T. Doi; I.D. Marinescu; Syuhei Kurokawa (2012). Advances in CMP Polishing Technologies, Chapter 6 – Progress of the Semiconductor and Silicon Industries – Growing Semiconductor Markets and Production Areas. Elsevier. pp. 297–304. doi:10.1016/B978-1-4377-7859-5.00006-5.
As in the Mott formula for conductivity, see Cutler, M.; Mott, N. (1969). "Observation of Anderson Localization in an Electron Gas". Physical Review. 181 (3): 1336. Bibcode:1969PhRv..181.1336C. doi:10.1103/PhysRev.181.1336.
Hulls, K.; McMillan, P. W. (May 22, 1972). "Amorphous semiconductors: a review of current theories". Journal of Physics D: Applied Physics. 5 (5): 865–82. doi:10.1088/0022-3727/5/5/205. S2CID250874071.
As in the Mott formula for conductivity, see Cutler, M.; Mott, N. (1969). "Observation of Anderson Localization in an Electron Gas". Physical Review. 181 (3): 1336. Bibcode:1969PhRv..181.1336C. doi:10.1103/PhysRev.181.1336.
Lidia Łukasiak & Andrzej Jakubowski (January 2010). "History of Semiconductors"(PDF). Journal of Telecommunication and Information Technology: 3. Archived from the original(PDF) on 2013-06-22. Retrieved 2012-08-03.
Hulls, K.; McMillan, P. W. (May 22, 1972). "Amorphous semiconductors: a review of current theories". Journal of Physics D: Applied Physics. 5 (5): 865–82. doi:10.1088/0022-3727/5/5/205. S2CID250874071.
Lidia Łukasiak & Andrzej Jakubowski (January 2010). "History of Semiconductors"(PDF). Journal of Telecommunication and Information Technology: 3. Archived from the original(PDF) on 2013-06-22. Retrieved 2012-08-03.