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Maskless lithography (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Maskless lithography" in English language version.

refsWebsite
Global rank English rank
8doi.org
2nd place
2nd place
4semanticscholar.org
11th place
8th place
3harvard.edu
18th place
17th place
2eetimes.com
3,722nd place
2,509th place
2habr.com
6,542nd place
low place
1aip.org
2,204th place
1,735th place
1handle.net
102nd place
76th place
1nih.gov
4th place
4th place
1nanosystem-solutions.com
low place
low place
1web.archive.org
1st place
1st place
1europa.eu
68th place
117th place
1wikimedia.org
low place
low place
1militaryaerospace.com
low place
low place

aip.org (Global: 2,204th place; English: 1,735th place)

scitation.aip.org

doi.org (Global: 2nd place; English: 2nd place)

  • Walsh, M.E.; Zhang, F.; Menon, R.; Smith, H.I. (2014). "Maskless photolithography". Nanolithography. pp. 179–193. doi:10.1533/9780857098757.179. ISBN 9780857095008.
  • Jung, Il Woong; Wang, Jen-Shiang; Solgaard, O. (August 2006). "Spatial Light Modulators for Maskless Lithography". IEEE/LEOS International Conference on Optical MEMS and Their Applications Conference, 2006. pp. 150–151. doi:10.1109/OMEMS.2006.1708309. ISBN 0-7803-9562-X. S2CID 25574690.
  • Watson, G. P.; Aksyuk, V.; Simon, M. E.; Tennant, D. M.; Cirelli, R. A.; Mansfield, W. M.; Pardo, F.; Lopez, D. O.; Bolle, C. A.; Papazian, A. R.; Basavanhally, N. (2006). "Spatial light modulator for maskless optical projection lithography". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 24 (6): 2852. Bibcode:2006JVSTB..24.2852W. doi:10.1116/1.2387156.
  • Yee, I.; Miracky, R.; Reed, J.; Lunceford, B.; Minchuan Wang; Cobb, D.; Caldwell, G. (1997). "Flexible manufacturing of multichip modules for flip chip ICs". Proceedings 1997 IEEE Multi-Chip Module Conference. pp. 130–132. doi:10.1109/MCMC.1997.569357. ISBN 0-8186-7789-9. S2CID 111088663.
  • Hilbert, C.; Nelson, R.; Reed, J.; Lunceford, B.; Somadder, A.; Hu, K.; Ghoshal, U. (1999). "Thermoelectric MEMS coolers". Eighteenth International Conference on Thermoelectrics. Proceedings, ICT'99 (Cat. No.99TH8407). pp. 117–122. doi:10.1109/ICT.1999.843347. ISBN 0-7803-5451-6. S2CID 46697625.
  • Xie, Zhihua; Yu, Weixing; Wang, Taisheng; et al. (31 May 2011). "Plasmonic nanolithography: a review". Plasmonics. 6 (3): 565–580. doi:10.1007/s11468-011-9237-0. S2CID 119720143.
  • Gan, Zongsong; Cao, Yaoyu; Evans, Richard A.; Gu, Min (October 2013). "Three-dimensional deep sub-diffraction optical beam lithography with 9 nm feature size". Nature Communications. 4 (1): 2061. Bibcode:2013NatCo...4.2061G. doi:10.1038/ncomms3061. hdl:1959.3/352419. PMID 23784312.
  • Fritze, M.; Tyrrell, B.; Astolfi, D.; Yost, D.; Davis, P.; Wheeler, B.; Mallen, R.; Jarmolowicz, J.; Cann, S.; Chan, D.; Rhyins, P.; Carney, C.; Ferri, J.; Blachowicz, B. A. (2001). "Gratings of regular arrays and trim exposures for ultralarge scale integrated circuit phase-shift lithography". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 19 (6): 2366. Bibcode:2001JVSTB..19.2366F. doi:10.1116/1.1408950.

eetimes.com (Global: 3,722nd place; English: 2,509th place)

europa.eu (Global: 68th place; English: 117th place)

cordis.europa.eu

habr.com (Global: 6,542nd place; English: low place)

handle.net (Global: 102nd place; English: 76th place)

hdl.handle.net

harvard.edu (Global: 18th place; English: 17th place)

ui.adsabs.harvard.edu

militaryaerospace.com (Global: low place; English: low place)

  • "StackPath". www.militaryaerospace.com. 20 December 2009. Retrieved 2021-06-19.

nanosystem-solutions.com (Global: low place; English: low place)

nih.gov (Global: 4th place; English: 4th place)

pubmed.ncbi.nlm.nih.gov

semanticscholar.org (Global: 11th place; English: 8th place)

api.semanticscholar.org

web.archive.org (Global: 1st place; English: 1st place)

wikimedia.org (Global: low place; English: low place)

upload.wikimedia.org