Li, Yongfeng; Yang, Fan; Han, Shuang; Yang, Wang; Zhang, Liqiang; Wang, Gang; Xu, Chunming (2014-05-01). "Synthesis of three-dimensional graphene from petroleum asphalt by chemical vapor deposition". Materials Letters. 122: 285–288. Bibcode:2014MatL..122..285L. doi:10.1016/j.matlet.2014.02.077.
Park, Hye Jin; Meyer, Jannik; Roth, Siegmar; Skákalová, Viera (Spring 2010). "Growth and properties of few-layer graphene prepared by chemical vapor deposition". Carbon. 48 (4): 1088–1094. arXiv:0910.5841. Bibcode:2010Carbo..48.1088P. doi:10.1016/j.carbon.2009.11.030. ISSN 0008-6223. S2CID 15891662.
Wei, Dacheng; Lu, Yunhao; Han, Cheng; Niu, Tianchao; Chen, Wei; Wee, Andrew Thye Shen (2013-10-31). "Critical Crystal Growth of Graphene on Dielectric Substrates at Low Temperature for Electronic Devices". Angewandte Chemie. 125 (52): 14371–14376. Bibcode:2013AngCh.12514371W. doi:10.1002/ange.201306086. ISSN 0044-8249. PMID 24173776.
Chen, Jianyi; Guo, Yunlong; Wen, Yugeng; Huang, Liping; Xue, Yunzhou; Geng, Dechao; Wu, Bin; Luo, Birong; Yu, Gui (2013-02-14). "Graphene: Two-Stage Metal-Catalyst-Free Growth of High-Quality Polycrystalline Graphene Films on Silicon Nitride Substrates (Adv. Mater. 7/2013)". Advanced Materials. 25 (7): 992–997. Bibcode:2013AdM....25..938C. doi:10.1002/adma.201370040. ISSN 0935-9648.
Patel, Rajen B.; Yu, Chi; Chou, Tsengming; Iqbal, Zafar (2014). "Novel synthesis route to graphene using iron nanoparticles". Journal of Materials Research. 29 (14): 1522–1527. Bibcode:2014JMatR..29.1522P. doi:10.1557/jmr.2014.165. S2CID 137786071.
Murakami, Katsuhisa; Tanaka, Shunsuke; Hirukawa, Ayaka; Hiyama, Takaki; Kuwajima, Tomoya; Kano, Emi; Takeguchi, Masaki; Fujita, Jun-ichi (2015). "Direct synthesis of large area graphene on insulating substrate by gallium vapor-assisted chemical vapor deposition". Applied Physics Letters. 106 (9): 093112. Bibcode:2015ApPhL.106i3112M. doi:10.1063/1.4914114.
Tang, Shujie; Wang, Haomin; Wang, Huishan (2015). "Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride". Nature Communications. 6: 6499. arXiv:1503.02806. Bibcode:2015NatCo...6.6499T. doi:10.1038/ncomms7499. PMC 4382696. PMID 25757864.
Zhang, CanKun; Lin, WeiYi; Zhao, ZhiJuan; Zhuang, PingPing; Zhan, LinJie; Zhou, YingHui; Cai, WeiWei (2015-09-05). "CVD synthesis of nitrogen-doped graphene using urea". Science China Physics, Mechanics & Astronomy. 58 (10): 107801. Bibcode:2015SCPMA..58.7801Z. doi:10.1007/s11433-015-5717-0. S2CID 101408264.
Kim, Sang-Min; Kim, Jae-Hyun; Kim, Kwang-Seop; Hwangbo, Yun; Yoon, Jong-Hyuk; Lee, Eun-Kyu; Ryu, Jaechul; Lee, Hak-Joo; Cho, Seungmin (2014). "Synthesis of CVD-graphene on rapidly heated copper foils". Nanoscale. 6 (9): 4728–34. Bibcode:2014Nanos...6.4728K. doi:10.1039/c3nr06434d. PMID 24658264. S2CID 5241809.
Das, Shantanu; Drucker, Jeff (2017). "Nucleation and growth of single layer graphene on electrodeposited Cu by cold wall chemical vapor deposition". Nanotechnology. 28 (10): 105601. Bibcode:2017Nanot..28j5601D. doi:10.1088/1361-6528/aa593b. PMID 28084218. S2CID 13407439.
Das, Shantanu; Drucker, Jeff (28 May 2018). "Pre-coalescence scaling of graphene island sizes". Journal of Applied Physics. 123 (20): 205306. Bibcode:2018JAP...123t5306D. doi:10.1063/1.5021341. S2CID 126154018.
Costello, M; Tossell, D; Reece, D; Brierley, C; Savage, J (1994). "Diamond protective coatings for optical components". Diamond and Related Materials. 3 (8): 1137–1141. Bibcode:1994DRM.....3.1137C. doi:10.1016/0925-9635(94)90108-2.
Sun Lee, Woong; Yu, Jin (2005). "Comparative study of thermally conductive fillers in underfill for the electronic components". Diamond and Related Materials. 14 (10): 1647–1653. Bibcode:2005DRM....14.1647S. doi:10.1016/j.diamond.2005.05.008.
Isberg, J (2004). "Single crystal diamond for electronic applications". Diamond and Related Materials. 13 (2): 320–324. Bibcode:2004DRM....13..320I. doi:10.1016/j.diamond.2003.10.017.
Krauss, A (2001). "Ultrananocrystalline diamond thin films for MEMS and moving mechanical assembly devices". Diamond and Related Materials. 10 (11): 1952–1961. Bibcode:2001DRM....10.1952K. doi:10.1016/S0925-9635(01)00385-5.

handle.net

hdl.handle.net

Gleason, Karen; Ayse Asatekin; Miles C. Barr; Samaan H. Baxamusa; Kenneth K.S. Lau; Wyatt Tenhaeff; Jingjing Xu (May 2010). "Designing polymer surfaces via vapor deposition". Materials Today. 13 (5): 26–33. doi:10.1016/S1369-7021(10)70081-X. hdl:1721.1/88187.
Cruz, A.; Stassen, I.; Krishtab, M.; Marcoen, K.; Stassin, T.; Rodríguez-Hermida, S.; Teyssandier, J.; Pletincx, S.; Verbeke, R.; Rubio-Giménez, V.; Tatay, S.; Martí-Gastaldo, C.; Meersschaut, J.; Vereecken, P. M.; De Feyter, S.; Hauffman, T.; Ameloot, R. (2019). "Integrated Cleanroom Process for the Vapor-Phase Deposition of Large-Area Zeolitic Imidazolate Framework Thin Films". Chemistry of Materials. 31 (22): 9462–9471. doi:10.1021/acs.chemmater.9b03435. hdl:10550/74201. S2CID 208737085.
Servi, Amelia T.; Guillen-Burrieza, Elena; Warsinger, David M.; Livernois, William; Notarangelo, Katie; Kharraz, Jehad; Lienhard V, John H.; Arafat, Hassan A.; Gleason, Karen K. (2017). "The effects of iCVD film thickness and conformality on the permeability and wetting of MD membranes" (PDF). Journal of Membrane Science. 523: 470–479. doi:10.1016/j.memsci.2016.10.008. hdl:1721.1/108260. ISSN 0376-7388. S2CID 4225384. Archived (PDF) from the original on 2018-07-23.
Rahtu, Antti (2002). Atomic Layer Deposition of High Permittivity Oxides: Film Growth and In Situ Studies (Thesis). University of Helsinki. hdl:10138/21065. ISBN 952-10-0646-3.

harvard.edu

ui.adsabs.harvard.edu

Shah, V.A.; Dobbie, A.; Myronov, M.; Leadley, D.R. (2010). "Reverse graded SiGe/Ge/Si buffers for high-composition virtual substrates" (PDF). Journal of Applied Physics. 107 (6): 064304–064304–11. Bibcode:2010JAP...107f4304S. doi:10.1063/1.3311556. ISSN 0021-8979.
Shareef, I. A.; Rubloff, G. W.; Anderle, M.; Gill, W. N.; Cotte, J.; Kim, D. H. (1995-07-01). "Subatmospheric chemical vapor deposition ozone/TEOS process for SiO₂ trench filling". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena. 13 (4): 1888–1892. Bibcode:1995JVSTB..13.1888S. doi:10.1116/1.587830. ISSN 1071-1023.
Stassen, I; Styles, M; Grenci, G; Van Gorp, H; Vanderlinden, W; De Feyter, S; Falcaro, P; De Vos, D; Vereecken, P; Ameloot, R (2015). "Chemical vapour deposition of zeolitic imidazolate framework thin films". Nature Materials. 15 (3): 304–10. Bibcode:2016NatMa..15..304S. doi:10.1038/nmat4509. PMID 26657328.
Maruyama, Toshiro (1994). "Electrochromic Properties of Niobium Oxide Thin Films Prepared by Chemical Vapor Deposition". Journal of the Electrochemical Society. 141 (10): 2868–2871. Bibcode:1994JElS..141.2868M. doi:10.1149/1.2059247.
Liu, Zhuchen; Tu, Zhiqiang; Li, Yongfeng; Yang, Fan; Han, Shuang; Yang, Wang; Zhang, Liqiang; Wang, Gang; Xu, Chunming (2014-05-01). "Synthesis of three-dimensional graphene from petroleum asphalt by chemical vapor deposition". Materials Letters. 122: 285–288. Bibcode:2014MatL..122..285L. doi:10.1016/j.matlet.2014.02.077.
Park, Hye Jin; Meyer, Jannik; Roth, Siegmar; Skákalová, Viera (Spring 2010). "Growth and properties of few-layer graphene prepared by chemical vapor deposition". Carbon. 48 (4): 1088–1094. arXiv:0910.5841. Bibcode:2010Carbo..48.1088P. doi:10.1016/j.carbon.2009.11.030. ISSN 0008-6223. S2CID 15891662.
Wei, Dacheng; Lu, Yunhao; Han, Cheng; Niu, Tianchao; Chen, Wei; Wee, Andrew Thye Shen (2013-10-31). "Critical Crystal Growth of Graphene on Dielectric Substrates at Low Temperature for Electronic Devices". Angewandte Chemie. 125 (52): 14371–14376. Bibcode:2013AngCh.12514371W. doi:10.1002/ange.201306086. ISSN 0044-8249. PMID 24173776.
Chen, Jianyi; Guo, Yunlong; Wen, Yugeng; Huang, Liping; Xue, Yunzhou; Geng, Dechao; Wu, Bin; Luo, Birong; Yu, Gui (2013-02-14). "Graphene: Two-Stage Metal-Catalyst-Free Growth of High-Quality Polycrystalline Graphene Films on Silicon Nitride Substrates (Adv. Mater. 7/2013)". Advanced Materials. 25 (7): 992–997. Bibcode:2013AdM....25..938C. doi:10.1002/adma.201370040. ISSN 0935-9648.
Patel, Rajen B.; Yu, Chi; Chou, Tsengming; Iqbal, Zafar (2014). "Novel synthesis route to graphene using iron nanoparticles". Journal of Materials Research. 29 (14): 1522–1527. Bibcode:2014JMatR..29.1522P. doi:10.1557/jmr.2014.165. S2CID 137786071.
Murakami, Katsuhisa; Tanaka, Shunsuke; Hirukawa, Ayaka; Hiyama, Takaki; Kuwajima, Tomoya; Kano, Emi; Takeguchi, Masaki; Fujita, Jun-ichi (2015). "Direct synthesis of large area graphene on insulating substrate by gallium vapor-assisted chemical vapor deposition". Applied Physics Letters. 106 (9): 093112. Bibcode:2015ApPhL.106i3112M. doi:10.1063/1.4914114.
Tang, Shujie; Wang, Haomin; Wang, Huishan (2015). "Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride". Nature Communications. 6: 6499. arXiv:1503.02806. Bibcode:2015NatCo...6.6499T. doi:10.1038/ncomms7499. PMC 4382696. PMID 25757864.
Zhang, CanKun; Lin, WeiYi; Zhao, ZhiJuan; Zhuang, PingPing; Zhan, LinJie; Zhou, YingHui; Cai, WeiWei (2015-09-05). "CVD synthesis of nitrogen-doped graphene using urea". Science China Physics, Mechanics & Astronomy. 58 (10): 107801. Bibcode:2015SCPMA..58.7801Z. doi:10.1007/s11433-015-5717-0. S2CID 101408264.
Kim, Sang-Min; Kim, Jae-Hyun; Kim, Kwang-Seop; Hwangbo, Yun; Yoon, Jong-Hyuk; Lee, Eun-Kyu; Ryu, Jaechul; Lee, Hak-Joo; Cho, Seungmin (2014). "Synthesis of CVD-graphene on rapidly heated copper foils". Nanoscale. 6 (9): 4728–34. Bibcode:2014Nanos...6.4728K. doi:10.1039/c3nr06434d. PMID 24658264. S2CID 5241809.
Das, Shantanu; Drucker, Jeff (2017). "Nucleation and growth of single layer graphene on electrodeposited Cu by cold wall chemical vapor deposition". Nanotechnology. 28 (10): 105601. Bibcode:2017Nanot..28j5601D. doi:10.1088/1361-6528/aa593b. PMID 28084218. S2CID 13407439.
Das, Shantanu; Drucker, Jeff (28 May 2018). "Pre-coalescence scaling of graphene island sizes". Journal of Applied Physics. 123 (20): 205306. Bibcode:2018JAP...123t5306D. doi:10.1063/1.5021341. S2CID 126154018.
Costello, M; Tossell, D; Reece, D; Brierley, C; Savage, J (1994). "Diamond protective coatings for optical components". Diamond and Related Materials. 3 (8): 1137–1141. Bibcode:1994DRM.....3.1137C. doi:10.1016/0925-9635(94)90108-2.
Sun Lee, Woong; Yu, Jin (2005). "Comparative study of thermally conductive fillers in underfill for the electronic components". Diamond and Related Materials. 14 (10): 1647–1653. Bibcode:2005DRM....14.1647S. doi:10.1016/j.diamond.2005.05.008.
Isberg, J (2004). "Single crystal diamond for electronic applications". Diamond and Related Materials. 13 (2): 320–324. Bibcode:2004DRM....13..320I. doi:10.1016/j.diamond.2003.10.017.
Krauss, A (2001). "Ultrananocrystalline diamond thin films for MEMS and moving mechanical assembly devices". Diamond and Related Materials. 10 (11): 1952–1961. Bibcode:2001DRM....10.1952K. doi:10.1016/S0925-9635(01)00385-5.

ipme.ru

Schropp, R.E.I.; B. Stannowski; A.M. Brockhoff; P.A.T.T. van Veenendaal; J.K. Rath. "Hot wire CVD of heterogeneous and polycrystalline silicon semiconducting thin films for application in thin film transistors and solar cells" (PDF). Materials Physics and Mechanics. pp. 73–82. Archived (PDF) from the original on 2005-02-15.

kuleuven.be

lirias.kuleuven.be

Stassen, I; Styles, M; Grenci, G; Van Gorp, H; Vanderlinden, W; De Feyter, S; Falcaro, P; De Vos, D; Vereecken, P; Ameloot, R (2015). "Chemical vapour deposition of zeolitic imidazolate framework thin films". Nature Materials. 15 (3): 304–10. Bibcode:2016NatMa..15..304S. doi:10.1038/nmat4509. PMID 26657328.

lamresearch.com

"ALTUS Product Family". Lam Research. Retrieved 2021-04-21.

mit.edu

dspace.mit.edu

Servi, Amelia T.; Guillen-Burrieza, Elena; Warsinger, David M.; Livernois, William; Notarangelo, Katie; Kharraz, Jehad; Lienhard V, John H.; Arafat, Hassan A.; Gleason, Karen K. (2017). "The effects of iCVD film thickness and conformality on the permeability and wetting of MD membranes" (PDF). Journal of Membrane Science. 523: 470–479. doi:10.1016/j.memsci.2016.10.008. hdl:1721.1/108260. ISSN 0376-7388. S2CID 4225384. Archived (PDF) from the original on 2018-07-23.

nih.gov

pubmed.ncbi.nlm.nih.gov

Stassen, I; Styles, M; Grenci, G; Van Gorp, H; Vanderlinden, W; De Feyter, S; Falcaro, P; De Vos, D; Vereecken, P; Ameloot, R (2015). "Chemical vapour deposition of zeolitic imidazolate framework thin films". Nature Materials. 15 (3): 304–10. Bibcode:2016NatMa..15..304S. doi:10.1038/nmat4509. PMID 26657328.
Wei, Dacheng; Lu, Yunhao; Han, Cheng; Niu, Tianchao; Chen, Wei; Wee, Andrew Thye Shen (2013-10-31). "Critical Crystal Growth of Graphene on Dielectric Substrates at Low Temperature for Electronic Devices". Angewandte Chemie. 125 (52): 14371–14376. Bibcode:2013AngCh.12514371W. doi:10.1002/ange.201306086. ISSN 0044-8249. PMID 24173776.
Tang, Shujie; Wang, Haomin; Wang, Huishan (2015). "Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride". Nature Communications. 6: 6499. arXiv:1503.02806. Bibcode:2015NatCo...6.6499T. doi:10.1038/ncomms7499. PMC 4382696. PMID 25757864.
Kim, Sang-Min; Kim, Jae-Hyun; Kim, Kwang-Seop; Hwangbo, Yun; Yoon, Jong-Hyuk; Lee, Eun-Kyu; Ryu, Jaechul; Lee, Hak-Joo; Cho, Seungmin (2014). "Synthesis of CVD-graphene on rapidly heated copper foils". Nanoscale. 6 (9): 4728–34. Bibcode:2014Nanos...6.4728K. doi:10.1039/c3nr06434d. PMID 24658264. S2CID 5241809.
Das, Shantanu; Drucker, Jeff (2017). "Nucleation and growth of single layer graphene on electrodeposited Cu by cold wall chemical vapor deposition". Nanotechnology. 28 (10): 105601. Bibcode:2017Nanot..28j5601D. doi:10.1088/1361-6528/aa593b. PMID 28084218. S2CID 13407439.

ncbi.nlm.nih.gov

Tang, Shujie; Wang, Haomin; Wang, Huishan (2015). "Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride". Nature Communications. 6: 6499. arXiv:1503.02806. Bibcode:2015NatCo...6.6499T. doi:10.1038/ncomms7499. PMC 4382696. PMID 25757864.

polymtl.ca

publications.polymtl.ca

Dorval Dion, C.A.; Tavares, J.R. (2013). "Photo-Initiated Chemical Vapour Deposition as a Scalable Particle Functionalization Technology (A Practical Review)" (PDF). Powder Technology. 239: 484–491. doi:10.1016/j.powtec.2013.02.024.

researchgate.net

Isberg, J (2004). "Single crystal diamond for electronic applications". Diamond and Related Materials. 13 (2): 320–324. Bibcode:2004DRM....13..320I. doi:10.1016/j.diamond.2003.10.017.

sciencedirect.com

Sadri, Rad (15 January 2021). "Controlled physical properties and growth mechanism of manganese silicide nanorods". Journal of Alloys and Compounds. 851: 156693. doi:10.1016/j.jallcom.2020.156693. S2CID 224922987.
"Chemical Vapour Deposition - an overview | ScienceDirect Topics". www.sciencedirect.com. Retrieved 2022-10-20.

semanticscholar.org

api.semanticscholar.org

Sadri, Rad (15 January 2021). "Controlled physical properties and growth mechanism of manganese silicide nanorods". Journal of Alloys and Compounds. 851: 156693. doi:10.1016/j.jallcom.2020.156693. S2CID 224922987.
Gleason, Karen K.; Kenneth K.S. Lau; Jeffrey A. Caulfield (2000). "Structure and Morphology of Fluorocarbon Films Grown by Hot Filament Chemical Vapor Deposition". Chemistry of Materials. 12 (10): 3032. doi:10.1021/cm000499w. S2CID 96618488.
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