Ensamblaje dirigido de micro y nanoestructuras (Spanish Wikipedia)

Analysis of information sources in references of the Wikipedia article "Ensamblaje dirigido de micro y nanoestructuras" in Spanish language version.

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doi.org

dx.doi.org

Suh, Hyo Seon; Kim, Do Han; Moni, Priya; Xiong, Shisheng; Ocola, Leonidas E.; Zaluzec, Nestor J.; Gleason, Karen K.; Nealey, Paul F. (July 2017). «Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat». Nature Nanotechnology (en inglés) 12 (6): 575-581. Bibcode:2017NatNa..12..575S. ISSN 1748-3387. PMID 28346456. doi:10.1038/nnano.2017.34.

harvard.edu

adsabs.harvard.edu

Suh, Hyo Seon; Kim, Do Han; Moni, Priya; Xiong, Shisheng; Ocola, Leonidas E.; Zaluzec, Nestor J.; Gleason, Karen K.; Nealey, Paul F. (July 2017). «Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat». Nature Nanotechnology (en inglés) 12 (6): 575-581. Bibcode:2017NatNa..12..575S. ISSN 1748-3387. PMID 28346456. doi:10.1038/nnano.2017.34.

issn.org

portal.issn.org

Suh, Hyo Seon; Kim, Do Han; Moni, Priya; Xiong, Shisheng; Ocola, Leonidas E.; Zaluzec, Nestor J.; Gleason, Karen K.; Nealey, Paul F. (July 2017). «Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat». Nature Nanotechnology (en inglés) 12 (6): 575-581. Bibcode:2017NatNa..12..575S. ISSN 1748-3387. PMID 28346456. doi:10.1038/nnano.2017.34.

nih.gov

ncbi.nlm.nih.gov

Suh, Hyo Seon; Kim, Do Han; Moni, Priya; Xiong, Shisheng; Ocola, Leonidas E.; Zaluzec, Nestor J.; Gleason, Karen K.; Nealey, Paul F. (July 2017). «Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat». Nature Nanotechnology (en inglés) 12 (6): 575-581. Bibcode:2017NatNa..12..575S. ISSN 1748-3387. PMID 28346456. doi:10.1038/nnano.2017.34.

osti.gov

Suh, Hyo Seon; Kim, Do Han; Moni, Priya; Xiong, Shisheng; Ocola, Leonidas E.; Zaluzec, Nestor J.; Gleason, Karen K.; Nealey, Paul F. (July 2017). «Sub-10-nm patterning via directed self-assembly of block copolymer films with a vapour-phase deposited topcoat». Nature Nanotechnology (en inglés) 12 (6): 575-581. Bibcode:2017NatNa..12..575S. ISSN 1748-3387. PMID 28346456. doi:10.1038/nnano.2017.34.