Trifluoruro di cloro (Italian Wikipedia)

Analysis of information sources in references of the Wikipedia article "Trifluoruro di cloro" in Italian language version.

refsWebsite

Global rank Italian rank

4web.archive.org

1^st place

1^st place

799^th place

22^nd place

2^nd place

7^th place

2patentstorm.us

low place

low place

2,128^th place

3,303^rd place

1,168^th place

1,024^th place

4,848^th place

5,511^th place

6^th place

8^th place

1bunkertours.co.uk

low place

low place

archive.org

J. D. Clark, Ignition! An informal history of liquid rocket propellants, New Brunswick, New Jersey, Rutgers University Press, 1972, p. 214, ISBN 0-8135-0725-1.

bris.ac.uk

chm.bris.ac.uk

ClF₃ molecola del mese nel sito del Bristol Chemistry Department, su chm.bris.ac.uk. URL consultato il 5 novembre 2010.

bunkertours.co.uk

"Bunker Tours" report on Falkenhagen

doi.org

dx.doi.org

H. Habuka, T. Sukenobu, H. Koda, T. Takeuchi, M. Aihara, Silicon etch rate using chlorine trifluoride, in J. Electrochem. Soc., vol. 151, n. 11, 2004, pp. G783–G787, DOI:10.1149/1.1806391.
O. Ruff, H. Krug, Über ein neues Chlorfluorid-CIF₃, in Z. anorg. allgem. Chem., vol. 190, n. 1, 1930, pp. 270-276, DOI:10.1002/zaac.19301900127.

iaea.org

www-pub.iaea.org

Safety of conversion facilities and uranium enrichment facilities: specific safety guide (PDF), Vienna, International Atomic Energy Agency, 2010, ISBN 978-92-0-104809-7.

nap.edu

books.nap.edu

(BEST) Board on Environmental Studies and Toxicology, Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5 (citato sul sito della National Academies Press), Washington D.C., National Academies Press, , 2006, p. 40, ISBN 0-309-10358-4.

nap.edu

National Research Council (U.S.). Committee on Decontamination and Decommissioning of Uranium Enrichment Facilities, Affordable cleanup? Opportunities for cost reduction in the contamination and decommissioning of the nation's uranium enrichment facilities., Washington, National Academies, 1996, ISBN 0-309-05438-9.

oadoi.org

H. Habuka, T. Sukenobu, H. Koda, T. Takeuchi, M. Aihara, Silicon etch rate using chlorine trifluoride, in J. Electrochem. Soc., vol. 151, n. 11, 2004, pp. G783–G787, DOI:10.1149/1.1806391.
O. Ruff, H. Krug, Über ein neues Chlorfluorid-CIF₃, in Z. anorg. allgem. Chem., vol. 190, n. 1, 1930, pp. 270-276, DOI:10.1002/zaac.19301900127.

patentstorm.us

United States Patent 5849092 "Process for chlorine trifluoride chamber cleaning" Archiviato il 26 settembre 2007 in Internet Archive.
United States Patent 6034016 "Method for regenerating halogenated Lewis acid catalysts" Archiviato il 26 settembre 2007 in Internet Archive.

web.archive.org

United States Patent 5849092 "Process for chlorine trifluoride chamber cleaning" Archiviato il 26 settembre 2007 in Internet Archive.
United States Patent 6034016 "Method for regenerating halogenated Lewis acid catalysts" Archiviato il 26 settembre 2007 in Internet Archive.
(FR) M. B. Davis, La France nucléaire: matières et sites - 2002, Parigi, Wise, 2001, ISBN 978-2-9511333-1-0. URL consultato il 6 novembre 2010 (archiviato dall'url originale il 23 novembre 2010).
Safetygram di ClF₃ nel sito di Air Products (PDF), su airproducts.com. URL consultato il 4 novembre 2010 (archiviato dall'url originale il 18 marzo 2006).