Kiyohara, Shuji; Takamatsu, Hideaki; Mori, Katsumi (2002). "Microfabrication of diamond films by localized electron beam chemical vapour deposition". Semiconductor Science and Technology. 17 (10): 1096. Bibcode:2002SeScT..17.1096K. doi:10.1088/0268-1242/17/10/311.
Nayak, A.; Banerjee, H. D. (1995). "Electron beam activated plasma chemical vapour deposition of polycrystalline diamond films". Physica Status Solidi A. 151 (1): 107–112. Bibcode:1995PSSAR.151..107N. doi:10.1002/pssa.2211510112.
Randolph, S.; Fowlkes, J.; Rack, P. (2006). "Focused, Nanoscale Electron-Beam-Induced Deposition and Etching". Critical Reviews of Solid State and Materials Sciences. 31 (3): 55. Bibcode:2006CRSSM..31...55R. doi:10.1080/10408430600930438.
Luxmoore, I; Ross, I; Cullis, A; Fry, P; Orr, J; Buckle, P; Jefferson, J (2007). "Low temperature electrical characterisation of tungsten nano-wires fabricated by electron and ion beam induced chemical vapour deposition". Thin Solid Films. 515 (17): 6791. Bibcode:2007TSF...515.6791L. doi:10.1016/j.tsf.2007.02.029.
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Kiyohara, Shuji; Takamatsu, Hideaki; Mori, Katsumi (2002). "Microfabrication of diamond films by localized electron beam chemical vapour deposition". Semiconductor Science and Technology. 17 (10): 1096. Bibcode:2002SeScT..17.1096K. doi:10.1088/0268-1242/17/10/311.
Nayak, A.; Banerjee, H. D. (1995). "Electron beam activated plasma chemical vapour deposition of polycrystalline diamond films". Physica Status Solidi A. 151 (1): 107–112. Bibcode:1995PSSAR.151..107N. doi:10.1002/pssa.2211510112.
Randolph, S.; Fowlkes, J.; Rack, P. (2006). "Focused, Nanoscale Electron-Beam-Induced Deposition and Etching". Critical Reviews of Solid State and Materials Sciences. 31 (3): 55. Bibcode:2006CRSSM..31...55R. doi:10.1080/10408430600930438.