Reisman, Arnold; Holtzberg, Frederic; Berkenblit, Melvin; Berry, Margaret (20 September 1956). "Reactions of the Group VB Pentoxides with Alkali Oxides and Carbonates. III. Thermal and X-Ray Phase Diagrams of the System K2O or K2CO3 with Ta2O5". Journal of the American Chemical Society. 78 (18): 4514–4520. doi:10.1021/ja01599a003.
Askeljung, Charlotta; Marinder, Bengt-Olov; Sundberg, Margareta (1 November 2003). "Effect of heat treatment on the structure of L-Ta2O5". Journal of Solid State Chemistry. 176 (1): 250–258. Bibcode:2003JSSCh.176..250A. doi:10.1016/j.jssc.2003.07.003.
Stephenson, N. C.; Roth, R. S. (1971). "Structural systematics in the binary system Ta2O5–WO3. V. The structure of the low-temperature form of tantalum oxide L-Ta2O5". Acta Crystallographica Section B. 27 (5): 1037–1044. Bibcode:1971AcCrB..27.1037S. doi:10.1107/S056774087100342X.
Hummel, Hans-U.; Fackler, Richard; Remmert, Peter (1992). "Tantaloxide durch Gasphasenhydrolyse, Druckhydrolyse und Transportreaktion aus 2H-TaS2: Synthesen von TT-Ta2O5 und T-Ta2O5 und Kristallstruktur von T-Ta2O5". Chemische Berichte. 125 (3): 551–556. doi:10.1002/cber.19921250304.
Zibrov, I. P.; Filonenko, V. P.; Sundberg, M.; Werner, P.-E. (1 August 2000). "Structures and phase transitions of B-Ta2O5 and Z-Ta2O5: two high-pressure forms of Ta2O5". Acta Crystallographica Section B. 56 (4): 659–665. doi:10.1107/S0108768100005462. PMID10944257. S2CID22330435.
Fleming, R. M.; Lang, D. V.; Jones, C. D. W.; Steigerwald, M. L.; Murphy, D. W.; Alers, G. B.; Wong, Y.-H.; van Dover, R. B.; Kwo, J. R.; Sergent, A. M. (1 January 2000). "Defect dominated charge transport in amorphous Ta2O5 thin films". Journal of Applied Physics. 88 (2): 850. Bibcode:2000JAP....88..850F. doi:10.1063/1.373747.
Murawala, Prakash A.; Sawai, Mikio; Tatsuta, Toshiaki; Tsuji, Osamu; Fujita, Shizuo; Fujita, Shigeo (1993). "Structural and Electrical Properties of Ta2O5 Grown by the Plasma-Enhanced Liquid Source CVD Using Penta Ethoxy Tantalum Source". Japanese Journal of Applied Physics. 32 (Part 1, No. 1B): 368–375. Bibcode:1993JaJAP..32..368M. doi:10.1143/JJAP.32.368. S2CID97813703.
Ramprasad, R. (1 January 2003). "First principles study of oxygen vacancy defects in tantalum pentoxide". Journal of Applied Physics. 94 (9): 5609–5612. Bibcode:2003JAP....94.5609R. doi:10.1063/1.1615700.
Sawada, H.; Kawakami, K. (1 January 1999). "Electronic structure of oxygen vacancy in Ta2O5". Journal of Applied Physics. 86 (2): 956. Bibcode:1999JAP....86..956S. doi:10.1063/1.370831.
Nashed, Ramy; Hassan, Walid M. I.; Ismail, Yehea; Allam, Nageh K. (2013). "Unravelling the interplay of crystal structure and electronic band structure of tantalum oxide (Ta2O5)". Physical Chemistry Chemical Physics. 15 (5): 1352–7. Bibcode:2013PCCP...15.1352N. doi:10.1039/C2CP43492J. PMID23243661.
Macagno, V.; Schultze, J.W. (1 December 1984). "The growth and properties of thin oxide layers on tantalum electrodes". Journal of Electroanalytical Chemistry and Interfacial Electrochemistry. 180 (1–2): 157–170. doi:10.1016/0368-1874(84)83577-7.
Hiratani, M.; Kimura, S.; Hamada, T.; Iijima, S.; Nakanishi, N. (1 January 2002). "Hexagonal polymorph of tantalum–pentoxide with enhanced dielectric constant". Applied Physics Letters. 81 (13): 2433. Bibcode:2002ApPhL..81.2433H. doi:10.1063/1.1509861.
Agulyansky, A (2003). "Potassium fluorotantalate in solid, dissolved and molten conditions". J. Fluorine Chem. 123 (2): 155–161. doi:10.1016/S0022-1139(03)00190-8.
Ezhilvalavan, S.; Tseng, T. Y. (1999). "Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application - a review". Journal of Materials Science: Materials in Electronics. 10 (1): 9–31. doi:10.1023/A:1008970922635. S2CID55644772.
Chaneliere, C; Autran, J L; Devine, R A B; Balland, B (1998). "Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications". Materials Science and Engineering: R. 22 (6): 269–322. doi:10.1016/S0927-796X(97)00023-5.
Wang, X; et al. (2004). "A Novel MONOS-Type Nonvolatile Memory Using High-κ Dielectrics for Improved Data Retention and Programming Speed". IEEE Transactions on Electron Devices. 51 (4): 597–602. Bibcode:2004ITED...51..597W. doi:10.1109/TED.2004.824684.
Askeljung, Charlotta; Marinder, Bengt-Olov; Sundberg, Margareta (1 November 2003). "Effect of heat treatment on the structure of L-Ta2O5". Journal of Solid State Chemistry. 176 (1): 250–258. Bibcode:2003JSSCh.176..250A. doi:10.1016/j.jssc.2003.07.003.
Stephenson, N. C.; Roth, R. S. (1971). "Structural systematics in the binary system Ta2O5–WO3. V. The structure of the low-temperature form of tantalum oxide L-Ta2O5". Acta Crystallographica Section B. 27 (5): 1037–1044. Bibcode:1971AcCrB..27.1037S. doi:10.1107/S056774087100342X.
Fleming, R. M.; Lang, D. V.; Jones, C. D. W.; Steigerwald, M. L.; Murphy, D. W.; Alers, G. B.; Wong, Y.-H.; van Dover, R. B.; Kwo, J. R.; Sergent, A. M. (1 January 2000). "Defect dominated charge transport in amorphous Ta2O5 thin films". Journal of Applied Physics. 88 (2): 850. Bibcode:2000JAP....88..850F. doi:10.1063/1.373747.
Murawala, Prakash A.; Sawai, Mikio; Tatsuta, Toshiaki; Tsuji, Osamu; Fujita, Shizuo; Fujita, Shigeo (1993). "Structural and Electrical Properties of Ta2O5 Grown by the Plasma-Enhanced Liquid Source CVD Using Penta Ethoxy Tantalum Source". Japanese Journal of Applied Physics. 32 (Part 1, No. 1B): 368–375. Bibcode:1993JaJAP..32..368M. doi:10.1143/JJAP.32.368. S2CID97813703.
Ramprasad, R. (1 January 2003). "First principles study of oxygen vacancy defects in tantalum pentoxide". Journal of Applied Physics. 94 (9): 5609–5612. Bibcode:2003JAP....94.5609R. doi:10.1063/1.1615700.
Sawada, H.; Kawakami, K. (1 January 1999). "Electronic structure of oxygen vacancy in Ta2O5". Journal of Applied Physics. 86 (2): 956. Bibcode:1999JAP....86..956S. doi:10.1063/1.370831.
Nashed, Ramy; Hassan, Walid M. I.; Ismail, Yehea; Allam, Nageh K. (2013). "Unravelling the interplay of crystal structure and electronic band structure of tantalum oxide (Ta2O5)". Physical Chemistry Chemical Physics. 15 (5): 1352–7. Bibcode:2013PCCP...15.1352N. doi:10.1039/C2CP43492J. PMID23243661.
Hiratani, M.; Kimura, S.; Hamada, T.; Iijima, S.; Nakanishi, N. (1 January 2002). "Hexagonal polymorph of tantalum–pentoxide with enhanced dielectric constant". Applied Physics Letters. 81 (13): 2433. Bibcode:2002ApPhL..81.2433H. doi:10.1063/1.1509861.
Wang, X; et al. (2004). "A Novel MONOS-Type Nonvolatile Memory Using High-κ Dielectrics for Improved Data Retention and Programming Speed". IEEE Transactions on Electron Devices. 51 (4): 597–602. Bibcode:2004ITED...51..597W. doi:10.1109/TED.2004.824684.
Zibrov, I. P.; Filonenko, V. P.; Sundberg, M.; Werner, P.-E. (1 August 2000). "Structures and phase transitions of B-Ta2O5 and Z-Ta2O5: two high-pressure forms of Ta2O5". Acta Crystallographica Section B. 56 (4): 659–665. doi:10.1107/S0108768100005462. PMID10944257. S2CID22330435.
Nashed, Ramy; Hassan, Walid M. I.; Ismail, Yehea; Allam, Nageh K. (2013). "Unravelling the interplay of crystal structure and electronic band structure of tantalum oxide (Ta2O5)". Physical Chemistry Chemical Physics. 15 (5): 1352–7. Bibcode:2013PCCP...15.1352N. doi:10.1039/C2CP43492J. PMID23243661.
Zibrov, I. P.; Filonenko, V. P.; Sundberg, M.; Werner, P.-E. (1 August 2000). "Structures and phase transitions of B-Ta2O5 and Z-Ta2O5: two high-pressure forms of Ta2O5". Acta Crystallographica Section B. 56 (4): 659–665. doi:10.1107/S0108768100005462. PMID10944257. S2CID22330435.
Murawala, Prakash A.; Sawai, Mikio; Tatsuta, Toshiaki; Tsuji, Osamu; Fujita, Shizuo; Fujita, Shigeo (1993). "Structural and Electrical Properties of Ta2O5 Grown by the Plasma-Enhanced Liquid Source CVD Using Penta Ethoxy Tantalum Source". Japanese Journal of Applied Physics. 32 (Part 1, No. 1B): 368–375. Bibcode:1993JaJAP..32..368M. doi:10.1143/JJAP.32.368. S2CID97813703.
Ezhilvalavan, S.; Tseng, T. Y. (1999). "Preparation and properties of tantalum pentoxide (Ta2O5) thin films for ultra large scale integrated circuits (ULSIs) application - a review". Journal of Materials Science: Materials in Electronics. 10 (1): 9–31. doi:10.1023/A:1008970922635. S2CID55644772.