Electron-beam lithography (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Electron-beam lithography" in English language version.

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28doi.org

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14harvard.edu

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6semanticscholar.org

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5nih.gov

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4web.archive.org

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2linkedin.com

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2ims.co.at

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1cornell.edu

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1micronic.se

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1spie.org

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1euvlitho.com

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1semiwiki.com

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1mit.edu

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1kb.se

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1multibeamcorp.com

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1mapperlithography.com

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cornell.edu

cnf.cornell.edu

McCord, M A.; Rooks, M.J. (2000). "2. Electron beam lithography". Microlithography. SPIE Handbook of Microlithography, Micromachining and Microfabrication. Vol. 1. Archived from the original on 2019-08-19. Retrieved 2007-01-04.

doi.org

Parker, N. W.; et al. (2000). Dobisz, Elizabeth A. (ed.). "High-throughput NGL electron-beam direct-write lithography system". Proc. SPIE. Emerging Lithographic Technologies IV. 3997: 713. Bibcode:2000SPIE.3997..713P. doi:10.1117/12.390042. S2CID 109415718.
Kempsell, M.L.; Hendrickx, E.; Tritchkov, A.; Sakajiri, K.; Yasui, K.; Yoshitake, S.; Granik, Y.; Vandenberghe, G.; Smith, B.W. (2009). "Inverse lithography for 45-nm-node contact holes at 1.35 numerical aperture". Journal of Micro/Nanolithography, MEMS, and MOEMS. 8 (4): 043001. doi:10.1117/1.3263702.
Sunaoshi, H.; Tachikawa, Y.; Higurashi, H.; Iijima, T.; Suzuki, J.; Kamikubo, T.; Ohtoshi, K.; Anze, H.; Katsumata, T.; Nakayamada, N.; Hara, S.; Tamamushi, S.; Ogawa, Y. (2006). "EBM-5000: electron-beam mask writer for 45-nm node". Photomask and Next-Generation Lithography Mask Technology XIII. SPIE Proceedings. Vol. 6283. p. 628306. doi:10.1117/12.681732.
Chen, Frederick; Chen, Wei-Su; Tsai, Ming-Jinn; Ku, Tzu-Kun (2013). "Sidewall profile inclination modulation mask (SPIMM): modification of an attenuated phase-shift mask for single-exposure double and multiple patterning". Optical Microlithography XXVI. SPIE Proceedings. Vol. 8683. p. 868311. doi:10.1117/12.2008886.
Ichimura, Koji; Yoshida, Koji; Cho, Hideki; Hikichi, Ryugo; Kurihara, Masaaki (2022). "Characteristics of fine feature hole templates for nanoimprint lithography toward 2nm and beyond". Photomask Technology. SPIE Proceedings. Vol. 12293. pp. 122930F. doi:10.1117/12.2643250.
Stoffels, E; Stoffels, W W; Kroesen, G M W (2001). "Plasma chemistry and surface processes of negative ions". Plasma Sources Science and Technology. 10 (2): 311. Bibcode:2001PSST...10..311S. CiteSeerX 10.1.1.195.9811. doi:10.1088/0963-0252/10/2/321. S2CID 250916447.
Seah, M. P.; Dench, W. A. (1979). "Quantitative electron spectroscopy of surfaces: A standard data base for electron inelastic mean free paths in solids". Surface and Interface Analysis. 1: 2. doi:10.1002/sia.740010103.
Tanuma, S.; Powell, C. J.; Penn, D. R. (1994). "Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50–2000 eV range". Surface and Interface Analysis. 21 (3): 165. doi:10.1002/sia.740210302.
Broers, A. N.; et al. (1996). "Electron beam lithography—Resolution limits". Microelectronic Engineering. 32 (1–4): 131–142. doi:10.1016/0167-9317(95)00368-1.
K. W. Lee (2009). "Secondary electron generation in electron-beam-irradiated solids:resolution limits to nanolithography". J. Korean Phys. Soc. 55 (4): 1720. Bibcode:2009JKPS...55.1720L. doi:10.3938/jkps.55.1720. Archived from the original on 2011-07-22.
Dapor, M.; et al. (2010). "Monte Carlo modeling in the low-energy domain of the secondary electron emission of polymethylmethacrylate for critical-dimension scanning electron microscopy". J. Micro/Nanolith. MEMS MOEMS. 9 (2): 023001. doi:10.1117/1.3373517.
P. T. Henderson; et al. (1999). "Long-distance charge transport in duplex DNA: The phonon-assisted polaron-like hopping mechanism". Proc. Natl. Acad. Sci. U.S.A. 96 (15): 8353–8358. Bibcode:1999PNAS...96.8353H. doi:10.1073/pnas.96.15.8353. PMC 17521. PMID 10411879.
H. Seiler (1983). "Secondary electron emission in the scanning electron microscope". J. Appl. Phys. 54 (11): R1 – R18. Bibcode:1983JAP....54R...1S. doi:10.1063/1.332840.
Chandramouli, M.; Liu, B.; Alberti, Z.; Abboud, F.; Hochleitner, G.; Wroczewski, W.; Kuhn, S.; Klein, C.; Platzgummer, E. (2022). "Multibeam mask requirements for advanced EUV patterning". Photomask Technology. SPIE Proceedings. Vol. 12293. pp. 122930O. doi:10.1117/12.2645895.
Ivin, V (2002). "The inclusion of secondary electrons and Bremsstrahlung X-rays in an electron beam resist model". Microelectronic Engineering. 61–62: 343. doi:10.1016/S0167-9317(02)00531-2.
Yamazaki, Kenji; Kurihara, Kenji; Yamaguchi, Toru; Namatsu, Hideo; Nagase, Masao (1997). "Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography". Japanese Journal of Applied Physics. 36 (12B): 7552. Bibcode:1997JaJAP..36.7552Y. doi:10.1143/JJAP.36.7552. S2CID 250783039.
Renoud, R; Attard, C; Ganachaud, J-P; Bartholome, S; Dubus, A (1998). "Influence on the secondary electron yield of the space charge induced in an insulating target by an electron beam". Journal of Physics: Condensed Matter. 10 (26): 5821. Bibcode:1998JPCM...10.5821R. doi:10.1088/0953-8984/10/26/010. S2CID 250739239.
Wieland, M.; de Boer, G.; ten Berge, G.; Jager, R.; van de Peut, T.; Peijster, J.; Slot, E.; Steenbrink, S.; Teepen, T.; van Veen, A.H.V.; Kampherbeek, B.J. (2009). "MAPPER: high-throughput maskless lithography". Alternative Lithographic Technologies. SPIE Proceedings. Vol. 7271. pp. 72710O. doi:10.1117/12.814025.
Chen, Frederick; Chen, Wei-Su; Tsai, Ming-Jinn; Ku, Tzu-Kun (2012). "Complementary polarity exposures for cost-effective line-cutting in multiple patterning lithography". Optical Microlithography XXV. SPIE Proceedings. Vol. 8326. pp. 83262L. doi:10.1117/12.912800.
Kruit, P.; Steenbrink, S.; Jager, R.; Wieland, M. (2004). "Optimum dose for shot noise limited CD uniformity in electron-beam lithography". Journal of Vacuum Science & Technology B. 22 (6): 2948–55. Bibcode:2004JVSTB..22.2948K. doi:10.1116/1.1821577.
Bermudez, V. M. (1999). "Low-energy electron-beam effects on poly(methyl methacrylate) resist films". Journal of Vacuum Science and Technology B. 17 (6): 2512. Bibcode:1999JVSTB..17.2512B. doi:10.1116/1.591134.
Cumming, D. R. S.; Thoms, S.; Beaumont, S. P.; Weaver, J. M. R. (1996). "Fabrication of 3 nm wires using 100 keV electron beam lithography and poly(methyl methacrylate) resist". Applied Physics Letters. 68 (3): 322. Bibcode:1996ApPhL..68..322C. doi:10.1063/1.116073.
Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong; Duan, Huigao; Hobbs, Richard G.; Stach, Eric A.; Berggren, Karl K. (2013). "Resolution limits of electron-beam lithography toward the atomic scale" (PDF). Nano Lett. 13 (4): 1555–1558. Bibcode:2013NanoL..13.1555M. doi:10.1021/nl304715p. hdl:1721.1/92829. PMID 23488936. S2CID 1060983.
Shafagh, Reza; Vastesson, Alexander; Guo, Weijin; van der Wijngaart, Wouter; Haraldsson, Tommy (2018). "E-Beam Nanostructuring and Direct Click Biofunctionalization of Thiol–Ene Resist". ACS Nano. 12 (10): 9940–6. doi:10.1021/acsnano.8b03709. PMID 30212184. S2CID 52271550.
Marrian, C.R.K. (1992). "Electron-beam lithography with the scanning tunneling microscope". Journal of Vacuum Science and Technology. 10 (B): 2877–81. Bibcode:1992JVSTB..10.2877M. doi:10.1116/1.585978.
Mayer, T.M.; et al. (1996). "Field emission characteristics of the scanning tunneling microscope for nanolithography". Journal of Vacuum Science and Technology. 14 (B): 2438–44. Bibcode:1996JVSTB..14.2438M. doi:10.1116/1.588751.
Hordon, L.S.; et al. (1993). "Limits of low-energy electron optics". Journal of Vacuum Science and Technology. 11 (B): 2299–2303. Bibcode:1993JVSTB..11.2299H. doi:10.1116/1.586894.
Egerton, R. F.; et al. (2004). "Radiation damage in the TEM and SEM". Micron. 35 (6): 399–409. doi:10.1016/j.micron.2004.02.003. PMID 15120123.

euvlitho.com

Denbeaux, G.; Torok, J.; Del Re, R.; Herbol, H.; Das, S.; Bocharova, I.; Paolucci, A.; Ocola, L.E.; Ventrice Jr., C.; Lifshin, E.; Brainard, R.L. (2013). "Measurement of the role of secondary electrons in EUV resist exposures" (PDF). International Workshop on EUV Lithography.

gov.si

arrs.gov.si

Mason, Nigel J; Dujardin, G; Gerber, G; Gianturco, F; Maerk, T.D. (January 2008). "EURONanochem – Chemical Control at the Nanoscale". Slovenian Research Agency. European Space Foundation. Archived from the original on 2011-07-20.

handle.net

hdl.handle.net

Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong; Duan, Huigao; Hobbs, Richard G.; Stach, Eric A.; Berggren, Karl K. (2013). "Resolution limits of electron-beam lithography toward the atomic scale" (PDF). Nano Lett. 13 (4): 1555–1558. Bibcode:2013NanoL..13.1555M. doi:10.1021/nl304715p. hdl:1721.1/92829. PMID 23488936. S2CID 1060983.

harvard.edu

ui.adsabs.harvard.edu

Parker, N. W.; et al. (2000). Dobisz, Elizabeth A. (ed.). "High-throughput NGL electron-beam direct-write lithography system". Proc. SPIE. Emerging Lithographic Technologies IV. 3997: 713. Bibcode:2000SPIE.3997..713P. doi:10.1117/12.390042. S2CID 109415718.
Stoffels, E; Stoffels, W W; Kroesen, G M W (2001). "Plasma chemistry and surface processes of negative ions". Plasma Sources Science and Technology. 10 (2): 311. Bibcode:2001PSST...10..311S. CiteSeerX 10.1.1.195.9811. doi:10.1088/0963-0252/10/2/321. S2CID 250916447.
K. W. Lee (2009). "Secondary electron generation in electron-beam-irradiated solids:resolution limits to nanolithography". J. Korean Phys. Soc. 55 (4): 1720. Bibcode:2009JKPS...55.1720L. doi:10.3938/jkps.55.1720. Archived from the original on 2011-07-22.
P. T. Henderson; et al. (1999). "Long-distance charge transport in duplex DNA: The phonon-assisted polaron-like hopping mechanism". Proc. Natl. Acad. Sci. U.S.A. 96 (15): 8353–8358. Bibcode:1999PNAS...96.8353H. doi:10.1073/pnas.96.15.8353. PMC 17521. PMID 10411879.
H. Seiler (1983). "Secondary electron emission in the scanning electron microscope". J. Appl. Phys. 54 (11): R1 – R18. Bibcode:1983JAP....54R...1S. doi:10.1063/1.332840.
Yamazaki, Kenji; Kurihara, Kenji; Yamaguchi, Toru; Namatsu, Hideo; Nagase, Masao (1997). "Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography". Japanese Journal of Applied Physics. 36 (12B): 7552. Bibcode:1997JaJAP..36.7552Y. doi:10.1143/JJAP.36.7552. S2CID 250783039.
Renoud, R; Attard, C; Ganachaud, J-P; Bartholome, S; Dubus, A (1998). "Influence on the secondary electron yield of the space charge induced in an insulating target by an electron beam". Journal of Physics: Condensed Matter. 10 (26): 5821. Bibcode:1998JPCM...10.5821R. doi:10.1088/0953-8984/10/26/010. S2CID 250739239.
Kruit, P.; Steenbrink, S.; Jager, R.; Wieland, M. (2004). "Optimum dose for shot noise limited CD uniformity in electron-beam lithography". Journal of Vacuum Science & Technology B. 22 (6): 2948–55. Bibcode:2004JVSTB..22.2948K. doi:10.1116/1.1821577.
Bermudez, V. M. (1999). "Low-energy electron-beam effects on poly(methyl methacrylate) resist films". Journal of Vacuum Science and Technology B. 17 (6): 2512. Bibcode:1999JVSTB..17.2512B. doi:10.1116/1.591134.
Cumming, D. R. S.; Thoms, S.; Beaumont, S. P.; Weaver, J. M. R. (1996). "Fabrication of 3 nm wires using 100 keV electron beam lithography and poly(methyl methacrylate) resist". Applied Physics Letters. 68 (3): 322. Bibcode:1996ApPhL..68..322C. doi:10.1063/1.116073.
Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong; Duan, Huigao; Hobbs, Richard G.; Stach, Eric A.; Berggren, Karl K. (2013). "Resolution limits of electron-beam lithography toward the atomic scale" (PDF). Nano Lett. 13 (4): 1555–1558. Bibcode:2013NanoL..13.1555M. doi:10.1021/nl304715p. hdl:1721.1/92829. PMID 23488936. S2CID 1060983.
Marrian, C.R.K. (1992). "Electron-beam lithography with the scanning tunneling microscope". Journal of Vacuum Science and Technology. 10 (B): 2877–81. Bibcode:1992JVSTB..10.2877M. doi:10.1116/1.585978.
Mayer, T.M.; et al. (1996). "Field emission characteristics of the scanning tunneling microscope for nanolithography". Journal of Vacuum Science and Technology. 14 (B): 2438–44. Bibcode:1996JVSTB..14.2438M. doi:10.1116/1.588751.
Hordon, L.S.; et al. (1993). "Limits of low-energy electron optics". Journal of Vacuum Science and Technology. 11 (B): 2299–2303. Bibcode:1993JVSTB..11.2299H. doi:10.1116/1.586894.

ims.co.at

IMS Nanofabrications. IMS Nanofabrication(2011-12-07). Retrieved on 2019-02-28.
IMS Nanofabrications. IMS Nanofabrication(2011-12-07). Retrieved on 2019-02-28.

kb.se

urn.kb.se

Shafagh, Reza; Vastesson, Alexander; Guo, Weijin; van der Wijngaart, Wouter; Haraldsson, Tommy (2018). "E-Beam Nanostructuring and Direct Click Biofunctionalization of Thiol–Ene Resist". ACS Nano. 12 (10): 9940–6. doi:10.1021/acsnano.8b03709. PMID 30212184. S2CID 52271550.

kps.or.kr

K. W. Lee (2009). "Secondary electron generation in electron-beam-irradiated solids:resolution limits to nanolithography". J. Korean Phys. Soc. 55 (4): 1720. Bibcode:2009JKPS...55.1720L. doi:10.3938/jkps.55.1720. Archived from the original on 2011-07-22.

linkedin.com

mapperlithography.com

Mapper Lithography Archived 2016-12-20 at the Wayback Machine. Mapper Lithography (2010-01-18). Retrieved on 2011-08-27.

micronic.se

Faster and lower cost for 65 nm and 45 nm photomask patterning ^{[dead link‍]}

mit.edu

dspace.mit.edu

Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong; Duan, Huigao; Hobbs, Richard G.; Stach, Eric A.; Berggren, Karl K. (2013). "Resolution limits of electron-beam lithography toward the atomic scale" (PDF). Nano Lett. 13 (4): 1555–1558. Bibcode:2013NanoL..13.1555M. doi:10.1021/nl304715p. hdl:1721.1/92829. PMID 23488936. S2CID 1060983.

mrs.org

J. A. Liddle; et al. (2003). "Resist Requirements and Limitations for Nanoscale Electron-Beam Patterning". Mater. Res. Soc. Symp. Proc. 739 (19): 19–30.^{[permanent dead link‍]}

multibeamcorp.com

Multibeam Corporation. Multibeamcorp.com (2011-03-04). Retrieved on 2011-08-27.

nih.gov

pubmed.ncbi.nlm.nih.gov

P. T. Henderson; et al. (1999). "Long-distance charge transport in duplex DNA: The phonon-assisted polaron-like hopping mechanism". Proc. Natl. Acad. Sci. U.S.A. 96 (15): 8353–8358. Bibcode:1999PNAS...96.8353H. doi:10.1073/pnas.96.15.8353. PMC 17521. PMID 10411879.
Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong; Duan, Huigao; Hobbs, Richard G.; Stach, Eric A.; Berggren, Karl K. (2013). "Resolution limits of electron-beam lithography toward the atomic scale" (PDF). Nano Lett. 13 (4): 1555–1558. Bibcode:2013NanoL..13.1555M. doi:10.1021/nl304715p. hdl:1721.1/92829. PMID 23488936. S2CID 1060983.
Shafagh, Reza; Vastesson, Alexander; Guo, Weijin; van der Wijngaart, Wouter; Haraldsson, Tommy (2018). "E-Beam Nanostructuring and Direct Click Biofunctionalization of Thiol–Ene Resist". ACS Nano. 12 (10): 9940–6. doi:10.1021/acsnano.8b03709. PMID 30212184. S2CID 52271550.
Egerton, R. F.; et al. (2004). "Radiation damage in the TEM and SEM". Micron. 35 (6): 399–409. doi:10.1016/j.micron.2004.02.003. PMID 15120123.

ncbi.nlm.nih.gov

P. T. Henderson; et al. (1999). "Long-distance charge transport in duplex DNA: The phonon-assisted polaron-like hopping mechanism". Proc. Natl. Acad. Sci. U.S.A. 96 (15): 8353–8358. Bibcode:1999PNAS...96.8353H. doi:10.1073/pnas.96.15.8353. PMC 17521. PMID 10411879.

nims.go.jp

mdr.nims.go.jp

Tanuma, S.; Powell, C. J.; Penn, D. R. (1994). "Calculations of electron inelastic mean free paths. V. Data for 14 organic compounds over the 50–2000 eV range". Surface and Interface Analysis. 21 (3): 165. doi:10.1002/sia.740210302.

psu.edu

citeseerx.ist.psu.edu

Stoffels, E; Stoffels, W W; Kroesen, G M W (2001). "Plasma chemistry and surface processes of negative ions". Plasma Sources Science and Technology. 10 (2): 311. Bibcode:2001PSST...10..311S. CiteSeerX 10.1.1.195.9811. doi:10.1088/0963-0252/10/2/321. S2CID 250916447.

semanticscholar.org

api.semanticscholar.org

Parker, N. W.; et al. (2000). Dobisz, Elizabeth A. (ed.). "High-throughput NGL electron-beam direct-write lithography system". Proc. SPIE. Emerging Lithographic Technologies IV. 3997: 713. Bibcode:2000SPIE.3997..713P. doi:10.1117/12.390042. S2CID 109415718.
Stoffels, E; Stoffels, W W; Kroesen, G M W (2001). "Plasma chemistry and surface processes of negative ions". Plasma Sources Science and Technology. 10 (2): 311. Bibcode:2001PSST...10..311S. CiteSeerX 10.1.1.195.9811. doi:10.1088/0963-0252/10/2/321. S2CID 250916447.
Yamazaki, Kenji; Kurihara, Kenji; Yamaguchi, Toru; Namatsu, Hideo; Nagase, Masao (1997). "Novel Proximity Effect Including Pattern-Dependent Resist Development in Electron Beam Nanolithography". Japanese Journal of Applied Physics. 36 (12B): 7552. Bibcode:1997JaJAP..36.7552Y. doi:10.1143/JJAP.36.7552. S2CID 250783039.
Renoud, R; Attard, C; Ganachaud, J-P; Bartholome, S; Dubus, A (1998). "Influence on the secondary electron yield of the space charge induced in an insulating target by an electron beam". Journal of Physics: Condensed Matter. 10 (26): 5821. Bibcode:1998JPCM...10.5821R. doi:10.1088/0953-8984/10/26/010. S2CID 250739239.
Manfrinato, Vitor R.; Zhang, Lihua; Su, Dong; Duan, Huigao; Hobbs, Richard G.; Stach, Eric A.; Berggren, Karl K. (2013). "Resolution limits of electron-beam lithography toward the atomic scale" (PDF). Nano Lett. 13 (4): 1555–1558. Bibcode:2013NanoL..13.1555M. doi:10.1021/nl304715p. hdl:1721.1/92829. PMID 23488936. S2CID 1060983.
Shafagh, Reza; Vastesson, Alexander; Guo, Weijin; van der Wijngaart, Wouter; Haraldsson, Tommy (2018). "E-Beam Nanostructuring and Direct Click Biofunctionalization of Thiol–Ene Resist". ACS Nano. 12 (10): 9940–6. doi:10.1021/acsnano.8b03709. PMID 30212184. S2CID 52271550.

semiwiki.com

Complexities of the Resolution Limits of Advanced Lithography

spie.org

SPIE Newsroom: Double exposure makes dense high-resolution diffractive optics. Spie.org (2009-11-03). Retrieved on 2011-08-27.

web.archive.org

McCord, M A.; Rooks, M.J. (2000). "2. Electron beam lithography". Microlithography. SPIE Handbook of Microlithography, Micromachining and Microfabrication. Vol. 1. Archived from the original on 2019-08-19. Retrieved 2007-01-04.
Mason, Nigel J; Dujardin, G; Gerber, G; Gianturco, F; Maerk, T.D. (January 2008). "EURONanochem – Chemical Control at the Nanoscale". Slovenian Research Agency. European Space Foundation. Archived from the original on 2011-07-20.
K. W. Lee (2009). "Secondary electron generation in electron-beam-irradiated solids:resolution limits to nanolithography". J. Korean Phys. Soc. 55 (4): 1720. Bibcode:2009JKPS...55.1720L. doi:10.3938/jkps.55.1720. Archived from the original on 2011-07-22.
Mapper Lithography Archived 2016-12-20 at the Wayback Machine. Mapper Lithography (2010-01-18). Retrieved on 2011-08-27.

youtube.com

Chen, Frederick (2023). Electron Blur Impact on Electron Beam and EUV Lithography.

zenodo.org

Marrian, C.R.K. (1992). "Electron-beam lithography with the scanning tunneling microscope". Journal of Vacuum Science and Technology. 10 (B): 2877–81. Bibcode:1992JVSTB..10.2877M. doi:10.1116/1.585978.
Mayer, T.M.; et al. (1996). "Field emission characteristics of the scanning tunneling microscope for nanolithography". Journal of Vacuum Science and Technology. 14 (B): 2438–44. Bibcode:1996JVSTB..14.2438M. doi:10.1116/1.588751.