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Nanojäljendlitograafia (Estonian Wikipedia)

Analysis of information sources in references of the Wikipedia article "Nanojäljendlitograafia" in Estonian language version.

refsWebsite
Global rank Estonian rank
11doi.org
2nd place
16th place
1web.archive.org
1st place
1st place

doi.org

  • https://doi.org/10.1063/1.114851 S. Y. Chou, P. R. Krauss, P. J. Renstrom. Imprint of sub-25 nm vias and trenches in polymers. Appl. Phys. Lett. 67, 3114 (1995).
  • https://doi.org/10.1088/0957-4484/16/8/010 M. D. Austin, W. Zhang, H. Ge, D. Wasserman, S. A. Lyon, S. Y. Chou. 6 nm half-pitch lines and 0.04 μm2 static random access memory patterns by nanoimprint lithography. Nanotechnology 16 1058 (2005)
  • https://doi.org/10.1116/1.1515307 X. Cheng, Y. Hong, J. Kanicki, L. J. Guo. High-resolution organic polymer light-emitting pixels fabricated by imprinting technique. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 20 2877 (2002)
  • https://doi.org/10.1016/S0167-9317(96)00097-4 S. Y. Chou, P. R. Krauss. Imprint lithrography with sub-10 nm feature size and high throughput. Microelectronic Engineering. 35, 237 (1997).
  • https://doi.org/10.1002/adma.200600882 L. J. Guo. Nanoimprint lithography: methods and material requirements. Advanced Materials 19, 495 (2007).
  • https://doi.org/10.1063/1.1766071 M. D. Austin, H. Ge, W. Wu, M. Li, Z. Yu, D. Wasserman, S. A. Lyon, S. Y. Chou. Fabrication of 5 nm linewidth and 14 nm pitch features by nanoimprint lithography. Appl. Phys. Lett. 84, 5299 (2004).
  • https://doi.org/10.1109/IMNC.2002.1178591 T. Morita, R. Kometani, K. Watanabe, K. Kanda, Y. Haruyama, T. Kaito, J. Fujita, M. Ishida, Y. Ochiai, S. Matsui. Three-dimensional nanoimprint using a mold made by focused-ion-beam chemical-vapor-deposition. Microprocesses and Nanotechnology Conference (2002).
  • https://doi.org/10.1021/la0476938 G. Y. Jung, Z. Li, W. Wu, D. L. Olynick, S. Y. Wang, W. M. Tong, R. S. Williams. Vapor-phase self-assembled monolayer for improved mold release in nanoimprint lithography. Langmuir 21 1158 (2002).
  • https://doi.org/10.1002/adfm.200600257 P. Choi, P. F. Fu, L. J. Guo. Siloxane copolymers for nanoimprint lithography. Advanced Functional Materials 17 65 (2007).
  • https://doi.org/10.1116/1.590438 H. Tan, A. Gilbertson, S. Y. Chou. Roller nanoimprint lithography. Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 16, 3926 (1998).
  • https://doi.org/10.1038/nature07718 G. Kumar, H. X. Tang, J. Schroers. Nanomoulding with amorphous metals. Nature 457, 868 (2009).

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