Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). “0.1–10-keV x-ray-induced electron emissions from solids—Models and secondary electron measurements”. Journal of Applied Physics (AIP Publishing) 48 (5): 1852–1866. Bibcode: 1977JAP....48.1852H. doi:10.1063/1.323938. ISSN0021-8979.
Ercolani, D.; Lazzarino, M.; Mori, G.; Ressel, B.; Sorba, L.; Locatelli, A.; Cherifi, S.; Ballestrazzi, A. et al. (2005). “GaAs Oxide Desorption under Extreme Ultraviolet Photon Flux”. Advanced Functional Materials (Wiley) 15 (4): 587–592. doi:10.1002/adfm.200400033. ISSN1616-301X.
DiMaria, D. J.; Cartier, E.; Arnold, D. (1993). “Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon”. Journal of Applied Physics (AIP Publishing) 73 (7): 3367–3384. Bibcode: 1993JAP....73.3367D. doi:10.1063/1.352936. ISSN0021-8979.
Akazawa, Housei (1998). “Soft x-ray-stimulated positive ion desorption from amorphous SiO2 surfaces”. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (American Vacuum Society) 16 (6): 3455–3459. Bibcode: 1998JVSTA..16.3455A. doi:10.1116/1.581502. ISSN0734-2101.
Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). “0.1–10-keV x-ray-induced electron emissions from solids—Models and secondary electron measurements”. Journal of Applied Physics (AIP Publishing) 48 (5): 1852–1866. Bibcode: 1977JAP....48.1852H. doi:10.1063/1.323938. ISSN0021-8979.
DiMaria, D. J.; Cartier, E.; Arnold, D. (1993). “Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon”. Journal of Applied Physics (AIP Publishing) 73 (7): 3367–3384. Bibcode: 1993JAP....73.3367D. doi:10.1063/1.352936. ISSN0021-8979.
Akazawa, Housei (1998). “Soft x-ray-stimulated positive ion desorption from amorphous SiO2 surfaces”. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (American Vacuum Society) 16 (6): 3455–3459. Bibcode: 1998JVSTA..16.3455A. doi:10.1116/1.581502. ISSN0734-2101.
Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). “0.1–10-keV x-ray-induced electron emissions from solids—Models and secondary electron measurements”. Journal of Applied Physics (AIP Publishing) 48 (5): 1852–1866. Bibcode: 1977JAP....48.1852H. doi:10.1063/1.323938. ISSN0021-8979.
Ercolani, D.; Lazzarino, M.; Mori, G.; Ressel, B.; Sorba, L.; Locatelli, A.; Cherifi, S.; Ballestrazzi, A. et al. (2005). “GaAs Oxide Desorption under Extreme Ultraviolet Photon Flux”. Advanced Functional Materials (Wiley) 15 (4): 587–592. doi:10.1002/adfm.200400033. ISSN1616-301X.
DiMaria, D. J.; Cartier, E.; Arnold, D. (1993). “Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon”. Journal of Applied Physics (AIP Publishing) 73 (7): 3367–3384. Bibcode: 1993JAP....73.3367D. doi:10.1063/1.352936. ISSN0021-8979.
Akazawa, Housei (1998). “Soft x-ray-stimulated positive ion desorption from amorphous SiO2 surfaces”. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films (American Vacuum Society) 16 (6): 3455–3459. Bibcode: 1998JVSTA..16.3455A. doi:10.1116/1.581502. ISSN0734-2101.