Lengauer, W.; Binder, S.; Aigner, K.; Ettmayer, P.; Guillou, A.; de Buigne, J.; Groboth, G. (1995). "Solid state properties of group IV‑b carbonitrides". Journal of Alloys and Compounds. 217: 137–147. doi:10.1016/0925-8388(94)01315-9.
Lengauer, Walter (1992). "Properties of bulk δ-TiN1−x prepared by nitrogen diffusion into titanium metal". Journal of Alloys and Compounds. 186 (2): 293–307. doi:10.1016/0925-8388(92)90016-3.
Wang, Wei-E (1996). "Partial thermodynamic properties of the Ti-N system". Journal of Alloys and Compounds. 233 (1–2): 89–95. doi:10.1016/0925-8388(96)80039-9.
Spengler, W.; et al. (1978). "Raman scattering, superconductivity, and phonon density of states of stoichiometric and nonstoichiometric TiN". Physical Review B. 17 (3): 1095–1101. Bibcode:1978PhRvB..17.1095S. doi:10.1103/PhysRevB.17.1095.
Dziura, Thaddeus G.; Bunday, Benjamin; Smith, Casey; Hussain, Muhammad M.; Harris, Rusty; Zhang, Xiafang; Price, Jimmy M. (2008). "Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry". Proceedings of SPIE. Metrology, Inspection, and Process Control for Microlithography XXII. 6922 (2): 69220V. Bibcode:2008SPIE.6922E..0VD. doi:10.1117/12.773593. S2CID120728898.
Abadias, G. (2008). "Stress and preferred orientation in nitride based PVD coatings". Surf. Coat. Technol. 202 (11): 2223–2235. doi:10.1016/j.surfcoat.2007.08.029.
Spengler, W.; et al. (1978). "Raman scattering, superconductivity, and phonon density of states of stoichiometric and nonstoichiometric TiN". Physical Review B. 17 (3): 1095–1101. Bibcode:1978PhRvB..17.1095S. doi:10.1103/PhysRevB.17.1095.
Dziura, Thaddeus G.; Bunday, Benjamin; Smith, Casey; Hussain, Muhammad M.; Harris, Rusty; Zhang, Xiafang; Price, Jimmy M. (2008). "Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry". Proceedings of SPIE. Metrology, Inspection, and Process Control for Microlithography XXII. 6922 (2): 69220V. Bibcode:2008SPIE.6922E..0VD. doi:10.1117/12.773593. S2CID120728898.
Dziura, Thaddeus G.; Bunday, Benjamin; Smith, Casey; Hussain, Muhammad M.; Harris, Rusty; Zhang, Xiafang; Price, Jimmy M. (2008). "Measurement of high-k and metal film thickness on FinFET sidewalls using scatterometry". Proceedings of SPIE. Metrology, Inspection, and Process Control for Microlithography XXII. 6922 (2): 69220V. Bibcode:2008SPIE.6922E..0VD. doi:10.1117/12.773593. S2CID120728898.