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Optical proximity correction (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Optical proximity correction" in English language version.

refsWebsite
Global rank English rank
12worldcat.org
5th place
5th place
10doi.org
2nd place
2nd place
1linkedin.com
895th place
692nd place

doi.org

  • Ronse, K. (1994). "Fundamental principles of phase shifting masks by Fourier optics: Theory and experimental verification". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12 (2). American Vacuum Society: 589–600. doi:10.1116/1.587395. ISSN 0734-211X.
  • Kroyan, Armen; Levenson, David; Tittel, Frank K. (1998-06-29). Van den Hove, Luc (ed.). Coping with the impact of lens aberrations in the context of wavefront engineering. Vol. 3334. SPIE. p. 832. doi:10.1117/12.310817. ISSN 0277-786X.
  • Kling, Michael E.; Cave, Nigel; Falch, Bradley J.; Fu, Chong-Cheng; Green, Kent G.; et al. (1999-07-26). Van den Hove, Luc (ed.). Practicing extension of 248-nm DUV optical lithography using trim-mask PSM. Vol. 3679. SPIE. pp. 10–17. doi:10.1117/12.354297. ISSN 0277-786X.
  • Choi, Yang-Kyu; Zhu, Ji; Grunes, Jeff; Bokor, Jeffrey; Somorjai, Gabor. A. (2003-03-20). "Fabrication of Sub-10-nm Silicon Nanowire Arrays by Size Reduction Lithography". The Journal of Physical Chemistry B. 107 (15). American Chemical Society (ACS): 3340–3343. doi:10.1021/jp0222649. ISSN 1520-6106.
  • Stirniman, John P.; Rieger, Michael L. (1994-05-17). Brunner, Timothy A. (ed.). Fast proximity correction with zone sampling. Vol. 2197. SPIE. pp. 294–301. doi:10.1117/12.175423. ISSN 0277-786X.
  • Kohli, Kriti K.; Jobes, Mark; Graur, Ioana (2017-03-17). Erdmann, Andreas; Kye, Jongwook (eds.). Automated detection and classification of printing sub-resolution assist features using machine learning algorithms. Vol. 10147. SPIE. p. 101470O. doi:10.1117/12.2261417. ISSN 0277-786X.
  • Pang, Linyong; Hu, Peter; Peng, Danping; Chen, Dongxue; Cecil, Tom; et al. (2009-12-03). Chen, Alek C.; Han, Woo-Sung; Lin, Burn J.; Yen, Anthony (eds.). Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods. Vol. 7520. SPIE. p. 75200X. doi:10.1117/12.843578. ISSN 0277-786X.
  • Nagahara, Seiji; Yoshimochi, Kazuyuki; Yamazaki, Hiroshi; Takeda, Kazuhiro; Uchiyama, Takayuki; et al. (2010-03-11). Dusa, Mircea V.; Conley, Will (eds.). SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance. Vol. 7640. SPIE. p. 76401H. doi:10.1117/12.846473. ISSN 0277-786X.
  • Shi, Xuelong; Hsu, Stephen; Chen, J. Fung; Hsu, Chungwei Michael; Socha, Robert J.; Dusa, Mircea V. (2002-07-01). Herr, Daniel J. C. (ed.). Understanding the forbidden pitch phenomenon and assist feature placement. Vol. 4689. SPIE. p. 985. doi:10.1117/12.473427. ISSN 0277-786X.
  • Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; Lyakhova, Kateryna; et al. (2016-03-18). Panning, Eric M.; Goldberg, Kenneth A. (eds.). Assist features: placement, impact, and relevance for EUV imaging. Vol. 9776. SPIE. p. 97761S. doi:10.1117/12.2220025. ISSN 0277-786X.

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  • Ronse, K. (1994). "Fundamental principles of phase shifting masks by Fourier optics: Theory and experimental verification". Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 12 (2). American Vacuum Society: 589–600. doi:10.1116/1.587395. ISSN 0734-211X.
  • Saleh, Bahaa; Teich, M. C. (1991). Fundamentals of photonics. New York: Wiley. pp. 364–365. ISBN 978-0-471-83965-1. OCLC 22511619.
  • Kroyan, Armen; Levenson, David; Tittel, Frank K. (1998-06-29). Van den Hove, Luc (ed.). Coping with the impact of lens aberrations in the context of wavefront engineering. Vol. 3334. SPIE. p. 832. doi:10.1117/12.310817. ISSN 0277-786X.
  • Levinson, Harry J. (2005). Principles of lithography (2nd ed.). Bellingham, Wash: SPIE. pp. 274–276. ISBN 978-0-8194-5660-1. OCLC 435971871.
  • Kling, Michael E.; Cave, Nigel; Falch, Bradley J.; Fu, Chong-Cheng; Green, Kent G.; et al. (1999-07-26). Van den Hove, Luc (ed.). Practicing extension of 248-nm DUV optical lithography using trim-mask PSM. Vol. 3679. SPIE. pp. 10–17. doi:10.1117/12.354297. ISSN 0277-786X.
  • Choi, Yang-Kyu; Zhu, Ji; Grunes, Jeff; Bokor, Jeffrey; Somorjai, Gabor. A. (2003-03-20). "Fabrication of Sub-10-nm Silicon Nanowire Arrays by Size Reduction Lithography". The Journal of Physical Chemistry B. 107 (15). American Chemical Society (ACS): 3340–3343. doi:10.1021/jp0222649. ISSN 1520-6106.
  • Stirniman, John P.; Rieger, Michael L. (1994-05-17). Brunner, Timothy A. (ed.). Fast proximity correction with zone sampling. Vol. 2197. SPIE. pp. 294–301. doi:10.1117/12.175423. ISSN 0277-786X.
  • Kohli, Kriti K.; Jobes, Mark; Graur, Ioana (2017-03-17). Erdmann, Andreas; Kye, Jongwook (eds.). Automated detection and classification of printing sub-resolution assist features using machine learning algorithms. Vol. 10147. SPIE. p. 101470O. doi:10.1117/12.2261417. ISSN 0277-786X.
  • Pang, Linyong; Hu, Peter; Peng, Danping; Chen, Dongxue; Cecil, Tom; et al. (2009-12-03). Chen, Alek C.; Han, Woo-Sung; Lin, Burn J.; Yen, Anthony (eds.). Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods. Vol. 7520. SPIE. p. 75200X. doi:10.1117/12.843578. ISSN 0277-786X.
  • Nagahara, Seiji; Yoshimochi, Kazuyuki; Yamazaki, Hiroshi; Takeda, Kazuhiro; Uchiyama, Takayuki; et al. (2010-03-11). Dusa, Mircea V.; Conley, Will (eds.). SMO for 28-nm logic device and beyond: impact of source and mask complexity on lithography performance. Vol. 7640. SPIE. p. 76401H. doi:10.1117/12.846473. ISSN 0277-786X.
  • Shi, Xuelong; Hsu, Stephen; Chen, J. Fung; Hsu, Chungwei Michael; Socha, Robert J.; Dusa, Mircea V. (2002-07-01). Herr, Daniel J. C. (ed.). Understanding the forbidden pitch phenomenon and assist feature placement. Vol. 4689. SPIE. p. 985. doi:10.1117/12.473427. ISSN 0277-786X.
  • Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; Lyakhova, Kateryna; et al. (2016-03-18). Panning, Eric M.; Goldberg, Kenneth A. (eds.). Assist features: placement, impact, and relevance for EUV imaging. Vol. 9776. SPIE. p. 97761S. doi:10.1117/12.2220025. ISSN 0277-786X.