Grabado con plasma (Spanish Wikipedia)

Analysis of information sources in references of the Wikipedia article "Grabado con plasma" in Spanish language version.

refsWebsite

Global rank Spanish rank

12doi.org

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9harvard.edu

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5issn.org

57^th place

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4arxiv.org

69^th place

148^th place

2nih.gov

4^th place

1oxinst.com

low place

1pvatepla.com

low place

1sciencedirect.com

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128^th place

arxiv.org

Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). «Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing». Micromachines 10 (11): 718. Bibcode:2019arXiv190912011R. PMC 6915366. PMID 31653033. arXiv:1909.12011. doi:10.3390/mi10110718.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019). «Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond». Optical Materials Express 9 (12): 4716. Bibcode:2019OMExp...9.4716R. arXiv:1909.13496. doi:10.1364/OME.9.004716.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (24 de octubre de 2019). «Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing». Micromachines (MDPI AG) 10 (11): 718. ISSN 2072-666X. PMC 6915366. PMID 31653033. arXiv:1909.12011. doi:10.3390/mi10110718.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (21 de noviembre de 2019). «Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond». Optical Materials Express (The Optical Society) 9 (12): 4716. Bibcode:2019OMExp...9.4716R. ISSN 2159-3930. arXiv:1909.13496. doi:10.1364/ome.9.004716.

doi.org

dx.doi.org

Cardinaud, Christophe; Peignon, Marie-Claude; Tessier, Pierre-Yves (1 de septiembre de 2000). «Plasma etching: principles, mechanisms, application to micro- and nano-technologies». Applied Surface Science. Surface Science in Micro & Nanotechnology 164 (1–4): 72-83. Bibcode:2000ApSS..164...72C. doi:10.1016/S0169-4332(00)00328-7.
Coburn, J. W.; Winters, Harold F. (1 de marzo de 1979). «Plasma etching—A discussion of mechanisms». Journal of Vacuum Science & Technology 16 (2): 391-403. Bibcode:1979JVST...16..391C. ISSN 0022-5355. doi:10.1116/1.569958.
Chang, R. P. H.; Chang, C. C.; Darac, S. (1 de enero de 1982). «Hydrogen plasma etching of semiconductors and their oxides». Journal of Vacuum Science & Technology 20 (1): 45-50. Bibcode:1982JVST...20...45C. ISSN 0022-5355. doi:10.1116/1.571307.
Coburn, J. W.; Winters, Harold F. (1 de mayo de 1979). «Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching». Journal of Applied Physics 50 (5): 3189-3196. Bibcode:1979JAP....50.3189C. ISSN 0021-8979. doi:10.1063/1.326355.
Zia, A. W.; Wang, Y. -Q.; Lee, S. (2015). «Effect of Physical and Chemical Plasma Etching on Surface Wettability of Carbon Fiber-Reinforced Polymer Composites for Bone Plate Applications». Advances in Polymer Technology 34: n/a. doi:10.1002/adv.21480.
Wasy, A.; Balakrishnan, G.; Lee, S. H.; Kim, J. K.; Kim, D. G.; Kim, T. G.; Song, J. I. (2014). «Argon plasma treatment on metal substrates and effects on diamond-like carbon (DLC) coating properties». Crystal Research and Technology 49 (1): 55-62. Bibcode:2014CryRT..49...55W. doi:10.1002/crat.201300171.
Keizo Suzuki; Sadayuki Okudaira; Norriyuki Sakudo; Ichiro Kanomata (11 de noviembre de 1977). «Microwave Plasma Etching». Japanese Journal of Applied Physics 16 (11): 1979-1984. Bibcode:1977JaJAP..16.1979S. doi:10.1143/jjap.16.1979.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). «Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing». Micromachines 10 (11): 718. Bibcode:2019arXiv190912011R. PMC 6915366. PMID 31653033. arXiv:1909.12011. doi:10.3390/mi10110718.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019). «Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond». Optical Materials Express 9 (12): 4716. Bibcode:2019OMExp...9.4716R. arXiv:1909.13496. doi:10.1364/OME.9.004716.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (24 de octubre de 2019). «Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing». Micromachines (MDPI AG) 10 (11): 718. ISSN 2072-666X. PMC 6915366. PMID 31653033. arXiv:1909.12011. doi:10.3390/mi10110718.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (21 de noviembre de 2019). «Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond». Optical Materials Express (The Optical Society) 9 (12): 4716. Bibcode:2019OMExp...9.4716R. ISSN 2159-3930. arXiv:1909.13496. doi:10.1364/ome.9.004716.
Lee, Eung Suok; Park, Hae II; Baik, Hong Koo; Lee, Se-Jong; Song, Kie Moon; Hwang, Myung Keun; Huh, Chang Su (2003). «Air mesh plasma for PCB de-smear process». Surface and Coatings Technology 171 (1–3): 328-332. doi:10.1016/S0257-8972(03)00295-0.

harvard.edu

adsabs.harvard.edu

Cardinaud, Christophe; Peignon, Marie-Claude; Tessier, Pierre-Yves (1 de septiembre de 2000). «Plasma etching: principles, mechanisms, application to micro- and nano-technologies». Applied Surface Science. Surface Science in Micro & Nanotechnology 164 (1–4): 72-83. Bibcode:2000ApSS..164...72C. doi:10.1016/S0169-4332(00)00328-7.
Coburn, J. W.; Winters, Harold F. (1 de marzo de 1979). «Plasma etching—A discussion of mechanisms». Journal of Vacuum Science & Technology 16 (2): 391-403. Bibcode:1979JVST...16..391C. ISSN 0022-5355. doi:10.1116/1.569958.
Chang, R. P. H.; Chang, C. C.; Darac, S. (1 de enero de 1982). «Hydrogen plasma etching of semiconductors and their oxides». Journal of Vacuum Science & Technology 20 (1): 45-50. Bibcode:1982JVST...20...45C. ISSN 0022-5355. doi:10.1116/1.571307.
Coburn, J. W.; Winters, Harold F. (1 de mayo de 1979). «Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching». Journal of Applied Physics 50 (5): 3189-3196. Bibcode:1979JAP....50.3189C. ISSN 0021-8979. doi:10.1063/1.326355.
Wasy, A.; Balakrishnan, G.; Lee, S. H.; Kim, J. K.; Kim, D. G.; Kim, T. G.; Song, J. I. (2014). «Argon plasma treatment on metal substrates and effects on diamond-like carbon (DLC) coating properties». Crystal Research and Technology 49 (1): 55-62. Bibcode:2014CryRT..49...55W. doi:10.1002/crat.201300171.
Keizo Suzuki; Sadayuki Okudaira; Norriyuki Sakudo; Ichiro Kanomata (11 de noviembre de 1977). «Microwave Plasma Etching». Japanese Journal of Applied Physics 16 (11): 1979-1984. Bibcode:1977JaJAP..16.1979S. doi:10.1143/jjap.16.1979.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). «Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing». Micromachines 10 (11): 718. Bibcode:2019arXiv190912011R. PMC 6915366. PMID 31653033. arXiv:1909.12011. doi:10.3390/mi10110718.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (2019). «Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond». Optical Materials Express 9 (12): 4716. Bibcode:2019OMExp...9.4716R. arXiv:1909.13496. doi:10.1364/OME.9.004716.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (21 de noviembre de 2019). «Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond». Optical Materials Express (The Optical Society) 9 (12): 4716. Bibcode:2019OMExp...9.4716R. ISSN 2159-3930. arXiv:1909.13496. doi:10.1364/ome.9.004716.

issn.org

portal.issn.org

Coburn, J. W.; Winters, Harold F. (1 de marzo de 1979). «Plasma etching—A discussion of mechanisms». Journal of Vacuum Science & Technology 16 (2): 391-403. Bibcode:1979JVST...16..391C. ISSN 0022-5355. doi:10.1116/1.569958.
Chang, R. P. H.; Chang, C. C.; Darac, S. (1 de enero de 1982). «Hydrogen plasma etching of semiconductors and their oxides». Journal of Vacuum Science & Technology 20 (1): 45-50. Bibcode:1982JVST...20...45C. ISSN 0022-5355. doi:10.1116/1.571307.
Coburn, J. W.; Winters, Harold F. (1 de mayo de 1979). «Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching». Journal of Applied Physics 50 (5): 3189-3196. Bibcode:1979JAP....50.3189C. ISSN 0021-8979. doi:10.1063/1.326355.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (24 de octubre de 2019). «Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing». Micromachines (MDPI AG) 10 (11): 718. ISSN 2072-666X. PMC 6915366. PMID 31653033. arXiv:1909.12011. doi:10.3390/mi10110718.
Radtke, Mariusz; Render, Lara; Nelz, Richard; Neu, Elke (21 de noviembre de 2019). «Plasma treatments and photonic nanostructures for shallow nitrogen vacancy centers in diamond». Optical Materials Express (The Optical Society) 9 (12): 4716. Bibcode:2019OMExp...9.4716R. ISSN 2159-3930. arXiv:1909.13496. doi:10.1364/ome.9.004716.

nih.gov

ncbi.nlm.nih.gov

Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (2019). «Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing». Micromachines 10 (11): 718. Bibcode:2019arXiv190912011R. PMC 6915366. PMID 31653033. arXiv:1909.12011. doi:10.3390/mi10110718.
Radtke, Mariusz; Nelz, Richard; Slablab, Abdallah; Neu, Elke (24 de octubre de 2019). «Reliable Nanofabrication of Single-Crystal Diamond Photonic Nanostructures for Nanoscale Sensing». Micromachines (MDPI AG) 10 (11): 718. ISSN 2072-666X. PMC 6915366. PMID 31653033. arXiv:1909.12011. doi:10.3390/mi10110718.

oxinst.com

«Plasma Etch - Plasma Etching». oxinst.com. Consultado el 4 de febrero de 2010.

pvatepla.com

«Hochtechnologie - Weltweit | PVA TePla AG».

sciencedirect.com

Lee, Eung Suok; Park, Hae II; Baik, Hong Koo; Lee, Se-Jong; Song, Kie Moon; Hwang, Myung Keun; Huh, Chang Su (2003). «Air mesh plasma for PCB de-smear process». Surface and Coatings Technology 171 (1–3): 328-332. doi:10.1016/S0257-8972(03)00295-0.