Platinum silicide (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Platinum silicide" in English language version.

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arxiv.org

Kelpeis, J.E.; Beckstein, O.; Pankratoc, O; Hart, G.L.W. (2001). "Chemical bonding, elasticity, and valence force field models: A case study for α−Pt₂Si and Pt'Si". Physical Review B. 64 (15): 155110. arXiv:cond-mat/0106187. doi:10.1103/PhysRevB.64.155110. S2CID 2857031.

azom.com

"Platinum Silicide (PtSi) Semiconductors". AZO Materials. Archived from the original on 2014-12-22. Retrieved 2014-04-28.

byu.edu

scholarsarchive.byu.edu

Kelpeis, J.E.; Beckstein, O.; Pankratoc, O; Hart, G.L.W. (2001). "Chemical bonding, elasticity, and valence force field models: A case study for α−Pt₂Si and Pt'Si". Physical Review B. 64 (15): 155110. arXiv:cond-mat/0106187. doi:10.1103/PhysRevB.64.155110. S2CID 2857031.

doi.org

Graeber, E. J.; Baughman, R. J.; Morosin, B. (1973). "Crystal structure and linear thermal expansitivities of platinum silicide and platinum germanide". Acta Crystallographica Section B: Structural Crystallography and Crystal Chemistry. 29 (9): 1991–1994. doi:10.1107/S0567740873005911.
Kelpeis, J.E.; Beckstein, O.; Pankratoc, O; Hart, G.L.W. (2001). "Chemical bonding, elasticity, and valence force field models: A case study for α−Pt₂Si and Pt'Si". Physical Review B. 64 (15): 155110. arXiv:cond-mat/0106187. doi:10.1103/PhysRevB.64.155110. S2CID 2857031.
Pant, A.K.; Muraka, S.P.; Shepard, C.; Lanford, W. (1992). "Kinetics of platinum silicide formation during rapid thermal processing". Journal of Applied Physics. 72 (5): 1833–1836. Bibcode:1992JAP....72.1833P. doi:10.1063/1.351654.
Naem, A.A. (1988). "Platinum silicide formation using rapid thermal processing". Journal of Applied Physics. 64 (8): 4161–4167. Bibcode:1988JAP....64.4161N. doi:10.1063/1.341329.
Crider, C.A.; Poate, J.M.; Rowe, J.E.; Sheng, T.T. (1981). "Platinum silicide formation under vacuum and controlled impurity ambients". Journal of Applied Physics. 52 (4): 2860–2868. doi:10.1063/1.329018.

espacenet.com

worldwide.espacenet.com

US 5648297, Lin, True-Lon; Park, Jin S. & Gunapala, Sarath D. et al., "Long wavelength PTSI infrared detectors and method of fabrication therof.", published 1997-07-15, assigned to NASA

harvard.edu

ui.adsabs.harvard.edu

Pant, A.K.; Muraka, S.P.; Shepard, C.; Lanford, W. (1992). "Kinetics of platinum silicide formation during rapid thermal processing". Journal of Applied Physics. 72 (5): 1833–1836. Bibcode:1992JAP....72.1833P. doi:10.1063/1.351654.
Naem, A.A. (1988). "Platinum silicide formation using rapid thermal processing". Journal of Applied Physics. 64 (8): 4161–4167. Bibcode:1988JAP....64.4161N. doi:10.1063/1.341329.

matthey.com

technology.matthey.com

"The properties of this platinum silicide films". Platinum Metals Review. 20 (1): 9. 1976.

semanticscholar.org

api.semanticscholar.org

Kelpeis, J.E.; Beckstein, O.; Pankratoc, O; Hart, G.L.W. (2001). "Chemical bonding, elasticity, and valence force field models: A case study for α−Pt₂Si and Pt'Si". Physical Review B. 64 (15): 155110. arXiv:cond-mat/0106187. doi:10.1103/PhysRevB.64.155110. S2CID 2857031.

web.archive.org

"Platinum Silicide (PtSi) Semiconductors". AZO Materials. Archived from the original on 2014-12-22. Retrieved 2014-04-28.