Nitruro di tantalio (Italian Wikipedia)

Analysis of information sources in references of the Wikipedia article "Nitruro di tantalio" in Italian language version.

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Global rank Italian rank

9doi.org

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8oadoi.org

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1semiengineering.com

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(EN) Inna P. Borovinskaya, Tantalum Nitride, in Concise Encyclopedia of Self-Propagating High-Temperature Synthesis - History, Theory, Technology, and Products, 2017, pp. 370–371, DOI:10.1016/B978-0-12-804173-4.00150-2, ISBN 978-01-28-04173-4.
(EN) Nobuzo Terao, Structure of Tantalum Nitrides, in Japanese Journal of Applied Physics, vol. 10, n. 2, 1971, pp. 248–259, DOI:10.1143/JJAP.10.248.
(EN) Teruhisa Akashi, Fabrication of a Tantalum-Nitride Thin-Film Resistor with a Low-Variability Resistance, in IEEJ Transactions on Sensors and Micromachines, vol. 125, n. 4, 2005, pp. 182–187, DOI:10.1541/ieejsmas.125.182.
(EN) Anna Zaman e Efstathios I. Meletis, Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering, in Coatings, vol. 7, n. 12, 23 novembre 2017, p. 209, DOI:10.3390/coatings7120209.
(EN) Lucas Lima, Milena D. Moreiraa, Fred Cioldin, José Alexandre Diniza e Ioshiaki Doi, Tantalum Nitride as Promising Gate Electrode for MOS Technology, in ECS Trans., vol. 31, n. 1, 2010, pp. 319–325, DOI:10.1149/1.3474175.
(EN) M.H. Tsai e S.C. Sun, Metalorganic chemical vapor deposition of tantalum nitride by tertbutylimidotris(diethylamido)tantalum for advanced metallization, in Appl. Phys. Lett., vol. 67, n. 8, 1995, p. 1128, DOI:10.1063/1.114983.
(EN) K. Baba, R. Hatada, K. Udoh e K. Yasuda, Structure and properties of NbN and TaN films prepared by ion beam assisted deposition, in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 127–128, 2 maggio 1997, pp. 841–845, DOI:10.1016/S0168-583X(97)00018-9.
(EN) W. Ensinger, M. Kiuchi e M. Satou, Low‐temperature formation of metastable cubic tantalum nitride by metal condensation under ion irradiation, in Journal of Applied Physics, vol. 77, n. 12, 1995, p. 6630, DOI:10.1063/1.359073.
(EN) Deok-kee Kim, Heon Lee, Donghwan Kim e Young Keun Kim, Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering, in Journal of Crystal Growth, vol. 283, 3–4, ottobre 2005, pp. 404–408, DOI:10.1016/j.jcrysgro.2005.06.017.

oadoi.org

(EN) Nobuzo Terao, Structure of Tantalum Nitrides, in Japanese Journal of Applied Physics, vol. 10, n. 2, 1971, pp. 248–259, DOI:10.1143/JJAP.10.248.
(EN) Teruhisa Akashi, Fabrication of a Tantalum-Nitride Thin-Film Resistor with a Low-Variability Resistance, in IEEJ Transactions on Sensors and Micromachines, vol. 125, n. 4, 2005, pp. 182–187, DOI:10.1541/ieejsmas.125.182.
(EN) Anna Zaman e Efstathios I. Meletis, Microstructure and Mechanical Properties of TaN Thin Films Prepared by Reactive Magnetron Sputtering, in Coatings, vol. 7, n. 12, 23 novembre 2017, p. 209, DOI:10.3390/coatings7120209.
(EN) Lucas Lima, Milena D. Moreiraa, Fred Cioldin, José Alexandre Diniza e Ioshiaki Doi, Tantalum Nitride as Promising Gate Electrode for MOS Technology, in ECS Trans., vol. 31, n. 1, 2010, pp. 319–325, DOI:10.1149/1.3474175.
(EN) M.H. Tsai e S.C. Sun, Metalorganic chemical vapor deposition of tantalum nitride by tertbutylimidotris(diethylamido)tantalum for advanced metallization, in Appl. Phys. Lett., vol. 67, n. 8, 1995, p. 1128, DOI:10.1063/1.114983.
(EN) K. Baba, R. Hatada, K. Udoh e K. Yasuda, Structure and properties of NbN and TaN films prepared by ion beam assisted deposition, in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 127–128, 2 maggio 1997, pp. 841–845, DOI:10.1016/S0168-583X(97)00018-9.
(EN) W. Ensinger, M. Kiuchi e M. Satou, Low‐temperature formation of metastable cubic tantalum nitride by metal condensation under ion irradiation, in Journal of Applied Physics, vol. 77, n. 12, 1995, p. 6630, DOI:10.1063/1.359073.
(EN) Deok-kee Kim, Heon Lee, Donghwan Kim e Young Keun Kim, Electrical and mechanical properties of tantalum nitride thin films deposited by reactive sputtering, in Journal of Crystal Growth, vol. 283, 3–4, ottobre 2005, pp. 404–408, DOI:10.1016/j.jcrysgro.2005.06.017.

semiengineering.com

(EN) Mark LaPedus, Challenges Mount For Interconnect, su semiengineering.com, 26 giugno 2012.