Fotolitograafia (Estonian Wikipedia)

Analysis of information sources in references of the Wikipedia article "Fotolitograafia" in Estonian language version.

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S. Norasetthekul, P.Y. Park, K.H. Baik, K.P. Lee, J.H. Shin, B.S. Jeong, V. Shishodia, D.P. Norton, S.J. Pearton, Etch characteristics of HfO2 films on Si substrates, Applied Surface Science, Volume 187, Issues 1–2, 14 February 2002, Pages 75–81, ISSN 0169-4332, http://dx.doi.org/10.1016/S0169-4332(01)00792-9.

Jain, K. et al., "Ultrafast deep-UV lithography with excimer lasers", IEEE Electron Device Lett., Vol. EDL-3, 53 (1982): http://ieeexplore.ieee.org/xpl/freeabs_all.jsp?arnumber=1482581

La Fontaine, B., "Lasers and Moore’s Law", SPIE Professional, Oct. 2010, p. 20; http://spie.org/x42152.xml
SPIE / Advancing the Laser / 50 Years and into the Future; http://spie.org/Documents/AboutSPIE/SPIE%20Laser%20Luminaries.pdf