For one of many examples, see Polyimides: materials, processing and applications, by A.J. Kirby, google books link
doi.org
Ritz, Hans (1932). "Durchschlagfeldstärke des homogenen Feldes in Luft". Archiv für Elektrotechnik. 26 (4): 219–232. doi:10.1007/BF01657189. S2CID108697400.
Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Gittner, Matthias; Schultheiß, Eberhard; Brode, Wolfgang; Hartung, Johannes (2009-01-21). "Electrical insulation properties of sputter-deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 °C". Physica Status Solidi A. 206 (3): 514–519. Bibcode:2009PSSAR.206..514B. doi:10.1002/pssa.200880481. S2CID93228294.
Lyon, David; et al. (2013). "Gap size dependence of the dielectric strength in nano vacuum gaps". IEEE. 20 (4): 1467–1471. doi:10.1109/TDEI.2013.6571470. S2CID709782.
Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Gittner, Matthias; Schultheiß, Eberhard; Brode, Wolfgang; Hartung, Johannes (2009-01-21). "Electrical insulation properties of sputter-deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 °C". Physica Status Solidi A. 206 (3): 514–519. Bibcode:2009PSSAR.206..514B. doi:10.1002/pssa.200880481. S2CID93228294.
Ritz, Hans (1932). "Durchschlagfeldstärke des homogenen Feldes in Luft". Archiv für Elektrotechnik. 26 (4): 219–232. doi:10.1007/BF01657189. S2CID108697400.
Bartzsch, Hagen; Glöß, Daniel; Frach, Peter; Gittner, Matthias; Schultheiß, Eberhard; Brode, Wolfgang; Hartung, Johannes (2009-01-21). "Electrical insulation properties of sputter-deposited SiO2, Si3N4 and Al2O3 films at room temperature and 400 °C". Physica Status Solidi A. 206 (3): 514–519. Bibcode:2009PSSAR.206..514B. doi:10.1002/pssa.200880481. S2CID93228294.
Lyon, David; et al. (2013). "Gap size dependence of the dielectric strength in nano vacuum gaps". IEEE. 20 (4): 1467–1471. doi:10.1109/TDEI.2013.6571470. S2CID709782.