Plasma etching (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Plasma etching" in English language version.

refsWebsite

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12doi.org

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9harvard.edu

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5worldcat.org

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4semanticscholar.org

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4arxiv.org

69^th place

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4nih.gov

4^th place

2web.archive.org

1^st place

1oxinst.com

low place

1berkeley.edu

580^th place

462^nd place

1pvatepla.com

low place

1sciencedirect.com

149^th place

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arxiv.org

Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11): 718. arXiv:1909.12011. Bibcode:2019arXiv190912011R. doi:10.3390/mi10110718. PMC 6915366. PMID 31653033. S2CID 202889135.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019). "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond". Optical Materials Express. 9 (12): 4716. arXiv:1909.13496. Bibcode:2019OMExp...9.4716R. doi:10.1364/OME.9.004716. S2CID 203593249.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019-10-24). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11). MDPI AG: 718. arXiv:1909.12011. doi:10.3390/mi10110718. ISSN 2072-666X. PMC 6915366. PMID 31653033.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019-11-21). "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond". Optical Materials Express. 9 (12). The Optical Society: 4716. arXiv:1909.13496. Bibcode:2019OMExp...9.4716R. doi:10.1364/ome.9.004716. ISSN 2159-3930.

berkeley.edu

eecs.berkeley.edu

"Ignition conditions for peripheral plasma in a grounded chamber connected to a dual frequency capacitive discharge" (PDF). Archived from the original (PDF) on 2006-03-25.

doi.org

Cardinaud, Christophe; Peignon, Marie-Claude; Tessier, Pierre-Yves (2000-09-01). "Plasma etching: principles, mechanisms, application to micro- and nano-technologies". Applied Surface Science. Surface Science in Micro & Nanotechnology. 164 (1–4): 72–83. Bibcode:2000ApSS..164...72C. doi:10.1016/S0169-4332(00)00328-7.
Coburn, J. W.; Winters, Harold F. (1979-03-01). "Plasma etching—A discussion of mechanisms". Journal of Vacuum Science & Technology. 16 (2): 391–403. Bibcode:1979JVST...16..391C. doi:10.1116/1.569958. ISSN 0022-5355.
Chang, R. P. H.; Chang, C. C.; Darac, S. (1982-01-01). "Hydrogen plasma etching of semiconductors and their oxides". Journal of Vacuum Science & Technology. 20 (1): 45–50. Bibcode:1982JVST...20...45C. doi:10.1116/1.571307. ISSN 0022-5355.
Coburn, J. W.; Winters, Harold F. (1979-05-01). "Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching". Journal of Applied Physics. 50 (5): 3189–3196. Bibcode:1979JAP....50.3189C. doi:10.1063/1.326355. ISSN 0021-8979. S2CID 98770515.
Zia, A. W.; Wang, Y. -Q.; Lee, S. (2015). "Effect of Physical and Chemical Plasma Etching on Surface Wettability of Carbon Fiber-Reinforced Polymer Composites for Bone Plate Applications". Advances in Polymer Technology. 34: n/a. doi:10.1002/adv.21480.
Wasy, A.; Balakrishnan, G.; Lee, S. H.; Kim, J. K.; Kim, D. G.; Kim, T. G.; Song, J. I. (2014). "Argon plasma treatment on metal substrates and effects on diamond-like carbon (DLC) coating properties". Crystal Research and Technology. 49 (1): 55–62. Bibcode:2014CryRT..49...55W. doi:10.1002/crat.201300171. S2CID 98549070.
Keizo Suzuki; Sadayuki Okudaira; Norriyuki Sakudo; Ichiro Kanomata (Nov 11, 1977). "Microwave Plasma Etching". Japanese Journal of Applied Physics. 16 (11): 1979–1984. Bibcode:1977JaJAP..16.1979S. doi:10.1143/jjap.16.1979.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11): 718. arXiv:1909.12011. Bibcode:2019arXiv190912011R. doi:10.3390/mi10110718. PMC 6915366. PMID 31653033. S2CID 202889135.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019). "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond". Optical Materials Express. 9 (12): 4716. arXiv:1909.13496. Bibcode:2019OMExp...9.4716R. doi:10.1364/OME.9.004716. S2CID 203593249.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019-10-24). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11). MDPI AG: 718. arXiv:1909.12011. doi:10.3390/mi10110718. ISSN 2072-666X. PMC 6915366. PMID 31653033.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019-11-21). "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond". Optical Materials Express. 9 (12). The Optical Society: 4716. arXiv:1909.13496. Bibcode:2019OMExp...9.4716R. doi:10.1364/ome.9.004716. ISSN 2159-3930.
Lee, Eung Suok; Park, Hae II; Baik, Hong Koo; Lee, Se-Jong; Song, Kie Moon; Hwang, Myung Keun; Huh, Chang Su (2003). "Air mesh plasma for PCB de-smear process". Surface and Coatings Technology. 171 (1–3): 328–332. doi:10.1016/S0257-8972(03)00295-0.

harvard.edu

ui.adsabs.harvard.edu

Cardinaud, Christophe; Peignon, Marie-Claude; Tessier, Pierre-Yves (2000-09-01). "Plasma etching: principles, mechanisms, application to micro- and nano-technologies". Applied Surface Science. Surface Science in Micro & Nanotechnology. 164 (1–4): 72–83. Bibcode:2000ApSS..164...72C. doi:10.1016/S0169-4332(00)00328-7.
Coburn, J. W.; Winters, Harold F. (1979-03-01). "Plasma etching—A discussion of mechanisms". Journal of Vacuum Science & Technology. 16 (2): 391–403. Bibcode:1979JVST...16..391C. doi:10.1116/1.569958. ISSN 0022-5355.
Chang, R. P. H.; Chang, C. C.; Darac, S. (1982-01-01). "Hydrogen plasma etching of semiconductors and their oxides". Journal of Vacuum Science & Technology. 20 (1): 45–50. Bibcode:1982JVST...20...45C. doi:10.1116/1.571307. ISSN 0022-5355.
Coburn, J. W.; Winters, Harold F. (1979-05-01). "Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching". Journal of Applied Physics. 50 (5): 3189–3196. Bibcode:1979JAP....50.3189C. doi:10.1063/1.326355. ISSN 0021-8979. S2CID 98770515.
Wasy, A.; Balakrishnan, G.; Lee, S. H.; Kim, J. K.; Kim, D. G.; Kim, T. G.; Song, J. I. (2014). "Argon plasma treatment on metal substrates and effects on diamond-like carbon (DLC) coating properties". Crystal Research and Technology. 49 (1): 55–62. Bibcode:2014CryRT..49...55W. doi:10.1002/crat.201300171. S2CID 98549070.
Keizo Suzuki; Sadayuki Okudaira; Norriyuki Sakudo; Ichiro Kanomata (Nov 11, 1977). "Microwave Plasma Etching". Japanese Journal of Applied Physics. 16 (11): 1979–1984. Bibcode:1977JaJAP..16.1979S. doi:10.1143/jjap.16.1979.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11): 718. arXiv:1909.12011. Bibcode:2019arXiv190912011R. doi:10.3390/mi10110718. PMC 6915366. PMID 31653033. S2CID 202889135.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019). "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond". Optical Materials Express. 9 (12): 4716. arXiv:1909.13496. Bibcode:2019OMExp...9.4716R. doi:10.1364/OME.9.004716. S2CID 203593249.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019-11-21). "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond". Optical Materials Express. 9 (12). The Optical Society: 4716. arXiv:1909.13496. Bibcode:2019OMExp...9.4716R. doi:10.1364/ome.9.004716. ISSN 2159-3930.

nih.gov

ncbi.nlm.nih.gov

Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11): 718. arXiv:1909.12011. Bibcode:2019arXiv190912011R. doi:10.3390/mi10110718. PMC 6915366. PMID 31653033. S2CID 202889135.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019-10-24). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11). MDPI AG: 718. arXiv:1909.12011. doi:10.3390/mi10110718. ISSN 2072-666X. PMC 6915366. PMID 31653033.

pubmed.ncbi.nlm.nih.gov

Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11): 718. arXiv:1909.12011. Bibcode:2019arXiv190912011R. doi:10.3390/mi10110718. PMC 6915366. PMID 31653033. S2CID 202889135.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019-10-24). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11). MDPI AG: 718. arXiv:1909.12011. doi:10.3390/mi10110718. ISSN 2072-666X. PMC 6915366. PMID 31653033.

oxinst.com

"Plasma Etch - Plasma Etching". oxinst.com. Archived from the original on January 3, 2011. Retrieved 2010-02-04.

pvatepla.com

"Hochtechnologie - Weltweit | PVA TePla AG".

sciencedirect.com

Lee, Eung Suok; Park, Hae II; Baik, Hong Koo; Lee, Se-Jong; Song, Kie Moon; Hwang, Myung Keun; Huh, Chang Su (2003). "Air mesh plasma for PCB de-smear process". Surface and Coatings Technology. 171 (1–3): 328–332. doi:10.1016/S0257-8972(03)00295-0.

semanticscholar.org

api.semanticscholar.org

Coburn, J. W.; Winters, Harold F. (1979-05-01). "Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching". Journal of Applied Physics. 50 (5): 3189–3196. Bibcode:1979JAP....50.3189C. doi:10.1063/1.326355. ISSN 0021-8979. S2CID 98770515.
Wasy, A.; Balakrishnan, G.; Lee, S. H.; Kim, J. K.; Kim, D. G.; Kim, T. G.; Song, J. I. (2014). "Argon plasma treatment on metal substrates and effects on diamond-like carbon (DLC) coating properties". Crystal Research and Technology. 49 (1): 55–62. Bibcode:2014CryRT..49...55W. doi:10.1002/crat.201300171. S2CID 98549070.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11): 718. arXiv:1909.12011. Bibcode:2019arXiv190912011R. doi:10.3390/mi10110718. PMC 6915366. PMID 31653033. S2CID 202889135.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019). "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond". Optical Materials Express. 9 (12): 4716. arXiv:1909.13496. Bibcode:2019OMExp...9.4716R. doi:10.1364/OME.9.004716. S2CID 203593249.

web.archive.org

"Plasma Etch - Plasma Etching". oxinst.com. Archived from the original on January 3, 2011. Retrieved 2010-02-04.
"Ignition conditions for peripheral plasma in a grounded chamber connected to a dual frequency capacitive discharge" (PDF). Archived from the original (PDF) on 2006-03-25.

worldcat.org

search.worldcat.org

Coburn, J. W.; Winters, Harold F. (1979-03-01). "Plasma etching—A discussion of mechanisms". Journal of Vacuum Science & Technology. 16 (2): 391–403. Bibcode:1979JVST...16..391C. doi:10.1116/1.569958. ISSN 0022-5355.
Chang, R. P. H.; Chang, C. C.; Darac, S. (1982-01-01). "Hydrogen plasma etching of semiconductors and their oxides". Journal of Vacuum Science & Technology. 20 (1): 45–50. Bibcode:1982JVST...20...45C. doi:10.1116/1.571307. ISSN 0022-5355.
Coburn, J. W.; Winters, Harold F. (1979-05-01). "Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching". Journal of Applied Physics. 50 (5): 3189–3196. Bibcode:1979JAP....50.3189C. doi:10.1063/1.326355. ISSN 0021-8979. S2CID 98770515.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019-10-24). "Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing". Micromachines. 10 (11). MDPI AG: 718. arXiv:1909.12011. doi:10.3390/mi10110718. ISSN 2072-666X. PMC 6915366. PMID 31653033.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019-11-21). "Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond". Optical Materials Express. 9 (12). The Optical Society: 4716. arXiv:1909.13496. Bibcode:2019OMExp...9.4716R. doi:10.1364/ome.9.004716. ISSN 2159-3930.