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Isotropic etching (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Isotropic etching" in English language version.

refsWebsite
Global rank English rank
1harvard.edu
18th place
17th place
1doi.org
2nd place
2nd place
1semanticscholar.org
11th place
8th place
1cadence.com
low place
low place

cadence.com (Global: low place; English: low place)

resources.pcb.cadence.com

doi.org (Global: 2nd place; English: 2nd place)

  • Chang, Floy I.; Yeh, Richard; Lin, Gisela; Chu, Patrick B.; Hoffman, Eric G.; Kruglick, Ezekiel J.; Pister, Kristofer S. J.; Hecht, Michael H. (1995-09-13). Bailey, Wayne; Motamedi, M. Edward; Luo, Fang-Chen (eds.). "Gas-phase silicon micromachining with xenon difluoride". Microelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications. 2641. SPIE: 117–129. Bibcode:1995SPIE.2641..117C. doi:10.1117/12.220933. S2CID 39522253.

harvard.edu (Global: 18th place; English: 17th place)

ui.adsabs.harvard.edu

  • Chang, Floy I.; Yeh, Richard; Lin, Gisela; Chu, Patrick B.; Hoffman, Eric G.; Kruglick, Ezekiel J.; Pister, Kristofer S. J.; Hecht, Michael H. (1995-09-13). Bailey, Wayne; Motamedi, M. Edward; Luo, Fang-Chen (eds.). "Gas-phase silicon micromachining with xenon difluoride". Microelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications. 2641. SPIE: 117–129. Bibcode:1995SPIE.2641..117C. doi:10.1117/12.220933. S2CID 39522253.

semanticscholar.org (Global: 11th place; English: 8th place)

api.semanticscholar.org

  • Chang, Floy I.; Yeh, Richard; Lin, Gisela; Chu, Patrick B.; Hoffman, Eric G.; Kruglick, Ezekiel J.; Pister, Kristofer S. J.; Hecht, Michael H. (1995-09-13). Bailey, Wayne; Motamedi, M. Edward; Luo, Fang-Chen (eds.). "Gas-phase silicon micromachining with xenon difluoride". Microelectronic Structures and Microelectromechanical Devices for Optical Processing and Multimedia Applications. 2641. SPIE: 117–129. Bibcode:1995SPIE.2641..117C. doi:10.1117/12.220933. S2CID 39522253.