Very Large Scale Integration (English Wikipedia)

Analysis of information sources in references of the Wikipedia article "Very Large Scale Integration" in English language version.

refsWebsite

Global rank English rank

4doi.org

2^nd place

2harvard.edu

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17^th place

2worldcat.org

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2ieee.org

652^nd place

515^th place

1web.archive.org

1^st place

1nobelprize.org

301^st place

478^th place

1bbc.co.uk

8^th place

10^th place

1computerhistory.org

2,213^th place

1,495^th place

1jstor.org

26^th place

20^th place

1books.google.com

3^rd place

1insemitech.com

low place

1acm.org

1,185^th place

840^th place

1vlsiweb.com

low place

1spiedigitallibrary.org

low place

acm.org

dl.acm.org

Wang, Laung-Terng; Chang, Yao-Wen; Cheng, Kwang-Ting (Tim) (February 2009). Electronic Design Automation: Synthesis, Verification, and Test. San Francisco, CA, USA: Morgan Kaufmann Publishers Inc. ISBN 978-0-08-092200-3.

bbc.co.uk

"BBC - History - Historic Figures: Kilby and Noyce (1923-2005)". www.bbc.co.uk. Retrieved 10 August 2024.

books.google.com

Jain, B. K. (August 2009). Digital Electronics - A Modern Approach by B K Jain. Global Vision Publishing House. ISBN 9788182202153. Retrieved 2 May 2017.

computerhistory.org

"1964: First Commercial MOS IC Introduced". Computer History Museum.

doi.org

O’Regan, Gerard (2016), O'Regan, Gerard (ed.), "The Invention of the Integrated Circuit and the Birth of Silicon Valley", Introduction to the History of Computing: A Computing History Primer, Undergraduate Topics in Computer Science, Cham: Springer International Publishing, pp. 93–100, doi:10.1007/978-3-319-33138-6_7, ISBN 978-3-319-33138-6, retrieved 10 August 2024
Hittinger, William C. (1973). "Metal-Oxide-Semiconductor Technology". Scientific American. 229 (2): 48–59. Bibcode:1973SciAm.229b..48H. doi:10.1038/scientificamerican0873-48. ISSN 0036-8733. JSTOR 24923169.
Wu, Qiang; Li, Yanli; Yang, Yushu; Chen, Shoumian; Zhao, Yuhang (26 June 2020). "The Law that Guides the Development of Photolithography Technology and the Methodology in the Design of Photolithographic Process". 2020 China Semiconductor Technology International Conference (CSTIC). IEEE. pp. 1–6. doi:10.1109/CSTIC49141.2020.9282436. ISBN 978-1-7281-6558-5.
Rieger, Michael L. (26 November 2019). "Retrospective on VLSI value scaling and lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 18 (4): 040902. Bibcode:2019JMM&M..18d0902R. doi:10.1117/1.JMM.18.4.040902. ISSN 1932-5150.

harvard.edu

ui.adsabs.harvard.edu

Hittinger, William C. (1973). "Metal-Oxide-Semiconductor Technology". Scientific American. 229 (2): 48–59. Bibcode:1973SciAm.229b..48H. doi:10.1038/scientificamerican0873-48. ISSN 0036-8733. JSTOR 24923169.
Rieger, Michael L. (26 November 2019). "Retrospective on VLSI value scaling and lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 18 (4): 040902. Bibcode:2019JMM&M..18d0902R. doi:10.1117/1.JMM.18.4.040902. ISSN 1932-5150.

ieee.org

spectrum.ieee.org

Zorpette, Glenn (20 November 2022). "How the First Transistor Worked". IEEE Spectrum.

ieeexplore.ieee.org

Wu, Qiang; Li, Yanli; Yang, Yushu; Chen, Shoumian; Zhao, Yuhang (26 June 2020). "The Law that Guides the Development of Photolithography Technology and the Methodology in the Design of Photolithographic Process". 2020 China Semiconductor Technology International Conference (CSTIC). IEEE. pp. 1–6. doi:10.1109/CSTIC49141.2020.9282436. ISBN 978-1-7281-6558-5.

insemitech.com

"Exploring the Challenges of VLSI Design: Navigating Complexity for Success". InSemi Tech. Retrieved 10 August 2024.

jstor.org

Hittinger, William C. (1973). "Metal-Oxide-Semiconductor Technology". Scientific American. 229 (2): 48–59. Bibcode:1973SciAm.229b..48H. doi:10.1038/scientificamerican0873-48. ISSN 0036-8733. JSTOR 24923169.

nobelprize.org

"The History of the Integrated Circuit". Nobelprize.org. Archived from the original on 29 June 2018. Retrieved 21 April 2012.

spiedigitallibrary.org

Rieger, Michael L. (26 November 2019). "Retrospective on VLSI value scaling and lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 18 (4): 040902. Bibcode:2019JMM&M..18d0902R. doi:10.1117/1.JMM.18.4.040902. ISSN 1932-5150.

vlsiweb.com

"Clock Skew in STA". 23 June 2024. Retrieved 10 August 2024.

web.archive.org

"The History of the Integrated Circuit". Nobelprize.org. Archived from the original on 29 June 2018. Retrieved 21 April 2012.

worldcat.org

search.worldcat.org

Hittinger, William C. (1973). "Metal-Oxide-Semiconductor Technology". Scientific American. 229 (2): 48–59. Bibcode:1973SciAm.229b..48H. doi:10.1038/scientificamerican0873-48. ISSN 0036-8733. JSTOR 24923169.
Rieger, Michael L. (26 November 2019). "Retrospective on VLSI value scaling and lithography". Journal of Micro/Nanolithography, MEMS, and MOEMS. 18 (4): 040902. Bibcode:2019JMM&M..18d0902R. doi:10.1117/1.JMM.18.4.040902. ISSN 1932-5150.