Photoresist (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Photoresist" in English language version.

refsWebsite

Global rank English rank

17doi.org

2^nd place

13harvard.edu

18^th place

17^th place

8semanticscholar.org

11^th place

8^th place

6worldcat.org

5^th place

3nih.gov

4^th place

1brewerscience.com

low place

1microchemicals.com

low place

1dupont.com

low place

1ieee.org

652^nd place

515^th place

1arxiv.org

69^th place

59^th place

1springer.com

274^th place

309^th place

1patents.google.com

1,182^nd place

725^th place

1uspto.gov

1,459^th place

991^st place

1spiedigitallibrary.org

low place

1acs.org

1,248^th place

1,104^th place

acs.org

pubs.acs.org

Frye, Cecil L.; Collins, Ward T. (1970-09-01). "Oligomeric silsesquioxanes, (HSiO3/2)n". Journal of the American Chemical Society. 92 (19): 5586–5588. doi:10.1021/ja00722a009. ISSN 0002-7863.

arxiv.org

Weingartner, Joseph C; Draine, B. T; Barr, David K (2006). "Photoelectric Emission from Dust Grains Exposed to Extreme Ultraviolet and X-Ray Radiation". The Astrophysical Journal. 645 (2): 1188–1197. arXiv:astro-ph/0601296. Bibcode:2006ApJ...645.1188W. doi:10.1086/504420. S2CID 13859981.

brewerscience.com

"Top Anti-reflective Coatings vs Bottom Anti-reflective Coatings".

doi.org

Huang, Jingyu; Dahlgren, David A.; Hemminger, John C. (1994-03-01). "Photopatterning of Self-Assembled Alkanethiolate Monolayers on Gold: A Simple Monolayer Photoresist Utilizing Aqueous Chemistry". Langmuir. 10 (3): 626–628. doi:10.1021/la00015a005. ISSN 0743-7463.
Bratton, Daniel; Yang, Da; Dai, Junyan; Ober, Christopher K. (2006-02-01). "Recent progress in high resolution lithography". Polymers for Advanced Technologies. 17 (2): 94–103. doi:10.1002/pat.662. ISSN 1099-1581. S2CID 55877239.
Ishii, Hiroyuki; Usui, Shinji; Douki, Katsuji; Kajita, Toru; Chawanya, Hitoshi; Shimokawa, Tsutomu (2000-01-01). Houlihan, Francis M (ed.). "Design and lithographic performances of 193-specific photoacid generators". Advances in Resist Technology and Processing XVII. 3999: 1120–1127. Bibcode:2000SPIE.3999.1120I. doi:10.1117/12.388276. S2CID 98281255.
Belbruno, Joseph (1990). "Multiphoton-induced chemistry of phenol in hexane at 266 nm". Chemical Physics Letters. 166 (2): 167–172. Bibcode:1990CPL...166..167B. doi:10.1016/0009-2614(90)87271-r.
Weingartner, Joseph C; Draine, B. T; Barr, David K (2006). "Photoelectric Emission from Dust Grains Exposed to Extreme Ultraviolet and X-Ray Radiation". The Astrophysical Journal. 645 (2): 1188–1197. arXiv:astro-ph/0601296. Bibcode:2006ApJ...645.1188W. doi:10.1086/504420. S2CID 13859981.
Braun, M; Gruber, F; Ruf, M. -W; Kumar, S. V. K; Illenberger, E; Hotop, H (2006). "IR photon enhanced dissociative electron attachment to SF6: Dependence on photon, vibrational, and electron energ". Chemical Physics. 329 (1–3): 148. Bibcode:2006CP....329..148B. doi:10.1016/j.chemphys.2006.07.005.
Greener, Jesse; Li, Wei; Ren, Judy; Voicu, Dan; Pakharenko, Viktoriya; Tang, Tian; Kumacheva, Eugenia (2010-02-02). "Rapid, cost-efficient fabrication of microfluidic reactors in thermoplastic polymers by combining photolithography and hot embossing". Lab Chip. 10 (4): 522–524. doi:10.1039/b918834g. ISSN 1473-0189. PMID 20126695. S2CID 24567881.
Lin, Qinghuang (2007), Mark, James E. (ed.), "Properties of Photoresist Polymers", Physical Properties of Polymers Handbook, New York, NY: Springer New York, pp. 965–979, doi:10.1007/978-0-387-69002-5_57, ISBN 978-0-387-31235-4, retrieved 2023-01-06
Van Steenwinckel, David; Lammers, Jeroen H.; Koehler, Thomas; Brainard, Robert L.; Trefonas, Peter (2006). "Resist effects at small pitches". Journal of Vacuum Science and Technology B. 24 (1): 316–320. Bibcode:2006JVSTB..24..316V. doi:10.1116/1.2151912.
Chochos, Ch.L.; Ismailova, E. (2009). "Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances". Advanced Materials. 21 (10–11): 1121. Bibcode:2009AdM....21.1121C. doi:10.1002/adma.200801715. S2CID 95710610.
S. Tagawa; et al. (2000). Houlihan, Francis M. (ed.). "Radiation and photochemistry of onium salt acid generators in chemically amplified resists". Proc. SPIE. Advances in Resist Technology and Processing XVII. 3999: 204. Bibcode:2000SPIE.3999..204T. doi:10.1117/12.388304. S2CID 95525894.
Wang, Xue-Bin; Ferris, Kim; Wang, Lai-Sheng (2000). "Photodetachment of Gaseous Multiply Charged Anions, Copper Phthalocyanine Tetrasulfonate Tetraanion: Tuning Molecular Electronic Energy Levels by Charging and Negative Electron Binding". The Journal of Physical Chemistry A. 104 (1): 25–33. Bibcode:2000JPCA..104...25W. doi:10.1021/jp9930090.
Lu, Hong; Long, Frederick H.; Eisenthal, K. B. (1990). "Femtosecond studies of electrons in liquids". Journal of the Optical Society of America B. 7 (8): 1511. Bibcode:1990JOSAB...7.1511L. doi:10.1364/JOSAB.7.001511.
Lukin, L; Balakin, Alexander A. (2001). "Thermalization of low energy electrons in liquid methylcyclohexane studied by the photoassisted ion pair separation technique". Chemical Physics. 265 (1): 87–104. Bibcode:2001CP....265...87L. doi:10.1016/S0301-0104(01)00260-9.
Lawson, Richard; Tolbert, Laren; Younkin, Todd; Henderson, Cliff (2009). Henderson, Clifford L (ed.). "Negative-tone molecular resists based on cationic polymerization". Proc. SPIE 7273, Advances in Resist Materials and Processing Technology. Advances in Resist Materials and Processing Technology XXVI. XXVI: 72733E. Bibcode:2009SPIE.7273E..3EL. doi:10.1117/12.814455. S2CID 122244702.
Frye, Cecil L.; Collins, Ward T. (1970-09-01). "Oligomeric silsesquioxanes, (HSiO3/2)n". Journal of the American Chemical Society. 92 (19): 5586–5588. doi:10.1021/ja00722a009. ISSN 0002-7863.
Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (2015-03-18). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5E9235M. doi:10.1038/srep09235. ISSN 2045-2322. PMC 4363827. PMID 25783209.

dupont.com

"AR™ 10L Bottom Anti-Reflectant Coating (BARC) | DuPont". dupont.com.

harvard.edu

ui.adsabs.harvard.edu

Ishii, Hiroyuki; Usui, Shinji; Douki, Katsuji; Kajita, Toru; Chawanya, Hitoshi; Shimokawa, Tsutomu (2000-01-01). Houlihan, Francis M (ed.). "Design and lithographic performances of 193-specific photoacid generators". Advances in Resist Technology and Processing XVII. 3999: 1120–1127. Bibcode:2000SPIE.3999.1120I. doi:10.1117/12.388276. S2CID 98281255.
Belbruno, Joseph (1990). "Multiphoton-induced chemistry of phenol in hexane at 266 nm". Chemical Physics Letters. 166 (2): 167–172. Bibcode:1990CPL...166..167B. doi:10.1016/0009-2614(90)87271-r.
Weingartner, Joseph C; Draine, B. T; Barr, David K (2006). "Photoelectric Emission from Dust Grains Exposed to Extreme Ultraviolet and X-Ray Radiation". The Astrophysical Journal. 645 (2): 1188–1197. arXiv:astro-ph/0601296. Bibcode:2006ApJ...645.1188W. doi:10.1086/504420. S2CID 13859981.
Braun, M; Gruber, F; Ruf, M. -W; Kumar, S. V. K; Illenberger, E; Hotop, H (2006). "IR photon enhanced dissociative electron attachment to SF6: Dependence on photon, vibrational, and electron energ". Chemical Physics. 329 (1–3): 148. Bibcode:2006CP....329..148B. doi:10.1016/j.chemphys.2006.07.005.
Van Steenwinckel, David; Lammers, Jeroen H.; Koehler, Thomas; Brainard, Robert L.; Trefonas, Peter (2006). "Resist effects at small pitches". Journal of Vacuum Science and Technology B. 24 (1): 316–320. Bibcode:2006JVSTB..24..316V. doi:10.1116/1.2151912.
Chochos, Ch.L.; Ismailova, E. (2009). "Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances". Advanced Materials. 21 (10–11): 1121. Bibcode:2009AdM....21.1121C. doi:10.1002/adma.200801715. S2CID 95710610.
S. Tagawa; et al. (2000). Houlihan, Francis M. (ed.). "Radiation and photochemistry of onium salt acid generators in chemically amplified resists". Proc. SPIE. Advances in Resist Technology and Processing XVII. 3999: 204. Bibcode:2000SPIE.3999..204T. doi:10.1117/12.388304. S2CID 95525894.
Wang, Xue-Bin; Ferris, Kim; Wang, Lai-Sheng (2000). "Photodetachment of Gaseous Multiply Charged Anions, Copper Phthalocyanine Tetrasulfonate Tetraanion: Tuning Molecular Electronic Energy Levels by Charging and Negative Electron Binding". The Journal of Physical Chemistry A. 104 (1): 25–33. Bibcode:2000JPCA..104...25W. doi:10.1021/jp9930090.
Lu, Hong; Long, Frederick H.; Eisenthal, K. B. (1990). "Femtosecond studies of electrons in liquids". Journal of the Optical Society of America B. 7 (8): 1511. Bibcode:1990JOSAB...7.1511L. doi:10.1364/JOSAB.7.001511.
Lukin, L; Balakin, Alexander A. (2001). "Thermalization of low energy electrons in liquid methylcyclohexane studied by the photoassisted ion pair separation technique". Chemical Physics. 265 (1): 87–104. Bibcode:2001CP....265...87L. doi:10.1016/S0301-0104(01)00260-9.
Lawson, Richard; Tolbert, Laren; Younkin, Todd; Henderson, Cliff (2009). Henderson, Clifford L (ed.). "Negative-tone molecular resists based on cationic polymerization". Proc. SPIE 7273, Advances in Resist Materials and Processing Technology. Advances in Resist Materials and Processing Technology XXVI. XXVI: 72733E. Bibcode:2009SPIE.7273E..3EL. doi:10.1117/12.814455. S2CID 122244702.
Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (2015-03-18). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5E9235M. doi:10.1038/srep09235. ISSN 2045-2322. PMC 4363827. PMID 25783209.

gmwgroup.harvard.edu

"Self-assembled Monolayer Films: Microcontact Printing" (PDF).

ieee.org

ieeexplore.ieee.org

Ito, H.; Willson, C. G.; Frechet, J. H. J. (1982-09-01). "New UV Resists with Negative or Positive Tone". 1982 Symposium on VLSI Technology. Digest of Technical Papers: 86–87.

microchemicals.com

MicroChemicals. "Basics of Microstructuring: Anti-Reflective Coatings" (PDF). Microchemicals GmbH. Retrieved 2020-01-31.

nih.gov

pubmed.ncbi.nlm.nih.gov

Greener, Jesse; Li, Wei; Ren, Judy; Voicu, Dan; Pakharenko, Viktoriya; Tang, Tian; Kumacheva, Eugenia (2010-02-02). "Rapid, cost-efficient fabrication of microfluidic reactors in thermoplastic polymers by combining photolithography and hot embossing". Lab Chip. 10 (4): 522–524. doi:10.1039/b918834g. ISSN 1473-0189. PMID 20126695. S2CID 24567881.
Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (2015-03-18). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5E9235M. doi:10.1038/srep09235. ISSN 2045-2322. PMC 4363827. PMID 25783209.

ncbi.nlm.nih.gov

Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (2015-03-18). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5E9235M. doi:10.1038/srep09235. ISSN 2045-2322. PMC 4363827. PMID 25783209.

patents.google.com

U.S. patent 4,491,628 "Positive and Negative Working Resist Compositions with Acid-Generating Photoinitiator and Polymer with Acid-Labile Groups Pendant From Polymer Backbone" J.M.J. Fréchet, H. Ito and C.G. Willson 1985.[1]

semanticscholar.org

api.semanticscholar.org

Bratton, Daniel; Yang, Da; Dai, Junyan; Ober, Christopher K. (2006-02-01). "Recent progress in high resolution lithography". Polymers for Advanced Technologies. 17 (2): 94–103. doi:10.1002/pat.662. ISSN 1099-1581. S2CID 55877239.
Ishii, Hiroyuki; Usui, Shinji; Douki, Katsuji; Kajita, Toru; Chawanya, Hitoshi; Shimokawa, Tsutomu (2000-01-01). Houlihan, Francis M (ed.). "Design and lithographic performances of 193-specific photoacid generators". Advances in Resist Technology and Processing XVII. 3999: 1120–1127. Bibcode:2000SPIE.3999.1120I. doi:10.1117/12.388276. S2CID 98281255.
Weingartner, Joseph C; Draine, B. T; Barr, David K (2006). "Photoelectric Emission from Dust Grains Exposed to Extreme Ultraviolet and X-Ray Radiation". The Astrophysical Journal. 645 (2): 1188–1197. arXiv:astro-ph/0601296. Bibcode:2006ApJ...645.1188W. doi:10.1086/504420. S2CID 13859981.
Greener, Jesse; Li, Wei; Ren, Judy; Voicu, Dan; Pakharenko, Viktoriya; Tang, Tian; Kumacheva, Eugenia (2010-02-02). "Rapid, cost-efficient fabrication of microfluidic reactors in thermoplastic polymers by combining photolithography and hot embossing". Lab Chip. 10 (4): 522–524. doi:10.1039/b918834g. ISSN 1473-0189. PMID 20126695. S2CID 24567881.
Chochos, Ch.L.; Ismailova, E. (2009). "Hyperbranched Polymers for Photolithographic Applications – Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances". Advanced Materials. 21 (10–11): 1121. Bibcode:2009AdM....21.1121C. doi:10.1002/adma.200801715. S2CID 95710610.
S. Tagawa; et al. (2000). Houlihan, Francis M. (ed.). "Radiation and photochemistry of onium salt acid generators in chemically amplified resists". Proc. SPIE. Advances in Resist Technology and Processing XVII. 3999: 204. Bibcode:2000SPIE.3999..204T. doi:10.1117/12.388304. S2CID 95525894.
Lawson, Richard; Tolbert, Laren; Younkin, Todd; Henderson, Cliff (2009). Henderson, Clifford L (ed.). "Negative-tone molecular resists based on cationic polymerization". Proc. SPIE 7273, Advances in Resist Materials and Processing Technology. Advances in Resist Materials and Processing Technology XXVI. XXVI: 72733E. Bibcode:2009SPIE.7273E..3EL. doi:10.1117/12.814455. S2CID 122244702.

semanticscholar.org

Greener, Jesse; Li, Wei; Ren, Judy; Voicu, Dan; Pakharenko, Viktoriya; Tang, Tian; Kumacheva, Eugenia (2010-02-02). "Rapid, cost-efficient fabrication of microfluidic reactors in thermoplastic polymers by combining photolithography and hot embossing". Lab Chip. 10 (4): 522–524. doi:10.1039/b918834g. ISSN 1473-0189. PMID 20126695. S2CID 24567881.

spiedigitallibrary.org

Lawson, Richard; Tolbert, Laren; Younkin, Todd; Henderson, Cliff (2009). Henderson, Clifford L (ed.). "Negative-tone molecular resists based on cationic polymerization". Proc. SPIE 7273, Advances in Resist Materials and Processing Technology. Advances in Resist Materials and Processing Technology XXVI. XXVI: 72733E. Bibcode:2009SPIE.7273E..3EL. doi:10.1117/12.814455. S2CID 122244702.

springer.com

link.springer.com

Lin, Qinghuang (2007), Mark, James E. (ed.), "Properties of Photoresist Polymers", Physical Properties of Polymers Handbook, New York, NY: Springer New York, pp. 965–979, doi:10.1007/978-0-387-69002-5_57, ISBN 978-0-387-31235-4, retrieved 2023-01-06

uspto.gov

patft.uspto.gov

U.S. patent 4,491,628 "Positive and Negative Working Resist Compositions with Acid-Generating Photoinitiator and Polymer with Acid-Labile Groups Pendant From Polymer Backbone" J.M.J. Fréchet, H. Ito and C.G. Willson 1985.[1]

worldcat.org

Huang, Jingyu; Dahlgren, David A.; Hemminger, John C. (1994-03-01). "Photopatterning of Self-Assembled Alkanethiolate Monolayers on Gold: A Simple Monolayer Photoresist Utilizing Aqueous Chemistry". Langmuir. 10 (3): 626–628. doi:10.1021/la00015a005. ISSN 0743-7463.
Bratton, Daniel; Yang, Da; Dai, Junyan; Ober, Christopher K. (2006-02-01). "Recent progress in high resolution lithography". Polymers for Advanced Technologies. 17 (2): 94–103. doi:10.1002/pat.662. ISSN 1099-1581. S2CID 55877239.
Greener, Jesse; Li, Wei; Ren, Judy; Voicu, Dan; Pakharenko, Viktoriya; Tang, Tian; Kumacheva, Eugenia (2010-02-02). "Rapid, cost-efficient fabrication of microfluidic reactors in thermoplastic polymers by combining photolithography and hot embossing". Lab Chip. 10 (4): 522–524. doi:10.1039/b918834g. ISSN 1473-0189. PMID 20126695. S2CID 24567881.
Physical properties of polymer handbook. James E. Mark (2 ed.). New York: Springer. 2006. ISBN 978-0-387-31235-4. OCLC 619279219.{{cite book}}: CS1 maint: others (link)
Frye, Cecil L.; Collins, Ward T. (1970-09-01). "Oligomeric silsesquioxanes, (HSiO3/2)n". Journal of the American Chemical Society. 92 (19): 5586–5588. doi:10.1021/ja00722a009. ISSN 0002-7863.
Mojarad, Nassir; Gobrecht, Jens; Ekinci, Yasin (2015-03-18). "Beyond EUV lithography: a comparative study of efficient photoresists' performance". Scientific Reports. 5 (1): 9235. Bibcode:2015NatSR...5E9235M. doi:10.1038/srep09235. ISSN 2045-2322. PMC 4363827. PMID 25783209.