Orloff, Jon (1996). "Fundamental limits to imaging resolution for focused ion beams". Journal of Vacuum Science and Technology B. 14 (6): 3759–3763. Bibcode:1996JVSTB..14.3759O. doi:10.1116/1.588663.
Koch, J.; Grun, K.; Ruff, M.; Wernhardt, R.; Wieck, A.D. (1999). "Creation of nanoelectronic devices by focused ion beam implantation". IECON '99 Proceedings. The 25th Annual Conference of the IEEE. Vol. 1. pp. 35–39. doi:10.1109/IECON.1999.822165. ISBN0-7803-5735-3.
Orloff, J.; Swanson, L. (1975). "Study of a field-ionization source for microprobe applications". Journal of Vacuum Science and Technology. 12 (6): 1209. Bibcode:1975JVST...12.1209O. doi:10.1116/1.568497.
Seliger, R.; Ward, J.W.; Wang, V.; Kubena, R.L. (1979). "A high-intensity scanning ion probe with submicrometer spot size". Appl. Phys. Lett. 34 (5): 310. Bibcode:1979ApPhL..34..310S. doi:10.1063/1.90786.
Orloff, Jon (1996). "Fundamental limits to imaging resolution for focused ion beams". Journal of Vacuum Science and Technology B. 14 (6): 3759–3763. Bibcode:1996JVSTB..14.3759O. doi:10.1116/1.588663.
Orloff, J.; Swanson, L. (1975). "Study of a field-ionization source for microprobe applications". Journal of Vacuum Science and Technology. 12 (6): 1209. Bibcode:1975JVST...12.1209O. doi:10.1116/1.568497.
Seliger, R.; Ward, J.W.; Wang, V.; Kubena, R.L. (1979). "A high-intensity scanning ion probe with submicrometer spot size". Appl. Phys. Lett. 34 (5): 310. Bibcode:1979ApPhL..34..310S. doi:10.1063/1.90786.