Peter Clarke (2012-02-17). "TSMC set to receive Matrix 13,000 e-beam litho machine" (англ.). EETimes. Архивировано10 января 2014. Дата обращения: 10 января 2014. «There are at least three potential suppliers of the maskless e-beam technology: IMS Nanofabrication AG (Vienna, Austria), KLA-Tencor Corp. (Milpitas, Calif.) with its Reflective Electron Beam Lithography (REBL) system and Mapper Lithography.»
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Peter Buck (DuPont Photomasks), Optical lithography: The future of mask manufacturing? (недоступная ссылка), Microlithography World volume 11 issue 3, PennWell Publishing, Aug 2002 (p 22): «Optical mask lithography systems are restricted in resolution, just like wafer steppers, to roughly 3/4 of the exposure wavelength. Accordingly, they do not exhibit the <100nm resolution possible for VSB /electron lithography/ systems.»
Syed Rizvi, Handbook of Photomask Manufacturing Technology (недоступная ссылка), Taylor & Francis, 2005, ISBN 978-0-8247-5374-0. Sergey Babin 3. Mask Writers: An Overview, 3.1 Introduction. «For decades, the unique features of EBL systems — easily programmable computer control, high accuracy, and relatively high throughput — have positioned these systems as the main tools to fabricate critical masks.»
Peter Clarke (2012-02-17). "TSMC set to receive Matrix 13,000 e-beam litho machine" (англ.). EETimes. Архивировано10 января 2014. Дата обращения: 10 января 2014. «There are at least three potential suppliers of the maskless e-beam technology: IMS Nanofabrication AG (Vienna, Austria), KLA-Tencor Corp. (Milpitas, Calif.) with its Reflective Electron Beam Lithography (REBL) system and Mapper Lithography.»
