Litografía ultravioleta extrema (Spanish Wikipedia)

Analysis of information sources in references of the Wikipedia article "Litografía ultravioleta extrema" in Spanish language version.

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  • Akira Endo, Hideo Hoshino, Takashi Suganuma, Masato Moriya, Tatsuya Ariga, Yoshifumi Ueno, Masaki Nakano, Takeshi Asayama, Tamotsu Abe, Hiroshi Komori, Georg Soumagne, Hakaru Mizoguchi, Akira Sumitani and Koichi Toyoda. «Laser Produced EUV Light Source Development for HVM». EUVA (Extreme Ultraviolet Lithography System Development Association). Archivado desde el original el 9 de julio de 2020. 

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  • Thedjoisworo, Bayu; Cheung, David; Crist, Vince (2013). «Comparación de los efectos de los plasmas basados en H2 y O2 en la eliminación de la fotoprotección, el silicio y el nitruro de silicio». Diario de Ciencia y Tecnología de Vacío B, Nanotecnología y Microelectrónica: Materiales, Procesamiento, Medición y Fenómenos 31 (2): 021206. ISSN 2166-2746. doi:10.1116/1.4792254. 

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