SU-8 photoresist (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "SU-8 photoresist" in English language version.

refsWebsite

Global rank English rank

6doi.org

2^nd place

5web.archive.org

1^st place

4nih.gov

4^th place

3microchem.com

low place

3semanticscholar.org

11^th place

8^th place

2gersteltec.ch

low place

1harvard.edu

18^th place

17^th place

1lsu.edu

3,324^th place

2,257^th place

1crcpress.com

low place

9,832^nd place

1stanford.edu

179^th place

183^rd place

1archive.today

14^th place

1cnm.es

low place

1utwente.nl

low place

8,900^th place

1tufts.edu

155^th place

138^th place

1iop.org

1,725^th place

1,828^th place

1djmicrolaminates.com

low place

archive.today

"SU-8 photosensitive epoxy". 2003. Archived from the original on 30 May 2012. Retrieved 12 Jun 2019.

cnm.es

"SU-8 photosensitive epoxy". 2003. Archived from the original on 30 May 2012. Retrieved 12 Jun 2019.

crcpress.com

Martinez-Duarte R, Madou M (2011). "SU-8 Pholithography and its impact on microfluidics". In Mitra SK, Chakraborty S (eds.). Microfluidics and Nanofluidics Handbook: Fabrication, Implementation and Applications (1st ed.). New York: CRC Press. pp. 231–268. ISBN 9781138072381.

djmicrolaminates.com

"SUEX". djmicrolaminates.com. Retrieved 15 Feb 2017.

doi.org

Liu J, Cai B, Zhu J, et al. (2004). "Process research of high aspect ratio microstructure using SU-8 resist". Microsyst. Technol. 10 (4): 265–8. Bibcode:2004MiTec..10..265L. doi:10.1007/s00542-002-0242-2. S2CID 111062837.
Greener J, Li W, Ren J, et al. (February 2010). "Rapid, cost-efficient fabrication of microfluidic reactors in thermoplastic polymers by combining photolithography and hot embossing". Lab on a Chip. 10 (4): 522–4. doi:10.1039/B918834G. PMID 20126695.
Nemani KV, Moodie KL, Brennick JB, et al. (2013). "In vitro and in vivo evaluation of SU-8 biocompatibility". Materials Science and Engineering: C. 33 (7): 4453–9. doi:10.1016/j.msec.2013.07.001. PMC 3843949. PMID 23910365.
Arscott S (2014). "SU-8 as a material for lab-on-a-chip-based mass spectrometry". Lab on a Chip. 14 (19): 3668–89. doi:10.1039/C4LC00617H. PMID 25029537.
del Campo A, Greiner C (2007). "SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography". J. Micromech. Microeng. 17 (6): R81 – R95. doi:10.1088/0960-1317/17/6/R01. S2CID 18148474.
Melai J, Salm C, Wolters R, et al. (2009). "Qualitative and quantitative characterization of outgassing from SU-8" (PDF). Microelectronic Engineering. 86 (4–6): 761–764. doi:10.1016/j.mee.2008.11.008. S2CID 137789516.

gersteltec.ch

"SU-8 Functional Polymer". Gersteltec Engineering Solutions. Retrieved 12 Jun 2019.
"SU8". Gersteltec Engineering Solutions. Retrieved 12 Jun 2019.

harvard.edu

ui.adsabs.harvard.edu

Liu J, Cai B, Zhu J, et al. (2004). "Process research of high aspect ratio microstructure using SU-8 resist". Microsyst. Technol. 10 (4): 265–8. Bibcode:2004MiTec..10..265L. doi:10.1007/s00542-002-0242-2. S2CID 111062837.

iop.org

iopscience.iop.org

S. Arscott, ‘The limits of edge bead planarization and surface levelling in spin-coated liquid films', J. Micromech. Microeng. 30, 025003, (2020).

lsu.edu

Johnsona DW, Goettertb J, Singhb V, et al. (2012). "SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography" (PDF). Louisiana State University Proceedings.

microchem.com

"SU-8 Resists: FAQs". MicroChem. Archived from the original on 17 May 2009. Retrieved 21 Jul 2011.
"NANO SU-8: Negative Tone Photoresist - formulations 50-100" (PDF). Microchem.com. 2011. Archived from the original (PDF) on 2012-04-25. Retrieved 12 Jun 2019.
"SU-8 2000 Permanent Epoxy Negative Photoresist Processing Guidelines" (PDF). Microchem. Archived from the original (PDF) on 15 April 2017.

nih.gov

pubmed.ncbi.nlm.nih.gov

Greener J, Li W, Ren J, et al. (February 2010). "Rapid, cost-efficient fabrication of microfluidic reactors in thermoplastic polymers by combining photolithography and hot embossing". Lab on a Chip. 10 (4): 522–4. doi:10.1039/B918834G. PMID 20126695.
Nemani KV, Moodie KL, Brennick JB, et al. (2013). "In vitro and in vivo evaluation of SU-8 biocompatibility". Materials Science and Engineering: C. 33 (7): 4453–9. doi:10.1016/j.msec.2013.07.001. PMC 3843949. PMID 23910365.
Arscott S (2014). "SU-8 as a material for lab-on-a-chip-based mass spectrometry". Lab on a Chip. 14 (19): 3668–89. doi:10.1039/C4LC00617H. PMID 25029537.

ncbi.nlm.nih.gov

Nemani KV, Moodie KL, Brennick JB, et al. (2013). "In vitro and in vivo evaluation of SU-8 biocompatibility". Materials Science and Engineering: C. 33 (7): 4453–9. doi:10.1016/j.msec.2013.07.001. PMC 3843949. PMID 23910365.

semanticscholar.org

api.semanticscholar.org

Liu J, Cai B, Zhu J, et al. (2004). "Process research of high aspect ratio microstructure using SU-8 resist". Microsyst. Technol. 10 (4): 265–8. Bibcode:2004MiTec..10..265L. doi:10.1007/s00542-002-0242-2. S2CID 111062837.
del Campo A, Greiner C (2007). "SU-8: a photoresist for high-aspect-ratio and 3D submicron lithography". J. Micromech. Microeng. 17 (6): R81 – R95. doi:10.1088/0960-1317/17/6/R01. S2CID 18148474.
Melai J, Salm C, Wolters R, et al. (2009). "Qualitative and quantitative characterization of outgassing from SU-8" (PDF). Microelectronic Engineering. 86 (4–6): 761–764. doi:10.1016/j.mee.2008.11.008. S2CID 137789516.

stanford.edu

snf.stanford.edu

"SU-8 Developer". Lambers Wiki (Material Safety Data Sheet). 2005. Archived from the original on 11 December 2017. Retrieved 12 Jun 2019.

tufts.edu

engineering.tufts.edu

"SU-8 Photoresist Processing" (PDF). engineering.tufts.edu. 2007. Archived from the original (PDF) on 9 November 2009. Retrieved 12 Jun 2019.

utwente.nl

ris.utwente.nl

Melai J, Salm C, Wolters R, et al. (2009). "Qualitative and quantitative characterization of outgassing from SU-8" (PDF). Microelectronic Engineering. 86 (4–6): 761–764. doi:10.1016/j.mee.2008.11.008. S2CID 137789516.

web.archive.org

"SU-8 Resists: FAQs". MicroChem. Archived from the original on 17 May 2009. Retrieved 21 Jul 2011.
"NANO SU-8: Negative Tone Photoresist - formulations 50-100" (PDF). Microchem.com. 2011. Archived from the original (PDF) on 2012-04-25. Retrieved 12 Jun 2019.
"SU-8 Developer". Lambers Wiki (Material Safety Data Sheet). 2005. Archived from the original on 11 December 2017. Retrieved 12 Jun 2019.
"SU-8 Photoresist Processing" (PDF). engineering.tufts.edu. 2007. Archived from the original (PDF) on 9 November 2009. Retrieved 12 Jun 2019.
"SU-8 2000 Permanent Epoxy Negative Photoresist Processing Guidelines" (PDF). Microchem. Archived from the original (PDF) on 15 April 2017.