High-power impulse magnetron sputtering (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "High-power impulse magnetron sputtering" in English language version.

refsWebsite

Global rank English rank

20doi.org

2^nd place

13harvard.edu

18^th place

17^th place

3shu.ac.uk

low place

3semanticscholar.org

11^th place

8^th place

2kb.se

564^th place

1,445^th place

1cemecon.com

low place

1researchgate.net

120^th place

125^th place

1worldcat.org

5^th place

1elsevier.com

610^th place

704^th place

1youtube.com

9^th place

13^th place

1ghostarchive.org

32^nd place

21^st place

1cemecon.de

low place

1web.archive.org

1^st place

cemecon.com (Global: low place; English: low place)

Werner Kölker: Higher flexibility in coating design PDF. In: CemeCon Facts. Nr. 36, S. 14–15.^{[dead link]}

cemecon.de (Global: low place; English: low place)

Stephan Bolz: [1]. In: CemeCon Facts. Nr. 35, S. 11–12. Archived 10 April 2019 at the Wayback Machine

doi.org (Global: 2^nd place; English: 2^nd place)

Ehiasarian, A.P.; New, R.; Münz, W.-D.; Hultman, L.; Helmersson, U.; Kouznetsov, V. (2002). "Influence of high power densities on the composition of pulsed magnetron plasmas". Vacuum. 65 (2): 147. Bibcode:2002Vacuu..65..147E. doi:10.1016/S0042-207X(01)00475-4.
Kozyrev, A. V.; Sochugov, N. S.; Oskomov, K. V.; Zakharov, A. N.; Odivanova, A. N. (2011). "Optical studies of plasma inhomogeneities in a high-current pulsed magnetron discharge". Plasma Physics Reports. 37 (7): 621. Bibcode:2011PlPhR..37..621K. doi:10.1134/S1063780X11060122. S2CID 122931905.
Ehiasarian, A. P.; Hecimovic, A.; De Los Arcos, T.; New, R.; Schulz-von Der Gathen, V.; Böke, M.; Winter, J. (2012). "High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization" (PDF). Applied Physics Letters. 100 (11): 114101. Bibcode:2012ApPhL.100k4101E. doi:10.1063/1.3692172. S2CID 54737388.
Anders, André; Ni, Pavel; Rauch, Albert (2012). "Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering". Journal of Applied Physics. 111 (5): 053304–053304–13. Bibcode:2012JAP...111e3304A. doi:10.1063/1.3692978.
Ehiasarian, A. P.; Wen, J. G.; Petrov, I. (2007). "Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion". Journal of Applied Physics. 101 (5): 054301–054301–10. Bibcode:2007JAP...101e4301E. doi:10.1063/1.2697052.
Ehiasarian, A.P; Münz, W.-D; Hultman, L; Helmersson, U; Petrov, I (2003). "High power pulsed magnetron sputtered Cr Nx films". Surface and Coatings Technology. 163–164: 267–272. doi:10.1016/S0257-8972(02)00479-6.
Broitman, E.; Czigány, Zs.; Greczynski, G.; Böhlmark, J.; Cremer, R.; Hultman, L. (2010). "Industrial-scale deposition of highly adherent CNx films on steel substrates". Surface and Coatings Technology. 204 (21–22): 3349. doi:10.1016/j.surfcoat.2010.03.038.
Kouznetsov, Vladimir; MacÁk, Karol; Schneider, Jochen M.; Helmersson, Ulf; Petrov, Ivan (1999). "A novel pulsed magnetron sputter technique utilizing very high target power densities". Surface and Coatings Technology. 122 (2–3): 290. doi:10.1016/S0257-8972(99)00292-3.
Ehiasarian, Arutiun (September 2012). "Plasma self-organisation in High Power Impulse Magnetron Sputtering Discharges". IOP Conference Series: Materials Science and Engineering. 39 (1) 012012. Bibcode:2012MS&E...39a2012E. doi:10.1088/1757-899X/39/1/012012. Retrieved 21 April 2023.
Anders, André (21 March 2017). "Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)". Journal of Applied Physics. 121 (17): 171101. Bibcode:2017JAP...121q1101A. doi:10.1063/1.4978350. ISSN 0021-8979.
Kubart, Tomáš; Gudmundsson, Jon Tomas; Lundin, Daniel (2020), "Reactive high power impulse magnetron sputtering", High Power Impulse Magnetron Sputtering, Elsevier, pp. 223–263, doi:10.1016/b978-0-12-812454-3.00011-5, ISBN 978-0-12-812454-3, retrieved 18 October 2020
Purandare, Y. P.; Ehiasarian, A. P.; Hovsepian, P. Eh. (2008). "Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering" (PDF). Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26 (2): 288. Bibcode:2008JVSTA..26..288P. doi:10.1116/1.2839855. S2CID 56321309.
Hovsepian, P.Eh.; Reinhard, C.; Ehiasarian, A.P. (2006). "CrAlYN/CrN superlattice coatings deposited by the combined high power impulse magnetron sputtering/unbalanced magnetron sputtering technique". Surface and Coatings Technology. 201 (7): 4105. doi:10.1016/j.surfcoat.2006.08.027.
Konstantinidis, S.; Dauchot, J.P.; Hecq, M. (2006). "Titanium oxide thin films deposited by high-power impulse magnetron sputtering". Thin Solid Films. 515 (3): 1182. Bibcode:2006TSF...515.1182K. doi:10.1016/j.tsf.2006.07.089.
Konstantinidis, S.; Hemberg, A.; Dauchot, J. P.; Hecq, M. (2007). "Deposition of zinc oxide layers by high-power impulse magnetron sputtering". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 25 (3): L19. Bibcode:2007JVSTB..25L..19K. doi:10.1116/1.2735968.
Sittinger, V.; Ruske, F.; Werner, W.; Jacobs, C.; Szyszka, B.; Christie, D.J. (2008). "High power pulsed magnetron sputtering of transparent conducting oxides". Thin Solid Films. 516 (17): 5847. Bibcode:2008TSF...516.5847S. doi:10.1016/j.tsf.2007.10.031.
Alami, J.; Eklund, P.; Emmerlich, J.; Wilhelmsson, O.; Jansson, U.; Högberg, H.; Hultman, L.; Helmersson, U. (2006). "High-power impulse magnetron sputtering of Ti–Si–C thin films from a Ti3SiC2 compound target". Thin Solid Films. 515 (4): 1731. Bibcode:2006TSF...515.1731A. doi:10.1016/j.tsf.2006.06.015.
Souček, P.; Daniel, J.; Hnilica, J.; Bernátová, K.; Zábranský, L.; Buršíková, V.; Stupavská, M.; Vašina, P. (2017). "Superhard nanocomposite nc-TiC/a-C:H coatings: The effect of HiPIMS on coating microstructure and mechanical properties". Surface and Coatings Technology. 3116: 257–267. doi:10.1016/j.surfcoat.2017.01.021.
Zenkin, Sergei; Belosludtsev, Alexandr; Kos, Šimon; Čerstvý, Radomír; Haviar, Stanislav; Netrvalová, Marie (2016). "Thickness dependent wetting properties and surface free energy of HfO2 thin films". Applied Physics Letters. 108 (23): 231602. Bibcode:2016ApPhL.108w1602Z. doi:10.1063/1.4953262.
Rtimi, Sami; Baghriche, Oualid; Pulgarin, Cesar; Lavanchy, Jean-Claude; Kiwi, John (2013). "Growth of TiO2/Cu films by HiPIMS for accelerated bacterial loss of viability". Surface and Coatings Technology. 232: 804–813. doi:10.1016/j.surfcoat.2013.06.102.

elsevier.com (Global: 610^th place; English: 704^th place)

linkinghub.elsevier.com

Kubart, Tomáš; Gudmundsson, Jon Tomas; Lundin, Daniel (2020), "Reactive high power impulse magnetron sputtering", High Power Impulse Magnetron Sputtering, Elsevier, pp. 223–263, doi:10.1016/b978-0-12-812454-3.00011-5, ISBN 978-0-12-812454-3, retrieved 18 October 2020

ghostarchive.org (Global: 32^nd place; English: 21^st place)

Apple Inc. (13 October 2020). "Apple Event — October 13". YouTube. Apple Inc. Archived from the original on 15 December 2021. Retrieved 18 October 2020.

harvard.edu (Global: 18^th place; English: 17^th place)

ui.adsabs.harvard.edu

Ehiasarian, A.P.; New, R.; Münz, W.-D.; Hultman, L.; Helmersson, U.; Kouznetsov, V. (2002). "Influence of high power densities on the composition of pulsed magnetron plasmas". Vacuum. 65 (2): 147. Bibcode:2002Vacuu..65..147E. doi:10.1016/S0042-207X(01)00475-4.
Kozyrev, A. V.; Sochugov, N. S.; Oskomov, K. V.; Zakharov, A. N.; Odivanova, A. N. (2011). "Optical studies of plasma inhomogeneities in a high-current pulsed magnetron discharge". Plasma Physics Reports. 37 (7): 621. Bibcode:2011PlPhR..37..621K. doi:10.1134/S1063780X11060122. S2CID 122931905.
Ehiasarian, A. P.; Hecimovic, A.; De Los Arcos, T.; New, R.; Schulz-von Der Gathen, V.; Böke, M.; Winter, J. (2012). "High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization" (PDF). Applied Physics Letters. 100 (11): 114101. Bibcode:2012ApPhL.100k4101E. doi:10.1063/1.3692172. S2CID 54737388.
Anders, André; Ni, Pavel; Rauch, Albert (2012). "Drifting localization of ionization runaway: Unraveling the nature of anomalous transport in high power impulse magnetron sputtering". Journal of Applied Physics. 111 (5): 053304–053304–13. Bibcode:2012JAP...111e3304A. doi:10.1063/1.3692978.
Ehiasarian, A. P.; Wen, J. G.; Petrov, I. (2007). "Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion". Journal of Applied Physics. 101 (5): 054301–054301–10. Bibcode:2007JAP...101e4301E. doi:10.1063/1.2697052.
Ehiasarian, Arutiun (September 2012). "Plasma self-organisation in High Power Impulse Magnetron Sputtering Discharges". IOP Conference Series: Materials Science and Engineering. 39 (1) 012012. Bibcode:2012MS&E...39a2012E. doi:10.1088/1757-899X/39/1/012012. Retrieved 21 April 2023.
Anders, André (21 March 2017). "Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)". Journal of Applied Physics. 121 (17): 171101. Bibcode:2017JAP...121q1101A. doi:10.1063/1.4978350. ISSN 0021-8979.
Purandare, Y. P.; Ehiasarian, A. P.; Hovsepian, P. Eh. (2008). "Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering" (PDF). Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26 (2): 288. Bibcode:2008JVSTA..26..288P. doi:10.1116/1.2839855. S2CID 56321309.
Konstantinidis, S.; Dauchot, J.P.; Hecq, M. (2006). "Titanium oxide thin films deposited by high-power impulse magnetron sputtering". Thin Solid Films. 515 (3): 1182. Bibcode:2006TSF...515.1182K. doi:10.1016/j.tsf.2006.07.089.
Konstantinidis, S.; Hemberg, A.; Dauchot, J. P.; Hecq, M. (2007). "Deposition of zinc oxide layers by high-power impulse magnetron sputtering". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 25 (3): L19. Bibcode:2007JVSTB..25L..19K. doi:10.1116/1.2735968.
Sittinger, V.; Ruske, F.; Werner, W.; Jacobs, C.; Szyszka, B.; Christie, D.J. (2008). "High power pulsed magnetron sputtering of transparent conducting oxides". Thin Solid Films. 516 (17): 5847. Bibcode:2008TSF...516.5847S. doi:10.1016/j.tsf.2007.10.031.
Alami, J.; Eklund, P.; Emmerlich, J.; Wilhelmsson, O.; Jansson, U.; Högberg, H.; Hultman, L.; Helmersson, U. (2006). "High-power impulse magnetron sputtering of Ti–Si–C thin films from a Ti3SiC2 compound target". Thin Solid Films. 515 (4): 1731. Bibcode:2006TSF...515.1731A. doi:10.1016/j.tsf.2006.06.015.
Zenkin, Sergei; Belosludtsev, Alexandr; Kos, Šimon; Čerstvý, Radomír; Haviar, Stanislav; Netrvalová, Marie (2016). "Thickness dependent wetting properties and surface free energy of HfO2 thin films". Applied Physics Letters. 108 (23): 231602. Bibcode:2016ApPhL.108w1602Z. doi:10.1063/1.4953262.

kb.se (Global: 564^th place; English: 1,445^th place)

urn.kb.se

Broitman, E.; Czigány, Zs.; Greczynski, G.; Böhlmark, J.; Cremer, R.; Hultman, L. (2010). "Industrial-scale deposition of highly adherent CNx films on steel substrates". Surface and Coatings Technology. 204 (21–22): 3349. doi:10.1016/j.surfcoat.2010.03.038.
Alami, J.; Eklund, P.; Emmerlich, J.; Wilhelmsson, O.; Jansson, U.; Högberg, H.; Hultman, L.; Helmersson, U. (2006). "High-power impulse magnetron sputtering of Ti–Si–C thin films from a Ti3SiC2 compound target". Thin Solid Films. 515 (4): 1731. Bibcode:2006TSF...515.1731A. doi:10.1016/j.tsf.2006.06.015.

researchgate.net (Global: 120^th place; English: 125^th place)

Ehiasarian, Arutiun (September 2012). "Plasma self-organisation in High Power Impulse Magnetron Sputtering Discharges". IOP Conference Series: Materials Science and Engineering. 39 (1) 012012. Bibcode:2012MS&E...39a2012E. doi:10.1088/1757-899X/39/1/012012. Retrieved 21 April 2023.

semanticscholar.org (Global: 11^th place; English: 8^th place)

api.semanticscholar.org

Kozyrev, A. V.; Sochugov, N. S.; Oskomov, K. V.; Zakharov, A. N.; Odivanova, A. N. (2011). "Optical studies of plasma inhomogeneities in a high-current pulsed magnetron discharge". Plasma Physics Reports. 37 (7): 621. Bibcode:2011PlPhR..37..621K. doi:10.1134/S1063780X11060122. S2CID 122931905.
Ehiasarian, A. P.; Hecimovic, A.; De Los Arcos, T.; New, R.; Schulz-von Der Gathen, V.; Böke, M.; Winter, J. (2012). "High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization" (PDF). Applied Physics Letters. 100 (11): 114101. Bibcode:2012ApPhL.100k4101E. doi:10.1063/1.3692172. S2CID 54737388.
Purandare, Y. P.; Ehiasarian, A. P.; Hovsepian, P. Eh. (2008). "Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering" (PDF). Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26 (2): 288. Bibcode:2008JVSTA..26..288P. doi:10.1116/1.2839855. S2CID 56321309.

shu.ac.uk (Global: low place; English: low place)

shura.shu.ac.uk

Ehiasarian, Arutiun P. (2008). "Fundamentals and applications of HIPIMS" (PDF). In Wei, Ronghua (ed.). Plasma Surface Engineering Research and its Practical Applications (1st ed.). Trivandrum: Research Signpost. pp. 35–87. ISBN 978-81-308-0257-2.
Ehiasarian, A. P.; Hecimovic, A.; De Los Arcos, T.; New, R.; Schulz-von Der Gathen, V.; Böke, M.; Winter, J. (2012). "High power impulse magnetron sputtering discharges: Instabilities and plasma self-organization" (PDF). Applied Physics Letters. 100 (11): 114101. Bibcode:2012ApPhL.100k4101E. doi:10.1063/1.3692172. S2CID 54737388.
Purandare, Y. P.; Ehiasarian, A. P.; Hovsepian, P. Eh. (2008). "Deposition of nanoscale multilayer CrN/NbN physical vapor deposition coatings by high power impulse magnetron sputtering" (PDF). Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 26 (2): 288. Bibcode:2008JVSTA..26..288P. doi:10.1116/1.2839855. S2CID 56321309.

web.archive.org (Global: 1^st place; English: 1^st place)

Stephan Bolz: [1]. In: CemeCon Facts. Nr. 35, S. 11–12. Archived 10 April 2019 at the Wayback Machine

worldcat.org (Global: 5^th place; English: 5^th place)

search.worldcat.org

Anders, André (21 March 2017). "Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)". Journal of Applied Physics. 121 (17): 171101. Bibcode:2017JAP...121q1101A. doi:10.1063/1.4978350. ISSN 0021-8979.

youtube.com (Global: 9^th place; English: 13^th place)

Apple Inc. (13 October 2020). "Apple Event — October 13". YouTube. Apple Inc. Archived from the original on 15 December 2021. Retrieved 18 October 2020.

High-power impulse magnetron sputtering (English Wikipedia)

cemecon.com (Global: low place; English: low place)

cemecon.de (Global: low place; English: low place)

doi.org (Global: 2nd place; English: 2nd place)

elsevier.com (Global: 610th place; English: 704th place)

linkinghub.elsevier.com

ghostarchive.org (Global: 32nd place; English: 21st place)

harvard.edu (Global: 18th place; English: 17th place)

ui.adsabs.harvard.edu

kb.se (Global: 564th place; English: 1,445th place)

urn.kb.se

researchgate.net (Global: 120th place; English: 125th place)

semanticscholar.org (Global: 11th place; English: 8th place)

api.semanticscholar.org

shu.ac.uk (Global: low place; English: low place)

shura.shu.ac.uk

web.archive.org (Global: 1st place; English: 1st place)

worldcat.org (Global: 5th place; English: 5th place)

search.worldcat.org

youtube.com (Global: 9th place; English: 13th place)

doi.org (Global: 2^nd place; English: 2^nd place)

elsevier.com (Global: 610^th place; English: 704^th place)

ghostarchive.org (Global: 32^nd place; English: 21^st place)

harvard.edu (Global: 18^th place; English: 17^th place)

kb.se (Global: 564^th place; English: 1,445^th place)

researchgate.net (Global: 120^th place; English: 125^th place)

semanticscholar.org (Global: 11^th place; English: 8^th place)

web.archive.org (Global: 1^st place; English: 1^st place)

worldcat.org (Global: 5^th place; English: 5^th place)

youtube.com (Global: 9^th place; English: 13^th place)