Ossido di tantalio (Italian Wikipedia)

Analysis of information sources in references of the Wikipedia article "Ossido di tantalio" in Italian language version.

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(EN) Frederick Fairbrother, The Chemistry of Niobium and Tantalum, New York, Elsevier Publishing Company, 1967, ISBN 978-04-44-40205-9.
(EN) A.F. Wells, Structural Inorganic Chemistry, Oxford, Clarendon Press, 1947.

books.google.com

(EN) Solomon Musikant, Optical Glas Composition, in Optical Materials: An Introduction to Selection and Application, CRC Press, 1985, p. 28, ISBN 978-08-24-77309-0.

doi.org

dx.doi.org

(EN) Askeljung, Charlotta, Marinder, Bengt-Olov e Sundberg, Margareta, Effect of heat treatment on the structure of L-Ta₂O₅, in Journal of Solid State Chemistry, vol. 176, n. 1, 1º novembre 2003, pp. 250–258, DOI:10.1016/j.jssc.2003.07.003.
(EN) Stephenson, N. C. e Roth, R. S., Structural systematics in the binary system Ta₂O₅–WO₃. V. The structure of the low-temperature form of tantalum oxide L-Ta₂O₅, in Acta Crystallographica Section B, vol. 27, n. 5, 1971, pp. 1037–1044, DOI:10.1107/S056774087100342X.
(EN) Wolten, G. M. e Chase, A. B., Single-crystal data for β Ta₂O₅ and A KPO₃, in Zeitschrift für Kristallographie, vol. 129, 5–6, 1º agosto 1969, pp. 365–368, DOI:10.1524/zkri.1969.129.5-6.365.
(EN) Zibrov, I. P., Filonenko, V. P., Sundberg, M. e Werner, P.E., Structures and phase transitions of B-Ta₂O₅ and Z-Ta₂O₅: two high-pressure forms of Ta₂O₅, in Acta Crystallographica Section B, vol. 56, n. 4, 1º agosto 2000, pp. 659–665, DOI:10.1107/S0108768100005462.
(EN) O. L. G. Alderman, C.J. Benmore, J. Neuefeind, E. Coillet, A. Mermet, V. Martinez, A. Tamalonis e R. Weber, Amorphous tantala and its relationship with the molten state, in Physical Review Materials, vol. 2, n. 4, 2018, pp. 043602, DOI:10.1103/PhysRevMaterials.2.043602.
(EN) Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Kohan, Oksana, Uustare, Teet e Sammelselg, Väino, Properties of tantalum oxide thin films grown by atomic layer deposition, in Thin Solid Films, vol. 260, n. 2, 1995, pp. 135–142, DOI:10.1016/0040-6090(94)06388-5.
(EN) R. M. Fleming, D. V. Lang, C. D. W. Jones, M. L. Steigerwald, D. W. Murphy, G. B. Alers, Y.-H. Wong, R. B. van Dover, J. R. Kwo e A. M. Sergent, Defect dominated charge transport in amorphous Ta₂O₅ thin films, in Journal of Applied Physics, vol. 88, n. 2, 1º gennaio 2000, pp. 850, DOI:10.1063/1.373747.
(EN) Murawala, Prakash A., Sawai, Mikio, Tatsuta, Toshiaki, Tsuji, Osamu, Fujita, Shizuo e Fujita, Shigeo, Structural and Electrical Properties of Ta₂O₅ Grown by the Plasma-Enhanced Liquid Source CVD Using Penta Ethoxy Tantalum Source, in Japanese Journal of Applied Physics, vol. 32, Part 1, No. 1B, 1993, pp. 368–375, DOI:10.1143/JJAP.32.368.
(EN) R. Ramprasad, First principles study of oxygen vacancy defects in tantalum pentoxide, in Journal of Applied Physics, vol. 94, n. 9, 1º gennaio 2003, pp. 5609–5612, DOI:10.1063/1.1615700.
(EN) Sawada, H. e Kawakami, K., Electronic structure of oxygen vacancy in Ta₂O₅, in Journal of Applied Physics, vol. 86, n. 2, 1º gennaio 1999, pp. 956, DOI:10.1063/1.370831.
(EN) Nashed, Ramy, Hassan, Walid M. I., Ismail, Yehea e Allam, Nageh K., Unravelling the interplay of crystal structure and electronic band structure of tantalum oxide (Ta₂O₅), in Physical Chemistry Chemical Physics, vol. 15, n. 5, 2013, pp. 1352–7, DOI:10.1039/C2CP43492J.
(EN) Macagno, V. e Schultze, J.W., The growth and properties of thin oxide layers on tantalum electrodes, in Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, vol. 180, 1–2, 1º dicembre 1984, pp. 157–170, DOI:10.1016/0368-1874(84)83577-7.
(EN) Hiratani, M., Kimura, S., Hamada, T., Iijima, S. e Nakanishi, N., Hexagonal polymorph of tantalum–pentoxide with enhanced dielectric constant, in Applied Physics Letters, vol. 81, n. 13, 1º gennaio 2002, pp. 2433, DOI:10.1063/1.1509861.
(EN) A. Agulyansky, Potassium fluorotantalate in solid, dissolved and molten conditions, in J. Fluorine Chemistry, vol. 123, 2003, pp. 155–161, DOI:10.1016/S0022-1139(03)00190-8.
(EN) Ezhilvalavan, S. e Tseng, T. Y., Preparation and properties of tantalum pentoxide (Ta₂O₅) thin films for ultra large scale integrated circuits (ULSIs) application - a review, in Journal of Materials Science: Materials in Electronics, vol. 10, n. 1, 1999, pp. 9–31, DOI:10.1023/A:1008970922635.
(EN) Chaneliere, C., Autran, J.L., Devine, R.A.B. e Balland, B., Tantalum pentoxide (Ta₂O₅) thin films for advanced dielectric applications, in Materials Science and Engineering: R, vol. 22, n. 6, 1998, pp. 269–322, DOI:10.1016/S0927-796X(97)00023-5.
(EN) Wang, X., A Novel MONOS-Type Nonvolatile Memory Using High-κ Dielectrics for Improved Data Retention and Programming Speed, in IEEE Transactions on Electron Devices, vol. 51, n. 4, 2004, pp. 597–602, DOI:10.1109/TED.2004.824684.
(EN) Zhu, H., Design and Fabrication of Ta₂O₅ Stacks for Discrete Multibit Memory Application, in IEEE Transactions on Nanotechnology, vol. 12, n. 6, 2013, pp. 1151–1157, DOI:10.1109/TNANO.2013.2281817.
(EN) Lee, M.J., A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta₂O_5−x/TaO_2−x bilayer structures, in Nature Materials, vol. 10, n. 8, 2011, pp. 625–630, DOI:10.1038/NMAT3070.

itrust.de

gestis-en.itrust.de

scheda dell'ossido di tantalio(V) su IFA-GESTIS Archiviato il 16 ottobre 2019 in Internet Archive.

materion.com

(EN) Tantalium Oxide for Optical Coating Applications, su Materion. URL consultato il 1º aprile 2021.

mindat.org

(EN) Tantite: Tantite mineral information and data, su Mindat.org. URL consultato il 3 marzo 2016.

oadoi.org

(EN) Askeljung, Charlotta, Marinder, Bengt-Olov e Sundberg, Margareta, Effect of heat treatment on the structure of L-Ta₂O₅, in Journal of Solid State Chemistry, vol. 176, n. 1, 1º novembre 2003, pp. 250–258, DOI:10.1016/j.jssc.2003.07.003.
(EN) Stephenson, N. C. e Roth, R. S., Structural systematics in the binary system Ta₂O₅–WO₃. V. The structure of the low-temperature form of tantalum oxide L-Ta₂O₅, in Acta Crystallographica Section B, vol. 27, n. 5, 1971, pp. 1037–1044, DOI:10.1107/S056774087100342X.
(EN) Wolten, G. M. e Chase, A. B., Single-crystal data for β Ta₂O₅ and A KPO₃, in Zeitschrift für Kristallographie, vol. 129, 5–6, 1º agosto 1969, pp. 365–368, DOI:10.1524/zkri.1969.129.5-6.365.
(EN) Zibrov, I. P., Filonenko, V. P., Sundberg, M. e Werner, P.E., Structures and phase transitions of B-Ta₂O₅ and Z-Ta₂O₅: two high-pressure forms of Ta₂O₅, in Acta Crystallographica Section B, vol. 56, n. 4, 1º agosto 2000, pp. 659–665, DOI:10.1107/S0108768100005462.
(EN) O. L. G. Alderman, C.J. Benmore, J. Neuefeind, E. Coillet, A. Mermet, V. Martinez, A. Tamalonis e R. Weber, Amorphous tantala and its relationship with the molten state, in Physical Review Materials, vol. 2, n. 4, 2018, pp. 043602, DOI:10.1103/PhysRevMaterials.2.043602.
(EN) Kukli, Kaupo, Aarik, Jaan, Aidla, Aleks, Kohan, Oksana, Uustare, Teet e Sammelselg, Väino, Properties of tantalum oxide thin films grown by atomic layer deposition, in Thin Solid Films, vol. 260, n. 2, 1995, pp. 135–142, DOI:10.1016/0040-6090(94)06388-5.
(EN) R. M. Fleming, D. V. Lang, C. D. W. Jones, M. L. Steigerwald, D. W. Murphy, G. B. Alers, Y.-H. Wong, R. B. van Dover, J. R. Kwo e A. M. Sergent, Defect dominated charge transport in amorphous Ta₂O₅ thin films, in Journal of Applied Physics, vol. 88, n. 2, 1º gennaio 2000, pp. 850, DOI:10.1063/1.373747.
(EN) Murawala, Prakash A., Sawai, Mikio, Tatsuta, Toshiaki, Tsuji, Osamu, Fujita, Shizuo e Fujita, Shigeo, Structural and Electrical Properties of Ta₂O₅ Grown by the Plasma-Enhanced Liquid Source CVD Using Penta Ethoxy Tantalum Source, in Japanese Journal of Applied Physics, vol. 32, Part 1, No. 1B, 1993, pp. 368–375, DOI:10.1143/JJAP.32.368.
(EN) R. Ramprasad, First principles study of oxygen vacancy defects in tantalum pentoxide, in Journal of Applied Physics, vol. 94, n. 9, 1º gennaio 2003, pp. 5609–5612, DOI:10.1063/1.1615700.
(EN) Sawada, H. e Kawakami, K., Electronic structure of oxygen vacancy in Ta₂O₅, in Journal of Applied Physics, vol. 86, n. 2, 1º gennaio 1999, pp. 956, DOI:10.1063/1.370831.
(EN) Nashed, Ramy, Hassan, Walid M. I., Ismail, Yehea e Allam, Nageh K., Unravelling the interplay of crystal structure and electronic band structure of tantalum oxide (Ta₂O₅), in Physical Chemistry Chemical Physics, vol. 15, n. 5, 2013, pp. 1352–7, DOI:10.1039/C2CP43492J.
(EN) Macagno, V. e Schultze, J.W., The growth and properties of thin oxide layers on tantalum electrodes, in Journal of Electroanalytical Chemistry and Interfacial Electrochemistry, vol. 180, 1–2, 1º dicembre 1984, pp. 157–170, DOI:10.1016/0368-1874(84)83577-7.
(EN) Hiratani, M., Kimura, S., Hamada, T., Iijima, S. e Nakanishi, N., Hexagonal polymorph of tantalum–pentoxide with enhanced dielectric constant, in Applied Physics Letters, vol. 81, n. 13, 1º gennaio 2002, pp. 2433, DOI:10.1063/1.1509861.
(EN) A. Agulyansky, Potassium fluorotantalate in solid, dissolved and molten conditions, in J. Fluorine Chemistry, vol. 123, 2003, pp. 155–161, DOI:10.1016/S0022-1139(03)00190-8.
(EN) Ezhilvalavan, S. e Tseng, T. Y., Preparation and properties of tantalum pentoxide (Ta₂O₅) thin films for ultra large scale integrated circuits (ULSIs) application - a review, in Journal of Materials Science: Materials in Electronics, vol. 10, n. 1, 1999, pp. 9–31, DOI:10.1023/A:1008970922635.
(EN) Chaneliere, C., Autran, J.L., Devine, R.A.B. e Balland, B., Tantalum pentoxide (Ta₂O₅) thin films for advanced dielectric applications, in Materials Science and Engineering: R, vol. 22, n. 6, 1998, pp. 269–322, DOI:10.1016/S0927-796X(97)00023-5.
(EN) Wang, X., A Novel MONOS-Type Nonvolatile Memory Using High-κ Dielectrics for Improved Data Retention and Programming Speed, in IEEE Transactions on Electron Devices, vol. 51, n. 4, 2004, pp. 597–602, DOI:10.1109/TED.2004.824684.
(EN) Zhu, H., Design and Fabrication of Ta₂O₅ Stacks for Discrete Multibit Memory Application, in IEEE Transactions on Nanotechnology, vol. 12, n. 6, 2013, pp. 1151–1157, DOI:10.1109/TNANO.2013.2281817.
(EN) Lee, M.J., A fast, high-endurance and scalable non-volatile memory device made from asymmetric Ta₂O_5−x/TaO_2−x bilayer structures, in Nature Materials, vol. 10, n. 8, 2011, pp. 625–630, DOI:10.1038/NMAT3070.

web.archive.org

scheda dell'ossido di tantalio(V) su IFA-GESTIS Archiviato il 16 ottobre 2019 in Internet Archive.