Plasma-enhanced chemical vapor deposition (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Plasma-enhanced chemical vapor deposition" in English language version.

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Sterling, H.F; Swann, R.C.G (1965-08-01). "Chemical vapour deposition promoted by r.f. discharge". Solid-State Electronics. 8 (8): 653–654. Bibcode:1965SSEle...8..653S. doi:10.1016/0038-1101(65)90033-X. ISSN 0038-1101.
El amrani, A.; Menous, I.; Mahiou, L.; Tadjine, R.; Touati, A.; Lefgoum, A. (2008-10-01). "Silicon nitride film for solar cells". Renewable Energy. 33 (10): 2289–2293. doi:10.1016/j.renene.2007.12.015.

Sterling, H.F; Swann, R.C.G (1965-08-01). "Chemical vapour deposition promoted by r.f. discharge". Solid-State Electronics. 8 (8): 653–654. Bibcode:1965SSEle...8..653S. doi:10.1016/0038-1101(65)90033-X. ISSN 0038-1101.

Sterling and Swann. "Perfectionnements aux méthodes de formation de couches". bases-brevets.inpi.fr. Retrieved 2018-07-13.

Sterling, H.F; Swann, R.C.G (1965-08-01). "Chemical vapour deposition promoted by r.f. discharge". Solid-State Electronics. 8 (8): 653–654. Bibcode:1965SSEle...8..653S. doi:10.1016/0038-1101(65)90033-X. ISSN 0038-1101.