Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). "0.1–10-keV x-ray-induced electron emissions from solids—Models and secondary electron measurements". Journal of Applied Physics. 48 (5). AIP Publishing: 1852–1866. Bibcode:1977JAP....48.1852H. doi:10.1063/1.323938. ISSN0021-8979.
DiMaria, D. J.; Cartier, E.; Arnold, D. (1993). "Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon". Journal of Applied Physics. 73 (7). AIP Publishing: 3367–3384. Bibcode:1993JAP....73.3367D. doi:10.1063/1.352936. ISSN0021-8979.
Akazawa, Housei (1998). "Soft x-ray-stimulated positive ion desorption from amorphous SiO2 surfaces". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16 (6). American Vacuum Society: 3455–3459. Bibcode:1998JVSTA..16.3455A. doi:10.1116/1.581502. ISSN0734-2101.
Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). "0.1–10-keV x-ray-induced electron emissions from solids—Models and secondary electron measurements". Journal of Applied Physics. 48 (5). AIP Publishing: 1852–1866. Bibcode:1977JAP....48.1852H. doi:10.1063/1.323938. ISSN0021-8979.
DiMaria, D. J.; Cartier, E.; Arnold, D. (1993). "Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon". Journal of Applied Physics. 73 (7). AIP Publishing: 3367–3384. Bibcode:1993JAP....73.3367D. doi:10.1063/1.352936. ISSN0021-8979.
Akazawa, Housei (1998). "Soft x-ray-stimulated positive ion desorption from amorphous SiO2 surfaces". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16 (6). American Vacuum Society: 3455–3459. Bibcode:1998JVSTA..16.3455A. doi:10.1116/1.581502. ISSN0734-2101.
Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). "0.1–10-keV x-ray-induced electron emissions from solids—Models and secondary electron measurements". Journal of Applied Physics. 48 (5). AIP Publishing: 1852–1866. Bibcode:1977JAP....48.1852H. doi:10.1063/1.323938. ISSN0021-8979.
DiMaria, D. J.; Cartier, E.; Arnold, D. (1993). "Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon". Journal of Applied Physics. 73 (7). AIP Publishing: 3367–3384. Bibcode:1993JAP....73.3367D. doi:10.1063/1.352936. ISSN0021-8979.
Akazawa, Housei (1998). "Soft x-ray-stimulated positive ion desorption from amorphous SiO2 surfaces". Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16 (6). American Vacuum Society: 3455–3459. Bibcode:1998JVSTA..16.3455A. doi:10.1116/1.581502. ISSN0734-2101.