Computational lithography (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Computational lithography" in English language version.

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Moretti, Gabe (2008-10-13), "Custom litho addresses 22-nm IC manufacturing", EETimes, archived from the original on 2013-01-22

doi.org

E. Lam; A. Wong (2009), "Computation lithography: virtual reality and virtual virtuality", Optics Express, 17 (15): 12259–12268, Bibcode:2009OExpr..1712259L, doi:10.1364/OE.17.012259, hdl:10722/62090, PMID 19654627
S. Chan; A. Wong; E. Lam (2008), "Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography", Optics Express, 16 (19): 14746–14760, Bibcode:2008OExpr..1614746C, doi:10.1364/OE.16.014746, PMID 18795012

eetimes.com

McGrath, Dylan (2005-12-16), "DFM pumps up the volume", EETimes
McGrath, Dylan (2005-02-12), "Litho simulation vendor opens Japanese subsidiary", EETimes
LaPedus, Mark (2008-09-17), "IBM rolls 'computational scaling' for litho at 22-nm", EETimes
LaPedus, Mark (2008-02-25), "Gauda claims OPC acceleration breakthrough.", EE Times
Moretti, Gabe (2008-10-13), "Custom litho addresses 22-nm IC manufacturing", EETimes, archived from the original on 2013-01-22

electronicsweekly.com

"Reticle enhancement technology will extend life of 193nm litho", Electronics Weekly, 2004-02-25

gale.com

go.gale.com

Wiley, Jim (May 2006), "Future challenges in computational lithography", Solid State Technology

handle.net

hdl.handle.net

E. Lam; A. Wong (2009), "Computation lithography: virtual reality and virtual virtuality", Optics Express, 17 (15): 12259–12268, Bibcode:2009OExpr..1712259L, doi:10.1364/OE.17.012259, hdl:10722/62090, PMID 19654627

harvard.edu

ui.adsabs.harvard.edu

E. Lam; A. Wong (2009), "Computation lithography: virtual reality and virtual virtuality", Optics Express, 17 (15): 12259–12268, Bibcode:2009OExpr..1712259L, doi:10.1364/OE.17.012259, hdl:10722/62090, PMID 19654627
S. Chan; A. Wong; E. Lam (2008), "Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography", Optics Express, 16 (19): 14746–14760, Bibcode:2008OExpr..1614746C, doi:10.1364/OE.16.014746, PMID 18795012

highbeam.com

"Major US Semiconductor Maker Chooses TMA for OPC Software", PRNewswire, 1997-10-16^{[dead link]}

nih.gov

pubmed.ncbi.nlm.nih.gov

E. Lam; A. Wong (2009), "Computation lithography: virtual reality and virtual virtuality", Optics Express, 17 (15): 12259–12268, Bibcode:2009OExpr..1712259L, doi:10.1364/OE.17.012259, hdl:10722/62090, PMID 19654627
S. Chan; A. Wong; E. Lam (2008), "Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography", Optics Express, 16 (19): 14746–14760, Bibcode:2008OExpr..1614746C, doi:10.1364/OE.16.014746, PMID 18795012

opticsinfobase.org

E. Lam; A. Wong (2009), "Computation lithography: virtual reality and virtual virtuality", Optics Express, 17 (15): 12259–12268, Bibcode:2009OExpr..1712259L, doi:10.1364/OE.17.012259, hdl:10722/62090, PMID 19654627
S. Chan; A. Wong; E. Lam (2008), "Initialization for robust inverse synthesis of phase-shifting masks in optical projection lithography", Optics Express, 16 (19): 14746–14760, Bibcode:2008OExpr..1614746C, doi:10.1364/OE.16.014746, PMID 18795012

web.archive.org

Hand, Aaron (November 2007), "Nikon and Synopsys Deliver on Advanced OPC Promise", Semiconductor International, archived from the original on 2009-08-09, retrieved 2010-01-15