Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). «0.1–10‐keV x‐ray‐induced electron emissions from solids—Models and secondary electron measurements». AIP Publishing. Journal of Applied Physics. 48: 1852–1866. Bibcode:1977JAP....48.1852H. ISSN0021-8979. doi:10.1063/1.323938
DiMaria, D. J.; Cartier, E.; Arnold, D. (1993). «Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon». AIP Publishing. Journal of Applied Physics. 73: 3367–3384. ISSN0021-8979. doi:10.1063/1.352936
Akazawa, Housei (1998). «Soft x-ray-stimulated positive ion desorption from amorphous SiO2 surfaces». American Vacuum Society. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16: 3455–3459. ISSN0734-2101. doi:10.1116/1.581502
Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). «0.1–10‐keV x‐ray‐induced electron emissions from solids—Models and secondary electron measurements». AIP Publishing. Journal of Applied Physics. 48: 1852–1866. Bibcode:1977JAP....48.1852H. ISSN0021-8979. doi:10.1063/1.323938
Henke, Burton L.; Smith, Jerel A.; Attwood, David T. (1977). «0.1–10‐keV x‐ray‐induced electron emissions from solids—Models and secondary electron measurements». AIP Publishing. Journal of Applied Physics. 48: 1852–1866. Bibcode:1977JAP....48.1852H. ISSN0021-8979. doi:10.1063/1.323938
DiMaria, D. J.; Cartier, E.; Arnold, D. (1993). «Impact ionization, trap creation, degradation, and breakdown in silicon dioxide films on silicon». AIP Publishing. Journal of Applied Physics. 73: 3367–3384. ISSN0021-8979. doi:10.1063/1.352936
Akazawa, Housei (1998). «Soft x-ray-stimulated positive ion desorption from amorphous SiO2 surfaces». American Vacuum Society. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 16: 3455–3459. ISSN0734-2101. doi:10.1116/1.581502