Trifluorură de clor (Romanian Wikipedia)
Analysis of information sources in references of the Wikipedia article "Trifluorură de clor" in Romanian language version.
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6,902nd place
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cdc.gov
- http://www.cdc.gov/niosh/npg/npgd0117.html Lipsește sau este vid:
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doi.org
- Hitoshi Habuka; Takahiro Sukenobu; Hideyuki Koda; Takashi Takeuchi; Masahiko Aihara (). „Silicon Etch Rate Using Chlorine Trifluoride”. Journal of the Electrochemical Society. 151 (11): G783–G787. doi:10.1149/1.1806391.(author ResearchGate link)
- Habuka, Hitoshi. „Etching of Silicon Carbide Using Chlorine Trifluoride Gas”. doi:10.5772/50387.
intechopen.com
- Habuka, Hitoshi. „Etching of Silicon Carbide Using Chlorine Trifluoride Gas”. doi:10.5772/50387.
nap.edu
books.nap.edu
- Board on Environmental Studies and Toxicology, (BEST) (). Acute Exposure Guideline Levels for Selected Airborne Chemicals: Volume 5. Washington D.C.: National Academies Press. p. 40. ISBN 0-309-10358-4. (available from National Academies Press)
nih.gov
pubchem.ncbi.nlm.nih.gov
- „Trifluorură de clor”, CHLORINE TRIFLUORIDE (în engleză), PubChem, accesat în
- „Trifluorură de clor”, CHLORINE TRIFLUORIDE (în engleză), PubChem, accesat în
patentstorm.us
researchgate.net
- Hitoshi Habuka; Takahiro Sukenobu; Hideyuki Koda; Takashi Takeuchi; Masahiko Aihara (). „Silicon Etch Rate Using Chlorine Trifluoride”. Journal of the Electrochemical Society. 151 (11): G783–G787. doi:10.1149/1.1806391.(author ResearchGate link)