Claeys, C.; Simoen, E.; Neimash, V. B.; Kraitchinskii, A.; Kras’ko, M.; Puzenko, O.; Blondeel, A.; Clauws, P. (2001). "Tin Doping of Silicon for Controlling Oxygen Precipitation and Radiation Hardness". Journal of the Electrochemical Society. 148 (12): G738. Bibcode:2001JElS..148G.738C. doi:10.1149/1.1417558.
Akasaka, Youichi; Horie, Kazuo; Nakamura, Genshiro; Tsukamoto, Katsuhiro; Yukimoto, Yoshinori (October 1974). "Study of Tin Diffusion into Silicon by Backscattering Analysis". Japanese Journal of Applied Physics. 13 (10): 1533–1540. Bibcode:1974JaJAP..13.1533A. doi:10.1143/JJAP.13.1533. S2CID121383273.
Hussain, Aftab M.; Fahad, Hossain M.; Singh, Nirpendra; Sevilla, Galo A. Torres; Schwingenschlögl, Udo; Hussain, Muhammad M. (2013). "Exploring SiSn as channel material for LSTP device applications". 71st Device Research Conference. pp. 93–94. doi:10.1109/DRC.2013.6633809. ISBN978-1-4799-0814-1. S2CID42075329.
Hussain, Aftab M.; Fahad, Hossain M.; Singh, Nirpendra; Sevilla, Galo A. Torres; Schwingenschlögl, Udo; Hussain, Muhammad M. (13 January 2014). "Tin - an unlikely ally for silicon field effect transistors?". Physica Status Solidi RRL. 8 (4): 332–335. Bibcode:2014PSSRR...8..332H. doi:10.1002/pssr.201308300. S2CID93729786.
Hussain, Aftab M.; Fahad, Hossain M.; Singh, Nirpendra; Sevilla, Galo A. Torres; Schwingenschlögl, Udo; Hussain, Muhammad M. (2013). "Tin (Sn) for enhancing performance in silicon CMOS". 2013 IEEE 8th Nanotechnology Materials and Devices Conference (NMDC). pp. 13–15. doi:10.1109/NMDC.2013.6707470. ISBN978-1-4799-3387-7. S2CID21059449.
Claeys, C.; Simoen, E.; Neimash, V. B.; Kraitchinskii, A.; Kras’ko, M.; Puzenko, O.; Blondeel, A.; Clauws, P. (2001). "Tin Doping of Silicon for Controlling Oxygen Precipitation and Radiation Hardness". Journal of the Electrochemical Society. 148 (12): G738. Bibcode:2001JElS..148G.738C. doi:10.1149/1.1417558.
Akasaka, Youichi; Horie, Kazuo; Nakamura, Genshiro; Tsukamoto, Katsuhiro; Yukimoto, Yoshinori (October 1974). "Study of Tin Diffusion into Silicon by Backscattering Analysis". Japanese Journal of Applied Physics. 13 (10): 1533–1540. Bibcode:1974JaJAP..13.1533A. doi:10.1143/JJAP.13.1533. S2CID121383273.
Hussain, Aftab M.; Fahad, Hossain M.; Singh, Nirpendra; Sevilla, Galo A. Torres; Schwingenschlögl, Udo; Hussain, Muhammad M. (13 January 2014). "Tin - an unlikely ally for silicon field effect transistors?". Physica Status Solidi RRL. 8 (4): 332–335. Bibcode:2014PSSRR...8..332H. doi:10.1002/pssr.201308300. S2CID93729786.
Akasaka, Youichi; Horie, Kazuo; Nakamura, Genshiro; Tsukamoto, Katsuhiro; Yukimoto, Yoshinori (October 1974). "Study of Tin Diffusion into Silicon by Backscattering Analysis". Japanese Journal of Applied Physics. 13 (10): 1533–1540. Bibcode:1974JaJAP..13.1533A. doi:10.1143/JJAP.13.1533. S2CID121383273.
Hussain, Aftab M.; Fahad, Hossain M.; Singh, Nirpendra; Sevilla, Galo A. Torres; Schwingenschlögl, Udo; Hussain, Muhammad M. (2013). "Exploring SiSn as channel material for LSTP device applications". 71st Device Research Conference. pp. 93–94. doi:10.1109/DRC.2013.6633809. ISBN978-1-4799-0814-1. S2CID42075329.
Hussain, Aftab M.; Fahad, Hossain M.; Singh, Nirpendra; Sevilla, Galo A. Torres; Schwingenschlögl, Udo; Hussain, Muhammad M. (13 January 2014). "Tin - an unlikely ally for silicon field effect transistors?". Physica Status Solidi RRL. 8 (4): 332–335. Bibcode:2014PSSRR...8..332H. doi:10.1002/pssr.201308300. S2CID93729786.
Hussain, Aftab M.; Fahad, Hossain M.; Singh, Nirpendra; Sevilla, Galo A. Torres; Schwingenschlögl, Udo; Hussain, Muhammad M. (2013). "Tin (Sn) for enhancing performance in silicon CMOS". 2013 IEEE 8th Nanotechnology Materials and Devices Conference (NMDC). pp. 13–15. doi:10.1109/NMDC.2013.6707470. ISBN978-1-4799-3387-7. S2CID21059449.